• 2416 Citations
  • 29 h-Index
1970 …2018

Research output per year

If you made any changes in Pure these will be visible here soon.

Research Output

Filter
Article
2018

Argon-plasma-controlled optical reset in the SiO2/Cu filamentary resistive memory stack

Kawashima, T., Yew, K. S., Zhou, Y., Ang, D. S., Zhang, H. Z. & Kyuno, K., 2018 May 21, In : Applied Physics Letters. 112, 21, 213505.

Research output: Contribution to journalArticle

3 Citations (Scopus)
2017

Evolution of a liquid-like fluid phase on Ge/Au(111) at room temperature: A direct observation by STM

Wakabayashi, Y., Hashiguchi, K., Inase, Y., Kamiko, M. & Kyuno, K., 2017 Dec 25, In : Applied Physics Letters. 111, 26, 261601.

Research output: Contribution to journalArticle

1 Citation (Scopus)
8 Citations (Scopus)
2016

Fabrication of crystalline Ge thin films by co-deposition of Au and Ge at low substrate temperatures (>200 °c) without post annealing

Sugiyama, T., Mishiba, N., Kamiko, M. & Kyuno, K., 2016 Sep, In : Applied Physics Express. 9, 9, 095501.

Research output: Contribution to journalArticle

1 Citation (Scopus)
2015

Effect of seed layers on structure of self-organized Ag nanodots on MgO substrates

Kamiko, M., Suenaga, R., Koo, J. W., Nose, K., Kyuno, K., Mitsuda, Y. & Ha, J. G., 2015 Jun 1, In : Japanese Journal of Applied Physics. 54, 6, 06FH06.

Research output: Contribution to journalArticle

4 Citations (Scopus)

Fabrication of self-organized epitaxial fcc-Ag(110)-oriented nanorods by a Ti seed-layer-assisted thermal agglomeration method

Kamiko, M., Suenaga, R., Koo, J. W., Nose, K., Kyuno, K. & Ha, J. G., 2015 Mar 1, In : Applied Physics Express. 8, 3, 035503.

Research output: Contribution to journalArticle

5 Citations (Scopus)
2013

Effect of Ti seed layers on structure of self-organized epitaxial face-centered-cubic-Ag(001) oriented nanodots

Kamiko, M., Suenaga, R., Koo, J. W., Nose, K., Kyuno, K. & Ha, J. G., 2013 Dec 28, In : Journal of Applied Physics. 114, 24, 244307.

Research output: Contribution to journalArticle

9 Citations (Scopus)

Epitaxial growth of fcc-Ag(0 0 1) nanodots on MgO(0 0 1) substrates via Ti seed layer-assisted agglomeration

Kamiko, M., Suenaga, R., Koo, J. W., Nose, K., Kyuno, K. & Ha, J. G., 2013 Dec 18, In : Journal of Physics D: Applied Physics. 46, 50, 505304.

Research output: Contribution to journalArticle

7 Citations (Scopus)

Novel crystallization process for germanium thin films: Surfactant-crystallization method

Miura, H., Kamiko, M. & Kyuno, K., 2013 Jan, In : Japanese Journal of Applied Physics. 52, 1, 010204.

Research output: Contribution to journalArticle

3 Citations (Scopus)
2012

The Influence of Ta underlayers on the structure of TiO 2 thin films deposited on an unheated glass substrate

Kamiko, M., Aotani, K., Suenaga, R., Koo, J. W., Nose, K., Kyuno, K. & Ha, J. G., 2012 Sep 1, In : Applied Surface Science. 258, 22, p. 8764-8768 5 p.

Research output: Contribution to journalArticle

4 Citations (Scopus)
2011

Two-step forming process in planar-type Cu2O-based resistive switching devices

Suzuki, K., Igarashi, N. & Kyuno, K., 2011 May 1, In : Applied Physics Express. 4, 5

Research output: Contribution to journalArticle

3 Citations (Scopus)
2009

Band gap enhancement and electrical properties of La2O3 films doped with Y2O3 as high-k gate insulators

Y.Zhao, Y. Z., K.Kita, K. K., K.Kyuno, K. K., A.Toriumi, A. T. & Kyuno, K., 2009 Apr 1, In : Applied Physics Letters. 94

Research output: Contribution to journalArticle

Band gap enhancement and electrical properties of La2 O3 films doped with Y2 O3 as high- k gate insulators

Zhao, Y., Kita, K., Kyuno, K. & Toriumi, A., 2009 Feb 9, In : Applied Physics Letters. 94, 4, 042901.

Research output: Contribution to journalArticle

55 Citations (Scopus)

Dielectric and electrical properties of amorphous La1-XTaXOY films as higher-k gate insulators

Y.Zhao, Y. Z., K.Kita, K. K., K.Kyuno, K. K., A.Toriumi, A. T. & Kyuno, K., 2009 Mar 1, In : Journal of Applied Physics. 105

Research output: Contribution to journalArticle

Dielectric and electrical properties of amorphous La1-xTa xOy films as higher- k gate insulators

Zhao, Y., Kita, K., Kyuno, K. & Toriumi, A., 2009 Feb 24, In : Journal of Applied Physics. 105, 3, 034103.

Research output: Contribution to journalArticle

19 Citations (Scopus)
8 Citations (Scopus)
2007

Study of La-induced flat band voltage shift in Metal/HfLaOx/SiO2/Si capacitors

Y.Yamamoto, Y. Y., K.Kita, K. K., K.Kyuno, K. K., A.Toriumi, A. T. & Kyuno, K., 2007 Nov 1, In : Japanese Journal of Applied Physics Letters 46.

Research output: Contribution to journalArticle

Study of La-induced flat band voltage shift in metal/HfLaO x/SiO2/Si capacitors

Yamamoto, Y., Kita, K., Kyuno, K. & Toriumi, A., 2007 Nov 6, In : Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 46, 11, p. 7251-7255 5 p.

Research output: Contribution to journalArticle

110 Citations (Scopus)

Suppression of leakage current and moisture absorption of La2O3 films with ultraviolet ozone post treatment

Y.Zhao, Y. Z., K.Kita, K. K., K.Kyuno, K. K., A.Toriumi, A. T. & Kyuno, K., 2007 Jul 1, In : Japanese Journal of Applied Physics Letters 46.

Research output: Contribution to journalArticle

37 Citations (Scopus)
2006

Higher-k LaYOx films with strong moisture resistance

Y.Zhao, Y. Z., K.Kita, K. K., K.Kyuno, K. K., A.Toriumi, A. T. & Kyuno, K., 2006 Dec 1, In : Applied Physics Letters 89.

Research output: Contribution to journalArticle

66 Citations (Scopus)

Higher-k LaYOx films with strong moisture resistance

Zhao, Y., Kita, K., Kyuno, K. & Toriumi, A., 2006 Dec 1, In : Applied Physics Letters. 89, 25, 252905.

Research output: Contribution to journalArticle

66 Citations (Scopus)

Moisture-absorption-induced permittivity deterioration and surface roughness enhancement of lanthanum oxide films on silicon

Zhao, Y., Toyama, M., Kita, K., Kyuno, K. & Toriumi, A., 2006 Feb 24, In : Applied Physics Letters. 88, 7, 072904.

Research output: Contribution to journalArticle

177 Citations (Scopus)
5 Citations (Scopus)

Structural and electrical properties of HfLaOx films for an amorphous high-k gate insulator

Yamamoto, Y., Kita, K., Kyuno, K. & Toriumi, A., 2006 Jul 28, In : Applied Physics Letters. 89, 3, 032903.

Research output: Contribution to journalArticle

141 Citations (Scopus)

Structure and electrical properties of HfLaOx films for an amorphous high-k gate insulator

Y.Yamamoto, Y. Y., K.Kita, K. K., K.Kyuno, K. K., A.Toriumi, A. T. & Kyuno, K., 2006 Apr 1, In : Applied Physics Letters. 89

Research output: Contribution to journalArticle

2005

Evolution of Leakage Paths in HfO2/SiO2 Stacked Gate Dielectrics: A Stable Direct Observation by Ultrahigh Vacuum Conducting Atomic Force Microscopy

K.Kyuno, K. K., K.Kita, K. K., A.Toriumi, A. T. & Kyuno, K., 2005 Apr 1, In : Applied Physics Letters.

Research output: Contribution to journalArticle

Evolution of leakage paths in Hf O2 Si O2 stacked gate dielectrics: A stable direct observation by ultrahigh vacuum conducting atomic force microscopy

Kyuno, K., Kita, K. & Toriumi, A., 2005 Feb 7, In : Applied Physics Letters. 86, 6, p. 1-3 3 p., 063510.

Research output: Contribution to journalArticle

28 Citations (Scopus)

Far- and Mid- Infrared Absorption Study of HfO2/SiO2/Si System

Toriumi, A., Tomida, K., Shimizu, H., Kita, K. & Kyuno, K., 2005 May 1, In : 207th Meeting of the Electrochemical Society.

Research output: Contribution to journalArticle

Interface Reaction of High-k Films with Germanium Substrate

Toriumi, A., Kita, K., Toyama, M. & Kyuno, K., 2005 Mar 1, In : 2005 MRS Spring Meeting.

Research output: Contribution to journalArticle

Kinetic model of Si oxidation at HfO2/Si interface with post deposition annealing

Shimizu, H., Kita, K., Kyuno, K. & Toriumi, A., 2005 Aug 5, In : Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 44, 8, p. 6131-6135 5 p.

Research output: Contribution to journalArticle

27 Citations (Scopus)

Kinetic Model of Si Oxidation at HfO2/Si Interface with Post Deposition Annealing

H.Shimizu, H. S., K.Kita, K. K., K.Kyuno, K. K., A.Toriumi, A. T. & Kyuno, K., 2005 Apr 1, In : Japanese Journal of Applied Physics. 44

Research output: Contribution to journalArticle

27 Citations (Scopus)

Permittivity Increase of Yttriium-Doped HfO2 through Structural Phase Transformation

K.Kita, K. K., K.Kyuno, K. K., A.Torium, A. T. & Kyuno, K., 2005 Apr 1, In : Applied Physics Letters. 86

Research output: Contribution to journalArticle

Permittivity increase of yttrium-doped Hf O2 through structural phase transformation

Kita, K., Kyuno, K. & Toriumi, A., 2005 Mar 7, In : Applied Physics Letters. 86, 10, p. 1-3 3 p., 102906.

Research output: Contribution to journalArticle

147 Citations (Scopus)
2004

Advantages of Ge (111) Surface for High Quality HfO2/Ge Interface

Toyama, M., Kita, K., Kyuno, K. & Toriumi, A., 2004 Sep 1, In : Extended Abstracts of 2004 International Conference on Solid State Devices and Materials (SSDM). p. 226-227

Research output: Contribution to journalArticle

Complex Impedance Analysis and Photo-Induced Effects of Semiconducting Pentacene Films

Nishimura, T., Yokoyama, T., Kita, K., Kyuno, K. & Toriumi, A., 2004 Sep 1, In : Extended Abstracts of 2004 International Conference on Solid State Devices and Materials (SSDM). p. 866-867

Research output: Contribution to journalArticle

Growth mechanism difference of sputtered HfO2 on Ge and on Si

Kita, K., Kyuno, K. & Toriumi, A., 2004 Jul 5, In : Applied Physics Letters. 85, 1, p. 52-54 3 p.

Research output: Contribution to journalArticle

83 Citations (Scopus)

Growth Mechanism Difference of Sputtered HfO2 on Ge and on Si

K.Kita, K. K., K.Kyuno, K. K., A.Toriumi, A. T. & Kyuno, K., 2004 Apr 1, In : Applied Physics Letters. 85

Research output: Contribution to journalArticle

83 Citations (Scopus)
127 Citations (Scopus)

IR Absorption Study of HfO2 and HfO2/Si Interface Ranging from 200cm-1 to 2000cm-1

Tomida, K., Shimizu, H., Kita, K., Kyuno, K. & Toriumi, A., 2004 Apr 1, In : 2004 MRS Spring Meeting.

Research output: Contribution to journalArticle