• 1582 Citations
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1983 …2019

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1983

A Long-Lasting Polyacetylene Battery with High Energy Density

T.Nagatomo, T. N., T.Honma, T. H., C.Yamamoto, C. Y., K.Negishi, K. N., O.Omoto, O. O. & Homma, T., 1983 May 20, In : Japanese Journal of Applied Physics Letter. 22, p. L275-L277

Research output: Contribution to journalArticle

16 Citations (Scopus)
1984

A New Trench Isolation Technology as A Replacement of LOCOS

H.Mikoshiba, H. M., T.Homma, T. H., K.Hamano, K. H. & Homma, T., 1984 Dec 9, In : Proceedings of IEEE International Electron Devices Meeting. p. 578-581

Research output: Contribution to journalArticle

10 Citations (Scopus)
1988

A New Polyimide Siloxane Film for Interlayer Dielectrics in Sub-micron Multilevel Interconnection

T.Homma, T. H., K.Eguchi, K. E., Y.Numasawa, Y. N., T.Kikkawa, T. K., Y.Hokari, Y. H., K.Hamano, K. H. & Homma, T., 1988 Jun 13, In : Proceedings of 5th IEEE VLSI Multilevel Interconnection Conference. p. 279-285

Research output: Contribution to journalArticle

6 Citations (Scopus)

New polyimide film paves way for super high-speed logic devices

Homma, T., Numasawa, Y., Murao, Y. & Hamano, K., 1988 Nov 1, In : JEE. Journal of electronic engineering. 25, 263, p. 74-79 6 p.

Research output: Contribution to journalArticle

1 Citation (Scopus)
1990

Interlayer Film Planarization

Numasawa, Y., Akimoto, Y. NY. IT. HK. & Homma, T., 1990 Oct 22, In : Semicon Japan, Semiconductor Equipment and Materials International, Technical Proceedings. p. 245-252

Research output: Contribution to journalArticle

Interlayer Film Planarization Technology

Y.Numasawa, Y. N., Y.Ikeda, Y. I., T.Homma, T. H., K.Akimoto, K. A. & Homma, T., 1990 Oct 23, In : Semicon JAPAN Proceedings. p. 245-252

Research output: Contribution to journalArticle

1991

A 7 Mask CMOS Technology Utilizing Liquid Phase Selective Oxide Deposition

K.Kanba, K. K., T.Horiuchi, T. H., T.Homma, T. H., Y.Murao, Y. M., K.Okumura, K. O. & Homma, T., 1991 Dec 8, In : Proceedings of IEEE International Electron Devices Meeting. p. 637-640

Research output: Contribution to journalArticle

4 Citations (Scopus)

A Room Temperature CVD Technology for Interlayer in Deep submicron Multilevel Interconnection

T.Homma, T. H., Y.Murao, Y. M. & Homma, T., 1991 Dec 8, In : Proceedings of IEEE International Electron Devices Meeting. p. 289-292

Research output: Contribution to journalArticle

5 Citations (Scopus)

Fully planarized multilevel interconnection using selective SiO2 deposition

Homma, T., Katoh, T., Yamada, Y., Shimizu, J. & Murao, Y., 1991 Jul 1, In : NEC Research and Development. 32, 3, p. 315-322 8 p.

Research output: Contribution to journalArticle

13 Citations (Scopus)

Fully Planarized Multilevel Interconnection Using Selective SiO2 Deposition

Homma, T. & Murao, T. HT. KY. YJ. SY., 1991 Jul 1, In : NEC Research & Development. 32, p. 315-322

Research output: Contribution to journalArticle

13 Citations (Scopus)
1992

A Fully Planarized Multilevel Interconnection Technology Using Selective TEOS-Ozone APCVD

M.Suzuki, M. S., T.Homma, T. H., Y.Murao, Y. M. & Homma, T., 1992 Dec 13, In : Proceedings of IEEE International Electron Devices Meeting. p. 293-296

Research output: Contribution to journalArticle

A High Performance Asymmetric LDD MOSFET Using Selective Oxide Deposition

T.Horiuchi, T. H., T.Homma, T. H., Y.Murao, Y. M., K.Okumura, K. O. & Homma, T., 1992 Jun 2, In : 1992 Symposium on VLSI Technology, Technical Digest. p. 88-89

Research output: Contribution to journalArticle

2 Citations (Scopus)

A New SOG Film Formation Technology Using A Room Temperature Fluoro-Alkoxy-Silane Treatment (FAST)

T.Homma, T. H., Y.Murao, Y. M. & Homma, T., 1992 Jun 9, In : Proceedings of 9th VLSI Multilevel Interconnection Conference. p. 65-71

Research output: Contribution to journalArticle

1993

A 7-Mask CMOS Process with Selective Oxide Deposition

Horiuchi, T., Homma, T., Murao, Y. & Okumura, K., 1993 Aug, In : IEEE Transactions on Electron Devices. 40, 8, p. 1455-1460 6 p.

Research output: Contribution to journalArticle

12 Citations (Scopus)

A 7-Mask CMOS Process with Selective Oxide Deposition

T.Horiuchi, T. H., K.Kanba, K. K., T.Homma, T. H., Y.Murao, Y. M., K.Okumura, K. O. & Homma, T., 1993 Aug 1, In : IEEE Transaction on Electron Devices. 40, p. 1455-1460

Research output: Contribution to journalArticle

12 Citations (Scopus)

A Fully Planarized Multilevel Interconnection Technology Using Semi-Selective Tetraethoxysilane-Ozone Chemical Vapor Deposition at Atmospheric Pressure

T.Homma, T. H., M.Suzuki, M. S., Y.Murao, Y. M. & Homma, T., 1993 Dec 1, In : Journal of the Electrochemical Society. 140, p. 3591-3599

Research output: Contribution to journalArticle

12 Citations (Scopus)

A New Interlayer Dielectric Film Formation Technology Using Room Temperature Flow CVD

T.Homma, T. H., Y.Murao, Y. M. & Homma, T., 1993 Jun 8, In : Proceedings of 10th VLSI Multilevel Interconnection Conference. p. 71-75

Research output: Contribution to journalArticle

A Room Temperature Chemical Vapor Deposition SiOF Film Formation Technology for the Interlayer in Submicron Multilevel Interconnection

T.Homma, T. H., R.Yamaguchi, R. Y., Y.Murao, Y. M. & Homma, T., 1993 Mar 1, In : Journal of the Electrochemical Society. 140, p. 687-692

Research output: Contribution to journalArticle

84 Citations (Scopus)

A Selective SiO2 Film Formation Technology Using Liquid Phase Deposition for Fully Planarized Multilevel Interconnections

T.Homma, T. H., T.Katoh, T. K., Y.Yamada, Y. Y., Y.Murao, Y. M. & Homma, T., 1993 Aug 1, In : Journal of the Electrochemical Society. 140, p. 2410-2414

Research output: Contribution to journalArticle

65 Citations (Scopus)

A Selective SiO2 Film-Formation Technology Using Liquid-Phase Deposition for Fully Planarized Multilevel Interconnections

Homma, T., Katoh, T., Yamada, Y. & Murao, Y., 1993 Aug, In : Journal of the Electrochemical Society. 140, 8, p. 2410-2414 5 p.

Research output: Contribution to journalArticle

65 Citations (Scopus)

A Spin-On-Glass Film Treatment Technology Using a Fluoroalkoxysilane Vapor at Room Temperature

Homma, T. & Murao, Y., 1993 Jul, In : Journal of the Electrochemical Society. 140, 7, p. 2046-2051 6 p.

Research output: Contribution to journalArticle

18 Citations (Scopus)

A Spin-on-Glass Film Treatment Technology Using A Fluoroalkoxysil-ane vapor at Room Temperature

T.Homma, T. H., Y.Murao, Y. M. & Homma, T., 1993 Jul 1, In : Journal of the Electrochemical Society. 140, p. 2046-2051

Research output: Contribution to journalArticle

18 Citations (Scopus)

Flow Characteristics of SiOF Films in Room Temperature Chemical Vapor Deposition Utilizing Fluorotrialkoxysilane Group and Pure Water as Gas Sources

T.Homma, T. H., R.Yamaguchi, R. Y., Y.Murao, Y. M. & Homma, T., 1993 Dec 1, In : Journal of The Electochemical Society. 140, p. 3599-3603

Research output: Contribution to journalArticle

23 Citations (Scopus)
23 Citations (Scopus)

Stability of A New Polimide Siloxane Film as Interlayer Dielectrics of ULSI Multilevel Interconnections

T.Homma, T. H., Y.Kutsuzawa, Y. K., K.Kunimune, K. K., Y.Murao, Y. M. & Homma, T., 1993 Nov 25, In : Thin Solid Films. 235, p. 80-85

Research output: Contribution to journalArticle

20 Citations (Scopus)

Stability of a new polyimide siloxane film as interlayer dielectrics of ULSI multilevel interconnections

Homma, T., Kutsuzawa, Y., Kunimune, K. & Murao, Y., 1993 Nov 25, In : Thin Solid Films. 235, 1-2, p. 80-85 6 p.

Research output: Contribution to journalArticle

20 Citations (Scopus)
1994

An Asymmetric Side Wall Process for High Performance LDD MOSFET's

T.Horiuchi, T. H., T.Homma, T. H., Y.Murao, Y. M., K.Okumura, K. O. & Homma, T., 1994 Feb 1, In : IEEE Transactions on Electron Devices. 41, p. 186-190

Research output: Contribution to journalArticle

An Interlayer Dielectric Films Formation Technology Using TEOS/O3 APCVD SiO2 Films on Dual Frequency TEOS/O2 PECVD SiO2 Films

A.Kubo, A. K., K.Hirose, K. H., T.Homma, T. H., Y.Murao, Y. M. & Homma, T., 1994 Jun 7, In : Proceedings of 11th VLSI Multilevel Interconnection Conference. p. 94-100

Research output: Contribution to journalArticle

Asymmetric sidewall process for high performance LDD MOSFET's

Horiuchi, T., Homma, T., Murao, Y. & Okumura, K., 1994 Feb 1, In : IEEE Transactions on Electron Devices. 41, 2, p. 186-190 5 p.

Research output: Contribution to journalArticle

29 Citations (Scopus)

Properties of Liquid Phase Deposited SiO2 Films for Interlayer Dielectrics in Ultra-large-scale Integrated Circuit Multilevel Interconnections

T.Homma, T. H., Y.Murao, Y. M. & Homma, T., 1994 Sep 1, In : Thin Solid Films. 249, p. 15-21

Research output: Contribution to journalArticle

20 Citations (Scopus)
20 Citations (Scopus)
1995
16 Citations (Scopus)

H2O-TOP-PECVD: A New Plasma Enhanced CVD Technology Using Alternate TEOS-Ozone Low Pressure CVD and H2O assisted O3 Plasma Treatment

K.Kishimoto, K. K., K.Imaoka, K. I., K.Koyanagi, K. K., T.Homma, T. H. & Homma, T., 1995 Aug 21, In : Extended Abstract of International Conference on Solid State Devices and Materials (SSDM). p. 168-170

Research output: Contribution to journalArticle

1996

An SiO2 Film Deposition Technology using Tetraethylorthosilicate (TEOS) and Ozone for Interlayer Metal Dielectrics

A.Kubo, A. K., T.Homma, T. H., Y.Murao, Y. M. & Homma, T., 1996 May 1, In : Journal of the Electrochemical Society. 143, p. 1769-1773

Research output: Contribution to journalArticle

12 Citations (Scopus)

An SiO2 film deposition technology using tetraethylorthosilicate and ozone for interlayer metal dielectrics

Kubo, A., Homma, T. & Murao, Y., 1996 May, In : Journal of the Electrochemical Society. 143, 5, p. 1769-1773 5 p.

Research output: Contribution to journalArticle

12 Citations (Scopus)
12 Citations (Scopus)

Instability of Si-F bonds in fluorinated silicon oxide (SiOF) films formed by various techniques

Homma, T., 1996 May 15, In : Thin Solid Films. 278, 1-2, p. 28-31 4 p.

Research output: Contribution to journalArticle

47 Citations (Scopus)

Integrated Interconnect Module Development

J.T.Pan, J. T. P., D.Ma, D. M., T.Sahin, T. S., R.Tolles, R. T., S.Broydo, S. B., H.Miyamoto, H. M., K.Kishimoto, K. K., M.Suzuki, M. S., T.Homma, T. H., M.Kikuchi, M. K. & Homma, T., 1996 Jun 18, In : Proceedings of 13th VLSI Multilevel Interconnection Conference. p. 46-51

Research output: Contribution to journalArticle

24 Citations (Scopus)
1997

A Structural study for Efficient Electroluminescence Cells using Perylene Doped Organic Materials.

H.Kojima, H. K., A.Ozawa, A. O., T.Takahashi, T. T., M.Nagaoka, M. N., T.Homma, T. H., T.Nagatomo, T. N. & Homma, T., 1997 Oct 1, In : Jornal of The Electrochemical Society. 144, p. 3628-3633

Research output: Contribution to journalArticle

20 Citations (Scopus)

A structural study for highly efficient electroluminescence cells using perylene-doped organic materials

Kojima, H., Ozawa, A., Takahashi, T., Nagaoka, M., Homma, T., Nagatomo, T. & Omoto, O., 1997 Oct, In : Journal of the Electrochemical Society. 144, 10, p. 3628-3633 6 p.

Research output: Contribution to journalArticle

20 Citations (Scopus)