• Source: Scopus
  • Calculated based on no. of publications stored in Pure and citations from Scopus
1970 …2020

Research activity per year

If you made any changes in Pure these will be visible here soon.
Filter
Conference contribution

Search results

  • 2018

    Ar-plasma-modulated optical reset in the SiO2/Cu conductive-bridge resistive memory stack

    Kawashima, T., Yew, K. S., Zhou, Y., Ang, D. S., Zhang, H. Z. & Kyuno, K., 2018, ECS Transactions. Shingubara, S., Karim, Z., Kobayashi, K., Magyari-Kope, B., Shima, H., Saito, Y., Park, J. G., Bersuker, G., Kubota, H., Hacker, C. & Obeng, Y. S. (eds.). 3 ed. Electrochemical Society Inc., p. 55-64 10 p. (ECS Transactions; vol. 86, no. 3).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  • 2007

    Mechanisms of and solutions to moisture absorption of lanthanum oxide as high k gate dielectric

    Zhao, Y., Kita, K., Kyuno, K. & Toriumi, A., 2007 Dec 1, ECS Transactions - International Symposium on Advanced Gate Stack, Source/Drain and Channel Engineering for Si-based CMOS: New Materials, Processes and Equipment, 3. 1 ed. p. 141-148 8 p. (ECS Transactions; vol. 6, no. 1).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    8 Citations (Scopus)
  • 2006

    Higher-k LaYOx films with strong moisture-robustness

    Zhao, Y., Kita, K., Kyuno, K. & Toriumi, A., 2006 Jan 1, ICSICT-2006: 2006 8th International Conference on Solid-State and Integrated Circuit Technology, Proceedings. IEEE Computer Society, p. 427-429 3 p. 4098126. (ICSICT-2006: 2006 8th International Conference on Solid-State and Integrated Circuit Technology, Proceedings).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  • 2005

    Energy level consideration of source/channel/drain for performance enhancements of N- and P-channel organic FETs

    Yokoyama, T., Nishimura, T., Kita, K., Kyuno, K. & Toriumi, A., 2005 Dec 1, 63rd Device Research Conference Digest, DRC'05. p. 107-108 2 p. 1553078. (Device Research Conference - Conference Digest, DRC; vol. 2005).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  • 2003

    Further EOT scaling of Ge/HfO2 over Si/HfO2 MOS systems

    Kita, K., Sasagawa, M., Tomida, K., Tohyama, M., Kyuno, K. & Toriumi, A., 2003, Extended Abstracts of International Workshop on Gate Insulator, IWGI 2003. Institute of Electrical and Electronics Engineers Inc., p. 186-191 6 p. 1252534. (Extended Abstracts of International Workshop on Gate Insulator, IWGI 2003).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    5 Citations (Scopus)