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Research Output 1970 2018

  • 2345 Citations
  • 29 h-Index
  • 156 Article
  • 14 Conference contribution
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Article
2018
1 Citation (Scopus)

Argon-plasma-controlled optical reset in the SiO2/Cu filamentary resistive memory stack

Kawashima, T., Yew, K. S., Zhou, Y., Ang, D. S., Zhang, H. Z. & Kyuno, K., 2018 May 21, In : Applied Physics Letters. 112, 21, 213505.

Research output: Contribution to journalArticle

argon plasma
oxides
oxygen
oxygen ions
surface treatment
2017

Evolution of a liquid-like fluid phase on Ge/Au(111) at room temperature: A direct observation by STM

Wakabayashi, Y., Hashiguchi, K., Inase, Y., Kamiko, M. & Kyuno, K., 2017 Dec 25, In : Applied Physics Letters. 111, 26, 261601.

Research output: Contribution to journalArticle

fluids
room temperature
liquids
atoms
nanowires
3 Citations (Scopus)
Thin film transistors
transistors
Crystallization
Chemical activation
Doping (additives)
2016

Fabrication of crystalline Ge thin films by co-deposition of Au and Ge at low substrate temperatures (>200 °c) without post annealing

Sugiyama, T., Mishiba, N., Kamiko, M. & Kyuno, K., 2016 Sep 1, In : Applied Physics Express. 9, 9, 095501.

Research output: Contribution to journalArticle

Crystallization
Annealing
crystallization
Crystalline materials
Fabrication
2015
4 Citations (Scopus)

Effect of seed layers on structure of self-organized Ag nanodots on MgO substrates

Kamiko, M., Suenaga, R., Koo, J. W., Nose, K., Kyuno, K., Mitsuda, Y. & Ha, J. G., 2015 Jun 1, In : Japanese Journal of Applied Physics. 54, 6, 06FH06.

Research output: Contribution to journalArticle

Seed
seeds
Substrates
insertion
agglomeration
5 Citations (Scopus)

Fabrication of self-organized epitaxial fcc-Ag(110)-oriented nanorods by a Ti seed-layer-assisted thermal agglomeration method

Kamiko, M., Suenaga, R., Koo, J. W., Nose, K., Kyuno, K. & Ha, J. G., 2015 Mar 1, In : Applied Physics Express. 8, 3, 035503.

Research output: Contribution to journalArticle

agglomeration
Nanorods
nanorods
Seed
seeds
2013
9 Citations (Scopus)

Effect of Ti seed layers on structure of self-organized epitaxial face-centered-cubic-Ag(001) oriented nanodots

Kamiko, M., Suenaga, R., Koo, J. W., Nose, K., Kyuno, K. & Ha, J. G., 2013 Dec 28, In : Journal of Applied Physics. 114, 24, 244307.

Research output: Contribution to journalArticle

seeds
agglomeration
photoelectron spectroscopy
atomic force microscopy
x rays
7 Citations (Scopus)

Epitaxial growth of fcc-Ag(0 0 1) nanodots on MgO(0 0 1) substrates via Ti seed layer-assisted agglomeration

Kamiko, M., Suenaga, R., Koo, J. W., Nose, K., Kyuno, K. & Ha, J. G., 2013 Dec 18, In : Journal of Physics D: Applied Physics. 46, 50, 505304.

Research output: Contribution to journalArticle

agglomeration
Epitaxial growth
Seed
seeds
Agglomeration
3 Citations (Scopus)

Novel crystallization process for germanium thin films: Surfactant-crystallization method

Miura, H., Kamiko, M. & Kyuno, K., 2013 Jan, In : Japanese Journal of Applied Physics. 52, 1, 010204.

Research output: Contribution to journalArticle

Germanium
germanium
Surface active agents
Crystallization
surfactants
2012
4 Citations (Scopus)

The Influence of Ta underlayers on the structure of TiO 2 thin films deposited on an unheated glass substrate

Kamiko, M., Aotani, K., Suenaga, R., Koo, J. W., Nose, K., Kyuno, K. & Ha, J. G., 2012 Sep 1, In : Applied Surface Science. 258, 22, p. 8764-8768 5 p.

Research output: Contribution to journalArticle

Glass
Thin films
Substrates
Titanium dioxide
X ray photoelectron spectroscopy
2011
Gate dielectrics
Atomic force microscopy
Electric properties
leakage
electrical properties
3 Citations (Scopus)

Two-step forming process in planar-type Cu2O-based resistive switching devices

Suzuki, K., Igarashi, N. & Kyuno, K., 2011 May, In : Applied Physics Express. 4, 5

Research output: Contribution to journalArticle

filaments
optical microscopes
Melting
Microscopes
melting
2009

Band gap enhancement and electrical properties of La2O3 films doped with Y2O3 as high-k gate insulators

Y.Zhao, Y. Z., K.Kita, K. K., K.Kyuno, K. K., A.Toriumi, A. T. & Kyuno, K., 2009 Apr 1, In : Applied Physics Letters. 94

Research output: Contribution to journalArticle

53 Citations (Scopus)

Band gap enhancement and electrical properties of La2 O3 films doped with Y2 O3 as high- k gate insulators

Zhao, Y., Kita, K., Kyuno, K. & Toriumi, A., 2009, In : Applied Physics Letters. 94, 4, 042901.

Research output: Contribution to journalArticle

electrical properties
insulators
augmentation
capacitors
electric potential

Dielectric and electrical properties of amorphous La1-XTaXOY films as higher-k gate insulators

Y.Zhao, Y. Z., K.Kita, K. K., K.Kyuno, K. K., A.Toriumi, A. T. & Kyuno, K., 2009 Mar 1, In : Journal of Applied Physics. 105

Research output: Contribution to journalArticle

19 Citations (Scopus)

Dielectric and electrical properties of amorphous La1-xTa xOy films as higher- k gate insulators

Zhao, Y., Kita, K., Kyuno, K. & Toriumi, A., 2009, In : Journal of Applied Physics. 105, 3, 034103.

Research output: Contribution to journalArticle

dielectric properties
electrical properties
insulators
permittivity
semiconductor devices
8 Citations (Scopus)
Hazardous materials spills
Ultrahigh vacuum
oxygen ions
ultrahigh vacuum
Atomic force microscopy
2007

Study of La-induced flat band voltage shift in Metal/HfLaOx/SiO2/Si capacitors

Y.Yamamoto, Y. Y., K.Kita, K. K., K.Kyuno, K. K., A.Toriumi, A. T. & Kyuno, K., 2007 Nov 1, In : Japanese Journal of Applied Physics Letters 46.

Research output: Contribution to journalArticle

108 Citations (Scopus)

Study of La-induced flat band voltage shift in metal/HfLaO x/SiO2/Si capacitors

Yamamoto, Y., Kita, K., Kyuno, K. & Toriumi, A., 2007 Nov 6, In : Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 46, 11, p. 7251-7255 5 p.

Research output: Contribution to journalArticle

capacitors
Capacitors
shift
Electric potential
electric potential

Suppression of leakage current and moisture absorption of La2O3 films with ultraviolet ozone post treatment

Y.Zhao, Y. Z., K.Kita, K. K., K.Kyuno, K. K., A.Toriumi, A. T. & Kyuno, K., 2007 Jul 1, In : Japanese Journal of Applied Physics Letters 46.

Research output: Contribution to journalArticle

36 Citations (Scopus)
moisture
Leakage currents
Ozone
ozone
leakage
2006
63 Citations (Scopus)

Higher-k LaYOx films with strong moisture resistance

Zhao, Y., Kita, K., Kyuno, K. & Toriumi, A., 2006, In : Applied Physics Letters. 89, 25, 252905.

Research output: Contribution to journalArticle

moisture resistance
permittivity
moisture
rare earth elements
oxides
63 Citations (Scopus)

Higher-k LaYOx films with strong moisture resistance

Y.Zhao, Y. Z., K.Kita, K. K., K.Kyuno, K. K., A.Toriumi, A. T. & Kyuno, K., 2006 Dec 1, In : Applied Physics Letters 89.

Research output: Contribution to journalArticle

172 Citations (Scopus)

Moisture-absorption-induced permittivity deterioration and surface roughness enhancement of lanthanum oxide films on silicon

Zhao, Y., Toyama, M., Kita, K., Kyuno, K. & Toriumi, A., 2006, In : Applied Physics Letters. 88, 7, 072904.

Research output: Contribution to journalArticle

lanthanum oxides
deterioration
moisture
oxide films
surface roughness
5 Citations (Scopus)
ultrahigh vacuum
leakage
atomic force microscopy
conduction
degradation
135 Citations (Scopus)

Structural and electrical properties of HfLaOx films for an amorphous high-k gate insulator

Yamamoto, Y., Kita, K., Kyuno, K. & Toriumi, A., 2006, In : Applied Physics Letters. 89, 3, 032903.

Research output: Contribution to journalArticle

electrical properties
insulators
amorphous materials
electric potential
metal oxide semiconductors

Structure and electrical properties of HfLaOx films for an amorphous high-k gate insulator

Y.Yamamoto, Y. Y., K.Kita, K. K., K.Kyuno, K. K., A.Toriumi, A. T. & Kyuno, K., 2006 Apr 1, In : Applied Physics Letters. 89

Research output: Contribution to journalArticle

2005

Evolution of Leakage Paths in HfO2/SiO2 Stacked Gate Dielectrics: A Stable Direct Observation by Ultrahigh Vacuum Conducting Atomic Force Microscopy

K.Kyuno, K. K., K.Kita, K. K., A.Toriumi, A. T. & Kyuno, K., 2005 Apr 1, In : Applied Physics Letters.

Research output: Contribution to journalArticle

28 Citations (Scopus)

Evolution of leakage paths in Hf O2 Si O2 stacked gate dielectrics: A stable direct observation by ultrahigh vacuum conducting atomic force microscopy

Kyuno, K., Kita, K. & Toriumi, A., 2005 Feb 7, In : Applied Physics Letters. 86, 6, p. 1-3 3 p., 063510.

Research output: Contribution to journalArticle

ultrahigh vacuum
leakage
atomic force microscopy
conduction

Far- and Mid- Infrared Absorption Study of HfO2/SiO2/Si System

Toriumi, A., Tomida, K., Shimizu, H., Kita, K. & Kyuno, K., 2005 May 1, In : 207th Meeting of the Electrochemical Society.

Research output: Contribution to journalArticle

Interface Reaction of High-k Films with Germanium Substrate

Toriumi, A., Kita, K., Toyama, M. & Kyuno, K., 2005 Mar 1, In : 2005 MRS Spring Meeting.

Research output: Contribution to journalArticle

26 Citations (Scopus)

Kinetic model of Si oxidation at HfO2/Si interface with post deposition annealing

Shimizu, H., Kita, K., Kyuno, K. & Toriumi, A., 2005 Aug 5, In : Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 44, 8, p. 6131-6135 5 p.

Research output: Contribution to journalArticle

Annealing
Oxidation
oxidation
Kinetics
annealing
26 Citations (Scopus)

Kinetic Model of Si Oxidation at HfO2/Si Interface with Post Deposition Annealing

H.Shimizu, H. S., K.Kita, K. K., K.Kyuno, K. K., A.Toriumi, A. T. & Kyuno, K., 2005 Apr 1, In : Japanese Journal of Applied Physics. 44

Research output: Contribution to journalArticle

Permittivity Increase of Yttriium-Doped HfO2 through Structural Phase Transformation

K.Kita, K. K., K.Kyuno, K. K., A.Torium, A. T. & Kyuno, K., 2005 Apr 1, In : Applied Physics Letters. 86

Research output: Contribution to journalArticle

141 Citations (Scopus)

Permittivity increase of yttrium-doped Hf O2 through structural phase transformation

Kita, K., Kyuno, K. & Toriumi, A., 2005 Mar 7, In : Applied Physics Letters. 86, 10, p. 1-3 3 p., 102906.

Research output: Contribution to journalArticle

yttrium
phase transformations
permittivity
hafnium
shrinkage
2004

Advantages of Ge (111) Surface for High Quality HfO2/Ge Interface

Toyama, M., Kita, K., Kyuno, K. & Toriumi, A., 2004 Sep 1, In : Extended Abstracts of 2004 International Conference on Solid State Devices and Materials (SSDM). p. 226-227

Research output: Contribution to journalArticle

Complex Impedance Analysis and Photo-Induced Effects of Semiconducting Pentacene Films

Nishimura, T., Yokoyama, T., Kita, K., Kyuno, K. & Toriumi, A., 2004 Sep 1, In : Extended Abstracts of 2004 International Conference on Solid State Devices and Materials (SSDM). p. 866-867

Research output: Contribution to journalArticle

82 Citations (Scopus)

Growth mechanism difference of sputtered HfO2 on Ge and on Si

Kita, K., Kyuno, K. & Toriumi, A., 2004 Jul 5, In : Applied Physics Letters. 85, 1, p. 52-54 3 p.

Research output: Contribution to journalArticle

sputtering
oxides
thin films
82 Citations (Scopus)

Growth Mechanism Difference of Sputtered HfO2 on Ge and on Si

K.Kita, K. K., K.Kyuno, K. K., A.Toriumi, A. T. & Kyuno, K., 2004 Apr 1, In : Applied Physics Letters. 85

Research output: Contribution to journalArticle

126 Citations (Scopus)