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Fingerprint Fingerprint is based on mining the text of the person's scientific documents to create an index of weighted terms, which defines the key subjects of each individual researcher.

Magnetic anisotropy Engineering & Materials Science
Multilayers Engineering & Materials Science
anisotropy Physics & Astronomy
Atoms Engineering & Materials Science
Anisotropy Engineering & Materials Science
Substrates Engineering & Materials Science
Thin films Engineering & Materials Science
Epitaxial growth Engineering & Materials Science

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Research Output 1970 2018

  • 2307 Citations
  • 28 h-Index
  • 156 Article
  • 14 Conference contribution

Argon-plasma-controlled optical reset in the SiO2/Cu filamentary resistive memory stack

Kawashima, T., Yew, K. S., Zhou, Y., Ang, D. S., Zhang, H. Z. & Kyuno, K., 2018 May 21, In : Applied Physics Letters. 112, 21, 213505.

Research output: Contribution to journalArticle

argon plasma
oxides
oxygen
oxygen ions
surface treatment

Ar-plasma-modulated optical reset in the SiO2/Cu conductive-bridge resistive memory stack

Kawashima, T., Yew, K. S., Zhou, Y., Ang, D. S., Zhang, H. Z. & Kyuno, K., 2018 Jan 1, ECS Transactions. Magyari-Kope, B., Bersuker, G., Kobayashi, K., Hacker, C., Park, J. G., Shingubara, S., Saito, Y., Karim, Z., Shima, H., Kubota, H. & Obeng, Y. S. (eds.). 3 ed. Electrochemical Society Inc., Vol. 86. p. 55-64 10 p.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Plasmas
Data storage equipment
Oxides
Surface defects
Ions

Evolution of a liquid-like fluid phase on Ge/Au(111) at room temperature: A direct observation by STM

Wakabayashi, Y., Hashiguchi, K., Inase, Y., Kamiko, M. & Kyuno, K., 2017 Dec 25, In : Applied Physics Letters. 111, 26, 261601.

Research output: Contribution to journalArticle

fluids
room temperature
liquids
atoms
nanowires
1 Citation (Scopus)
Thin film transistors
transistors
Crystallization
Chemical activation
Doping (additives)

Fabrication of crystalline Ge thin films by co-deposition of Au and Ge at low substrate temperatures (>200 °c) without post annealing

Sugiyama, T., Mishiba, N., Kamiko, M. & Kyuno, K., 2016 Sep 1, In : Applied Physics Express. 9, 9, 095501.

Research output: Contribution to journalArticle

Crystallization
Annealing
crystallization
Crystalline materials
Fabrication