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Research Output

2020

Humidity reliability of commercial flash memories for long-term storage

Murota, T., Mimura, T., Gomasang, P., Yokogawa, S. & Ueno, K., 2020 Jul 1, In : Japanese Journal of Applied Physics. 59, SL, SLLC01.

Research output: Contribution to journalArticle

Open Access
1 Citation (Scopus)
2019

A novel graphene barrier against moisture by multiple stacking large-grain graphene

Gomasang, P., Kawahara, K., Yasuraoka, K., Maruyama, M., Ago, H., Okada, S. & Ueno, K., 2019 Dec 1, In : Scientific Reports. 9, 1, 3777.

Research output: Contribution to journalArticle

Open Access
4 Citations (Scopus)
2 Citations (Scopus)

High crystallinity multilayer graphene deposited by a low-temperature CVD using Ni catalyst with applying current

Akimoto, T. & Ueno, K., 2019 Mar, 2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019. Institute of Electrical and Electronics Engineers Inc., p. 351-353 3 p. 8731128. (2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Lifetime prediction model of Cu-based metallization against moisture under temperature and humidity accelerations

Gomasang, P., Ogiue, S., Yokogawa, S. & Ueno, K., 2019 Jan 1, In : Japanese Journal of Applied Physics. 58, SBBC01.

Research output: Contribution to journalArticle

Open Access
2 Citations (Scopus)

Simultaneous doping / etching (SDE) process of multilayer graphene on Ni for low resistance metallization

Yokosawa, K., Akimoto, T., Okada, Y. & Ueno, K., 2019 Mar, 2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019. Institute of Electrical and Electronics Engineers Inc., p. 47-49 3 p. 8731211. (2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Synthesis of nitrogen-doped multilayer graphene film by solid-phase deposition using Co-N catalyst

Fujishima, Y. & Ueno, K., 2019 Mar, 2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019. Institute of Electrical and Electronics Engineers Inc., p. 354-356 3 p. 8731097. (2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2018

Moisture barrier properties of single-layer graphene deposited on Cu films for Cu metallization

Gomasang, P., Abe, T., Kawahara, K., Wasai, Y., Nabatova-Gabain, N., Cuong, N. T., Ago, H., Okada, S. & Ueno, K., 2018 Apr 1, In : Japanese Journal of Applied Physics. 57, 4, 04FC08.

Research output: Contribution to journalArticle

4 Citations (Scopus)

On-chip intercalated-graphene inductors for next-generation radio frequency electronics

Kang, J., Matsumoto, Y., Li, X., Jiang, J., Xie, X., Kawamoto, K., Kenmoku, M., Chu, J. H., Liu, W., Mao, J., Ueno, K. & Banerjee, K., 2018 Jan 1, In : Nature Electronics. 1, 1, p. 46-51 6 p.

Research output: Contribution to journalArticle

23 Citations (Scopus)

Oxidation Structure Change of Copper Surface Depending on Accelerated Humidity

Gomasang, P., Ogiue, S., Ueno, K. & Yokogawa, S., 2018 Aug 8, 2018 IEEE International Interconnect Technology Conference, IITC 2018. Institute of Electrical and Electronics Engineers Inc., p. 112-114 3 p. 8430461

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)
2017

Asimple test method forelectromigration reliability ofsolder/Cu pillar bumpsusing flat cables

Azuma, N., Owada, M., Abe, T., Nakada, T., Kubota, M. & Ueno, K., 2017 Jun 13, 2017 IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2017 - Proceedings. Institute of Electrical and Electronics Engineers Inc., Vol. 2017-June. p. 270-272 3 p.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Current enhanced solid phase precipitation (CE-SPP) for direct deposition of multilayer graphene on SiO2 from a Cu capped Co-C layer

Ichikawa, H. & Ueno, K., 2017 Jun 13, 2017 IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2017 - Proceedings. Institute of Electrical and Electronics Engineers Inc., p. 244-246 3 p. 7947583

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

MoCl5 intercalation doping and oxygen passivation of submicrometer-sized multilayer graphene

Miyazaki, H., Matsumoto, R., Katagiri, M., Yoshida, T., Ueno, K., Sakai, T. & Kajita, A., 2017 Apr 1, In : Japanese Journal of Applied Physics. 56, 4, 04CP02.

Research output: Contribution to journalArticle

7 Citations (Scopus)

Novel in-situ passivation of MoCl5 doped multilayer graphene with MoOx for low-resistance interconnects

Kawamoto, K., Saito, Y., Kenmoku, M. & Ueno, K., 2017 Jun 13, 2017 IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2017 - Proceedings. Institute of Electrical and Electronics Engineers Inc., p. 252-254 3 p. 7947586

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)
2016

Advanced Metallization for ULSI Applications

Nakatsuka, O., Lee, H. J., Park, Y. B., Ueno, K. & Yokogawa, S., 2016, In : Japanese Journal of Applied Physics. 55, 63, 06J001.

Research output: Contribution to journalEditorial

Open Access

Effect of current stress during thermal CVD of multilayer graphene on cobalt catalytic layer

Ueno, K., Ichikawa, H. & Uchida, T., 2016 Apr 1, In : Japanese Journal of Applied Physics. 55, 4, 04EC13.

Research output: Contribution to journalArticle

11 Citations (Scopus)

Improvement of multilayer graphene crystallinity by solid-phase precipitation with current stress application during annealing

Uddin, M. S., Ichikawa, H., Sano, S. & Ueno, K., 2016 Jan 1, In : Japanese Journal of Applied Physics. 55, 6S3, 06JH02.

Research output: Contribution to journalArticle

3 Citations (Scopus)

Reliability tests of electroless barriers against copper diffusion under bias-temperature stress with n- and p-type substrates

Ueno, K., Fujishima, S., Yamashita, M. & Mitsumori, A., 2016 May 1, In : Japanese Journal of Applied Physics. 55, 5, 56501.

Research output: Contribution to journalArticle

4 Citations (Scopus)

Synthesis of doped carbon nanotubes by CVD using NiB catalysts

Tomita, K., Kawakami, N., Aozasa, A., Aida, K. & Ueno, K., 2016 Jul 8, 2016 IEEE International Interconnect Technology Conference / Advanced Metallization Conference, IITC/AMC 2016. Institute of Electrical and Electronics Engineers Inc., p. 198-199 2 p. 7507730

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2014

Bromine doping of multilayer graphene for low-resistance interconnects

Ueno, K., Kosugi, R., Imazeki, K., Aozasa, A., Matsumoto, Y., Miyazaki, H., Sakuma, N., Kajita, A. & Sakai, T., 2014 May, In : Japanese Journal of Applied Physics. 53, 5 SPEC. ISSUE 2, 05GC02.

Research output: Contribution to journalArticle

10 Citations (Scopus)

Improvement of multilayer graphene quality by current stress during thermal CVD

Razak, L. A., Tobino, D. & Ueno, K., 2014 May 25, In : Microelectronic Engineering. 120, p. 200-204 5 p.

Research output: Contribution to journalArticle

11 Citations (Scopus)

Properties of electrodeposited germanium thin films

Uchida, Y., Funayama, T., Kogure, Y. & Ueno, K., 2014 Nov 1, In : Physica Status Solidi (C) Current Topics in Solid State Physics. 11, 11-12, p. 1661-1664 4 p.

Research output: Contribution to journalArticle

2 Citations (Scopus)
2013

Heat-Resistant co-w catalytic metals for multilayer graphene chemical vapor deposition

Ueno, K., Karasawa, Y., Kuwahara, S., Baba, S., Hanai, H., Yamazaki, Y., Sakuma, N., Kajita, A. & Sakai, T., 2013 Apr 1, In : Japanese Journal of Applied Physics. 52, 4 PART 2, 04CB04.

Research output: Contribution to journalArticle

5 Citations (Scopus)

Low-resistance metal contacts for nanocarbon/cobalt interconnects

Ueno, K., Takagi, M., Yano, H., Wakui, T., Yamazaki, Y., Sakuma, N., Kajita, A. & Sakai, T., 2013 May 1, In : Japanese Journal of Applied Physics. 52, 5 PART 4, 05FD01.

Research output: Contribution to journalArticle

3 Citations (Scopus)
2012

Barrier integrity of electroless diffusion barriers and organosilane monolayer against copper diffusion under bias temperature stress

Mitsumori, A., Fujishima, S. & Ueno, K., 2012 May 1, In : Japanese Journal of Applied Physics. 51, 5 PART 2, 05EB03.

Research output: Contribution to journalArticle

3 Citations (Scopus)

Current induced grain growth of electroplated copper film

Razak, L., Yamaguchi, T., Akahori, S., Hashimoto, H. & Ueno, K., 2012 May 1, In : Japanese Journal of Applied Physics. 51, 5 PART 2, 05EA04.

Research output: Contribution to journalArticle

4 Citations (Scopus)

Foreword: Advanced metallization for ULSI applications

Ueno, K., 2012 May 1, In : Japanese Journal of Applied Physics. 51, 5 PART 2

Research output: Contribution to journalEditorial

Low-resistance metal contacts to nanocarbon/cobalt interconnects

Takagi, M., Yano, H., Wakui, T., Yamazaki, Y., Sakuma, N., Kajita, A., Sakai;K.Ueno, T. & Ueno, K., 2012 Oct 23, In : Extended Abstracts of Advanced Metallization Conference 2012::22nd Asian Session. p. 124-125

Research output: Contribution to journalArticle

2011

Chemical vapor deposition of nanocarbon on electroless NiB catalyst using ethanol precursor

Tanaka, T., Sato, T., Karasawa, Y. & Ueno, K., 2011 May 1, In : Japanese Journal of Applied Physics. 50, 5 PART 2, 05EF02.

Research output: Contribution to journalArticle

3 Citations (Scopus)

Fabrication and Electrical Properties of Nanocarbon/Metal Hybrid Interconnects

M.Takagi, M. T., Wakui, T., Karasawa, Y., Kuwahara, S., Sakuma, N., Kajita, A., Sakai, T. & Ueno, K., 2011 Sep 14, In : Entended Abstracts of Advanced Metallization Conference 2011: 21st Asian Session. p. 134-135

Research output: Contribution to journalArticle

Review of ADMETA Plus 2011 conference topics

Ueno, K. & Kawasaki, H., 2011 Dec 1, Advanced Metallization Conference 2011. p. 133-142 10 p. (Advanced Metallization Conference (AMC)).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2010

Chemical Vapor Deposition of Nanocarbon on Electroless Ni-B Allo Catalyst

Tanaka, T., Karasawa;K.Ueno, T. TT. SY. & Ueno, K., 2010 Oct 20, In : Advanced Metallization Conference 2010 20th Asian Session. p. 118-119

Research output: Contribution to journalArticle

Chemical vapor deposition of nanocarbon on electroless Ni-B alloy catalyst

Tanaka, T., Sato, T., Karasawa, Y. & Ueno, K., 2010 Dec 1, Advanced Metallization Conference 2010. p. 258-259 2 p. (Advanced Metallization Conference (AMC)).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Comparison of lifetime improvements in electromigration between Ti barrier metal and chemical vapor deposition Co capping

Kakuhara, Y., Yokogawa, S. & Ueno, K., 2010 Apr 1, In : Japanese Journal of Applied Physics. 49, 4 PART 2, 04DB08.

Research output: Contribution to journalArticle

5 Citations (Scopus)

Grain growth enhancement of electroplated copper film by supercritical annealing

Ueno, K., Shimada, Y., Yomogida, S., Akahori, S., Yamamoto, T., Yamaguchi, T., Aoki, Y., Matsuyama, A., Yata, T. & Hashimoto, H., 2010 May 1, In : Japanese Journal of Applied Physics. 49, 5 PART 3, p. 05FA081-05FA086

Research output: Contribution to journalArticle

2 Citations (Scopus)

Material and process challenges for interconnects in nanoelectronics era

Ueno, K., 2010 Oct 20, Proceedings of 2010 International Symposium on VLSI Technology, System and Application, VLSI-TSA 2010. p. 64-65 2 p. 5488945. (Proceedings of 2010 International Symposium on VLSI Technology, System and Application, VLSI-TSA 2010).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Citations (Scopus)
2009

Advanced Metallization Conference: Preface

Naik, M., Shaviv, R., Yoda, T. & Ueno, K., 2009 Oct 19, In : Advanced Metallization Conference (AMC). p. xxi-xxii

Research output: Contribution to journalEditorial

Advanced Metallization Conference 2008

Naik, M., Shariv, R., Yoda, T., Ueno(Editor), K. & Ueno, K., 2009 Apr 1, In : Default journal.

Research output: Contribution to journalArticle

Degradation of electromigration lifetime of Cu/Low-k interconnects by postannealing

Kakuhara, Y. & Ueno, K., 2009 Apr 1, In : Japanese Journal of Applied Physics. 48, 4, 046507.

Research output: Contribution to journalArticle

2 Citations (Scopus)

Enhanced Grain Growth of Electroplated Copper Film by Annealing in Supercritical CO2 with H2

Shimada, Y., Yomogida, S., Akahori, S., Yamamoto, T., Yamaguchi, T., Aoki, Y., Matsuyama, A., Yata, T., Hashimoto, H. & Ueno, K., 2009 Oct 20, In : Extended Abstracts of Advanced Metallization Conference (ADMETA) 2009.

Research output: Contribution to journalArticle

Fabrication of Electroless CoWP/NiB Barrier Layer on SiO2 for ULSI Devices

Osaka, T., Aramak, H., Yoshino, M., Ueno, K., Matsuda, I. & Shacham-Diam, Y., 2009 Sep 1, In : Journal of the Electrochemical Society. 156, p. H707-H710

Research output: Contribution to journalArticle

Fabrication of electroless CoWP/NiB diffusion barrier layer on SiO 2 for ULSI Devices

Osaka, T., Aramaki, H., Yoshino, M., Ueno, K., Matsuda, I. & Shacham-Diamand, Y., 2009 Aug 7, In : Journal of the Electrochemical Society. 156, 9, p. H707-H710

Research output: Contribution to journalArticle

21 Citations (Scopus)

Grain growth of electroplated copper film by alternative annealing methods

Ueno, K., Shimotani, K., Shimada, Y., Yomogida, S., Takeshita, T., Hashimoto, A. & Yata, T., 2009 Oct 19, Advanced Metallization Conference 2008, AMC 2008. p. 283-287 5 p. (Advanced Metallization Conference (AMC)).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Suppression of Electromigration Early Failure of Cu/Porous Low-k Interconnects Using Dammy Metal

Kakuhara, Y., Yokogawa, S., Hiroi, M., Takewaki, T. & Ueno, K., 2009 Sep 24, In : Japanese Journal of Applied Physics. 48, p. 096504-1-096504-5

Research output: Contribution to journalArticle