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1989 …2020

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Paramagnetic Defect Centers Induced by Excimer Lasers, γ-Rays, and Mechanical Fracturing in Amorphous SiO2

Nishikawa, H. & Ohki, Y., 1995 Jan 1, In : Defect and Diffusion Forum. 123-124, p. 123-134

Research output: Contribution to journalArticle

Photoluminescence and electron spin-resonance studies of defects in ion-implanted thermal SiO2 films

Nishikawa, H., Fukui, H., Watanabe, E., Ito, D., Takiyamal, M., Ieki, A. & Ohki, Y., 1995 Jan 1, In : Materials Science Forum. 196-201, p. 97-102

Research output: Contribution to journalArticle

1 Citation (Scopus)

Photoluminescence from defect centers in high-purity silica glasses observed under 7.9-eV excitation

Nishikawa, H., Shiroyama, T., Nakamura, R., Ohki, Y., Nagasawa, K. & Hama, Y., 1992 Jan 1, In : Physical Review B. 45, 2, p. 586-591 6 p.

Research output: Contribution to journalArticle

394 Citations (Scopus)

Photoluminescence of oxygen-deficient-type defects in a-SiO2

Nishikawa, H., Miyake, Y., Watanabe, E., Ito, D., Seol, K. S., Ohki, Y., Ishii, K., Sakurai, Y. & Nagasawa, K., 1997 Jan 1, In : Journal of Non-Crystalline Solids. 222, p. 221-227

Research output: Contribution to journalArticle

36 Citations (Scopus)

Photoluminescence study of defect in ion-implanted thermal SiO2 films

Nishikawa, H., Watanabe, E., Ito, D., Takiyama, M., A.Ieki, A. I. & Ohki, Y., 1995 Jul 1, In : Default journal. 78, p. 842-846

Research output: Contribution to journalArticle

79 Citations (Scopus)

Photoluminescence study of defects in ion-implanted thermal SiO2 films

Nishikawa, H., Watanabe, E., Ito, D., Takiyama, M., Ieki, A. & Ohki, Y., 1995 Dec 1, In : Journal of Applied Physics. 78, 2, p. 842-846 5 p.

Research output: Contribution to journalArticle

79 Citations (Scopus)

Photoluminescence study on point defects in buried SiO2 film formed by implantation of oxygen

Seol, K. S., Ieki, A., Ohki, Y., Nishikawa, H. & Tachimori, M., 1996 Jan 1, In : Journal of Applied Physics. 79, 1, p. 412-416 5 p.

Research output: Contribution to journalArticle

37 Citations (Scopus)

Photoluminescence study on point defects in buried SiO2 film formed by implantation of oxygen

Seol, K. S., Ieki, A., Ohki, Y., Nishikawa, H. & Tachimori, M., 1996 Jan 1, In : Journal of Applied Physics. 79, p. 412-416

Research output: Contribution to journalArticle

37 Citations (Scopus)

Photoluminescence Study on Point Defects in SIMOX Buried SiO2 Film

S.Seol, K., Ieki, A., Ohki, Y., Nishikawa, H. & Tachimori, M., 1995 Jan 1, In : Materials Science Forum. 196-201, p. 1909-1914

Research output: Contribution to journalArticle

Plasma-induced damage of silicon thermal oxides in the VLSI process

Nishikawa, H., Watanabe, E., Ito, D. & Tochikubo, F., 1996 Jan 1, In : Memoirs of Faculty of Engineering. p. 17-24

Research output: Contribution to journalArticle

Point defects in high purity silica induced by high-dose gamma irradiation

Sakurai, Y., Nagasawa, K., Nishikawa, H. & Ohki, Y., 1994 Dec 1, In : Journal of Applied Physics. 75, 3, p. 1372-1377 6 p.

Research output: Contribution to journalArticle

38 Citations (Scopus)

Proton Microbeam Irradiation Effects on Silica Glass

Nishikawa, H., Fukagawa, K., Yanagi, T., Ohki, Y., Watanabe, E., Oikawa, M., Kamiya, T. & Arakawa, K., 2004 Jul 21, In : Abstract Book of 1st International Workshop on Proton Beam Writing. p. 26

Research output: Contribution to journalArticle

Radiation effects and surface deformation of silica by ion microbeam

Nishikawa, H., Souno, T., Hattori, M., Nishihara, Y., Ohki, Y., Watanabe, E., Oikawa, M., Kamiya, T. & Arakawa, K., 2002 May 1, In : Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. 191, 1-4, p. 342-345 4 p.

Research output: Contribution to journalArticle

3 Citations (Scopus)

Relation between plasma-induced damage to SiO2 film and high energy particles in plasma processing

Tochikubo, F., Watanabe, T., Nishikawa, H., Watanabe, E., Ito, D., Okumura, T. & Kaibe, H., 1997 Jan 1, In : Memoirs of Faculty of Engineering. p. 21-30

Research output: Contribution to journalArticle

Role of point defects in dielectric breakdown of SiO2 formed by plasma-enhanced chemical vapor deposition

Ishii, K., Isshiki, D., Ohki, Y., Nishikawa, H. & Takiyama, M., 1995 Jan 1, In : Japanese Journal of Applied Physics. 34, p. 205-211

Research output: Contribution to journalArticle

15 Citations (Scopus)

Role of point defects in dielectric breakdown of sio2formed by plasma-enhanced chemical vapor deposition of tetraethoxysilane

Ishii, K., Isshiki, D., Ohki, Y., Nishikawa, H. & Takiyama, M., 1995 Jan, In : Japanese Journal of Applied Physics. 34, 1, p. 205-211 7 p.

Research output: Contribution to journalArticle

15 Citations (Scopus)

Si - O - Si strained bond and paramagnetic defect centers induced by mechanical fracturing in amorphous SiO2

Munekuni, S., Dohguchi, N., Nishikawa, H., Ohki, Y., Nagasawa, K. & Hama, Y., 1991 Dec 1, In : Journal of Applied Physics. 70, 9, p. 5054-5062 9 p.

Research output: Contribution to journalArticle

24 Citations (Scopus)

Si-O-Si strained bond and paramagnetic defect centers induced by mechanical fracturing in amorphous SiO2

Munekuni, S., Nohguchi, N., Nishikawa, H., Ohki, Y., Nagasawa, K. & Hama, Y., 1991 Nov 1, In : Journal of Applied Physics. 70, p. 5054-5062

Research output: Contribution to journalArticle

24 Citations (Scopus)

Soft-lithographic methods for the fabrication of dielectrophoretic devices using molds by proton beam writing

Shiine, Y., Nishikawa, H., Furuta, Y., Kanamitsu, K., Satoh, T., Ishii, Y., Kamiya, T., Nakao, R. & Uchida, S., 2010 May 1, In : Microelectronic Engineering. 87, 5-8, p. 835-838 4 p.

Research output: Contribution to journalArticle

6 Citations (Scopus)

Spatial distribution of irradiation effects on silica glass induced by 15-MeV oxygen ion microbeam

Nishikawa, H., Fukagawa, K., Nakamura, T., Ohki, Y., Oikawa, M., Kamiya, T. & Arakawa, K., 2006 Jan 1, In : Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. 242, 1-2, p. 437-440 4 p.

Research output: Contribution to journalArticle

8 Citations (Scopus)

Spatial distribution of irradiation effects on silica glass induced by ion microbeam

Nishikawa, H., Fukagawa, K., Yanagi, T., Ohki, Y., Watanabe, E., Oikawa, M., Kamiya, T. & Arakawa, K., 2004 Sep 5, In : Default journal. p. 87

Research output: Contribution to journalArticle

Structure and generation mechanisms of paramagnetic centers and absorption bands responsible for Ge-doped SiO2 optical-fiber gratings

Fujimaki, M., Watanabe, T., Katoh, T., Karasawa, T., Miyazaki, N., Ohki, Y. & Nishikawa, H., 1998 Feb 1, In : Physical Review B. 57, p. 3920-3926

Research output: Contribution to journalArticle

88 Citations (Scopus)

Structures and generation mechanisms of paramagnetic centers and absorption bands responsible for Ge-doped optical-fiber gratings

Fujimaki, M., Watanabe, T., Katoh, T., Kasahara, T., Miyazaki, N., Ohki, Y. & Nishikawa, H., 1998 Jan 1, In : Physical Review B - Condensed Matter and Materials Physics. 57, 7, p. 3920-3926 7 p.

Research output: Contribution to journalArticle

88 Citations (Scopus)

Temperature dependence of the lifetime of 4.3-eV photoluminescence in oxygen-deficient amorphous SiO2

Seol, K. S., Fujimaki, M., Ohki, Y. & Nishikawa, H., 1999 Jan 1, In : Physical Review B. 59, p. 1590-1593

Research output: Contribution to journalArticle

21 Citations (Scopus)

Thermal annealing behavior of defects induced by ion implantation in thermally grown SiO2 films

Seol, K. S., Karasawa, T., Ohki, Y., Nishikawa, H. & Takiyama, M., 1997 Jan 1, In : Microelectrons Engineering. 36, p. 193-195

Research output: Contribution to journalArticle

6 Citations (Scopus)

Thermal annealing behavior of defects induced by ion implantation in thermally grown SiO2 films

Seol, K. S., Karasawa, T., Ohki, Y., Nishikawa, H. & Takiyama, M., 1997 Jun, In : Microelectronic Engineering. 36, 1-4, p. 193-195 3 p.

Research output: Contribution to journalArticle

6 Citations (Scopus)

Three-dimensional dielectrophoresis with dielectric pillar arrays fabricated by soft lithography

Watabe, R., Uchida, S. & Nishikawa, H., 2015 Sep 1, In : IEEJ Transactions on Fundamentals and Materials. 135, 9, p. 548-552 5 p.

Research output: Contribution to journalArticle

Various bonding forms of OH groups in hydrogen-treated silica

Kitagawa, M., Nishikawa, H., Ohki, Y. & Hama, Y., 1993 Dec 1, In : Journal of Applied Physics. 74, 4, p. 2378-2380 3 p.

Research output: Contribution to journalArticle

12 Citations (Scopus)

Various bonding forms of OH groups in hydrogen-treated silica

Kitagawa, M., Nishikawa, H. & Ohki, Y., 1993 Aug 1, In : Journal of Applied Physics. 74, p. 2378-2380

Research output: Contribution to journalArticle

12 Citations (Scopus)

Visible photoluminescence from Si clusters in γ-irradiated amorphous SiO2

Nishikawa, H., Watanabe, E., Ito, D., Sakurai, Y., Nagasawa, K. & Ohki, Y., 1996 Sep 1, In : Journal of Applied Physics. 80, p. 3513-3517

Research output: Contribution to journalArticle

116 Citations (Scopus)

Visualization of focused proton beam dose distribution by atomic force microscopy using blended polymer films based on polyacrylic acid

Omichi, M., Takano, K., Satoh, T., Kamiya, T., Ishii, Y., Ohkubo, T., Koka, M., Kada, W., Sugimoto, M., Nishikawa, H. & Seki, S., 2012 Sep 1, In : Journal of Nanoscience and Nanotechnology. 12, 9, p. 7401-7404 4 p.

Research output: Contribution to journalArticle

2 Citations (Scopus)

Y-Junction Waveguides for 1.5-μm Band Fabricated by Proton Beam Writing

Uehara, M., Kiryu, H., Miura, K., Hanaizumi, O., Satoh, T., Ishii, Y., Takano, K., Ohkubo, T., Kohka, M., Yamazaki, A., Kada, W., Yokoyama, A., Kamiya, T. & Nishikawa, H., 2010 Dec 1, In : 2nd International Conference on Advanced Micro-Device Engineering (AMDE2010).

Research output: Contribution to journalArticle