• 1582 Citations
  • 20 h-Index
1983 …2019

Research output per year

If you made any changes in Pure these will be visible here soon.

Research Output

Filter
Article
Article

A 7-Mask CMOS Process with Selective Oxide Deposition

Horiuchi, T., Homma, T., Murao, Y. & Okumura, K., 1993 Aug, In : IEEE Transactions on Electron Devices. 40, 8, p. 1455-1460 6 p.

Research output: Contribution to journalArticle

12 Citations (Scopus)

A 7-Mask CMOS Process with Selective Oxide Deposition

T.Horiuchi, T. H., K.Kanba, K. K., T.Homma, T. H., Y.Murao, Y. M., K.Okumura, K. O. & Homma, T., 1993 Aug 1, In : IEEE Transaction on Electron Devices. 40, p. 1455-1460

Research output: Contribution to journalArticle

12 Citations (Scopus)

A 7 Mask CMOS Technology Utilizing Liquid Phase Selective Oxide Deposition

K.Kanba, K. K., T.Horiuchi, T. H., T.Homma, T. H., Y.Murao, Y. M., K.Okumura, K. O. & Homma, T., 1991 Dec 8, In : Proceedings of IEEE International Electron Devices Meeting. p. 637-640

Research output: Contribution to journalArticle

4 Citations (Scopus)

A Fully Planarized Multilevel Interconnection Technology Using Selective TEOS-Ozone APCVD

M.Suzuki, M. S., T.Homma, T. H., Y.Murao, Y. M. & Homma, T., 1992 Dec 13, In : Proceedings of IEEE International Electron Devices Meeting. p. 293-296

Research output: Contribution to journalArticle

A Fully Planarized Multilevel Interconnection Technology Using Semi-Selective Tetraethoxysilane-Ozone Chemical Vapor Deposition at Atmospheric Pressure

T.Homma, T. H., M.Suzuki, M. S., Y.Murao, Y. M. & Homma, T., 1993 Dec 1, In : Journal of the Electrochemical Society. 140, p. 3591-3599

Research output: Contribution to journalArticle

12 Citations (Scopus)

A highly selective photoresist ashing process for silicon nitride films by addition of trifluoromethane

Saito, M., Eto, H., Makino, N., Omiya, K., Homma, T. & Nagatomo, T., 2001 Sep, In : Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 40, 9 A, p. 5271-5274 4 p.

Research output: Contribution to journalArticle

6 Citations (Scopus)

A High Performance Asymmetric LDD MOSFET Using Selective Oxide Deposition

T.Horiuchi, T. H., T.Homma, T. H., Y.Murao, Y. M., K.Okumura, K. O. & Homma, T., 1992 Jun 2, In : 1992 Symposium on VLSI Technology, Technical Digest. p. 88-89

Research output: Contribution to journalArticle

2 Citations (Scopus)

A Long-Lasting Polyacetylene Battery with High Energy Density

T.Nagatomo, T. N., T.Honma, T. H., C.Yamamoto, C. Y., K.Negishi, K. N., O.Omoto, O. O. & Homma, T., 1983 May 20, In : Japanese Journal of Applied Physics Letter. 22, p. L275-L277

Research output: Contribution to journalArticle

16 Citations (Scopus)

A method of removing metal ions from silicate glasses for recycling by liquid-phase deposition

Homma, T., 2001 Oct 1, In : Journal of Non-Crystalline Solids. 291, 1-2, p. 25-31 7 p.

Research output: Contribution to journalArticle

3 Citations (Scopus)

An Asymmetric Side Wall Process for High Performance LDD MOSFET's

T.Horiuchi, T. H., T.Homma, T. H., Y.Murao, Y. M., K.Okumura, K. O. & Homma, T., 1994 Feb 1, In : IEEE Transactions on Electron Devices. 41, p. 186-190

Research output: Contribution to journalArticle

A New Interlayer Dielectric Film Formation Technology Using Room Temperature Flow CVD

T.Homma, T. H., Y.Murao, Y. M. & Homma, T., 1993 Jun 8, In : Proceedings of 10th VLSI Multilevel Interconnection Conference. p. 71-75

Research output: Contribution to journalArticle

A Newly Developed High-Speed Rotating Disk CVD Equipment for Poly-Si Films

Terai, F., Kobayashi, H., Katsui, S., Sato, Y., Nagatomo, T. & Homma, T., 2005 Jan 11, In : Japanese Journal of Applied Physics. 44, p. 125-130

Research output: Contribution to journalArticle

7 Citations (Scopus)

A New Polyimide Siloxane Film for Interlayer Dielectrics in Sub-micron Multilevel Interconnection

T.Homma, T. H., K.Eguchi, K. E., Y.Numasawa, Y. N., T.Kikkawa, T. K., Y.Hokari, Y. H., K.Hamano, K. H. & Homma, T., 1988 Jun 13, In : Proceedings of 5th IEEE VLSI Multilevel Interconnection Conference. p. 279-285

Research output: Contribution to journalArticle

6 Citations (Scopus)

A New SOG Film Formation Technology Using A Room Temperature Fluoro-Alkoxy-Silane Treatment (FAST)

T.Homma, T. H., Y.Murao, Y. M. & Homma, T., 1992 Jun 9, In : Proceedings of 9th VLSI Multilevel Interconnection Conference. p. 65-71

Research output: Contribution to journalArticle

A New Trench Isolation Technology as A Replacement of LOCOS

H.Mikoshiba, H. M., T.Homma, T. H., K.Hamano, K. H. & Homma, T., 1984 Dec 9, In : Proceedings of IEEE International Electron Devices Meeting. p. 578-581

Research output: Contribution to journalArticle

10 Citations (Scopus)

An Interlayer Dielectric Films Formation Technology Using TEOS/O3 APCVD SiO2 Films on Dual Frequency TEOS/O2 PECVD SiO2 Films

A.Kubo, A. K., K.Hirose, K. H., T.Homma, T. H., Y.Murao, Y. M. & Homma, T., 1994 Jun 7, In : Proceedings of 11th VLSI Multilevel Interconnection Conference. p. 94-100

Research output: Contribution to journalArticle

An Outlier Removal Method for SPC in Semiconductor Manufactureing

Kubo, T., Minami, M. & Homma, T., 2010 Oct 5, In : SICE Journal of Control and Measurement System Integration. 3, p. 292-298

Research output: Contribution to journalArticle

An SiO2 Film Deposition Technology using Tetraethylorthosilicate (TEOS) and Ozone for Interlayer Metal Dielectrics

A.Kubo, A. K., T.Homma, T. H., Y.Murao, Y. M. & Homma, T., 1996 May 1, In : Journal of the Electrochemical Society. 143, p. 1769-1773

Research output: Contribution to journalArticle

12 Citations (Scopus)

An SiO2 film deposition technology using tetraethylorthosilicate and ozone for interlayer metal dielectrics

Kubo, A., Homma, T. & Murao, Y., 1996 May, In : Journal of the Electrochemical Society. 143, 5, p. 1769-1773 5 p.

Research output: Contribution to journalArticle

12 Citations (Scopus)

A Photoresist Removal Process with Plasma Treatment Using Gas Containing Hydrogen after Aluminum Etching

M.Saito, M. S., I.Touno, I. T., K.Omiya, K. O., T.Homma, T. H., T.Nagatomo, T. N. & Homma, T., 2002 Aug 1, In : Journal of the Electrochemical Society. 149, p. G451-G454

Research output: Contribution to journalArticle

A process for copper film deposition by pyrolysis of organic copper materials

Homma, T., Takasaki, A., Yamaguchi, M., Kokubun, H. & Machida, H., 2000 Jan 1, In : Journal of the Electrochemical Society. 147, 2, p. 580-585 6 p.

Research output: Contribution to journalArticle

7 Citations (Scopus)

A process for Copper Films Deposition by Pyrolysis of Organic Copper Materials

T.Homma, T. H., H.Kokubun, H. K., A.Takasaki, A. T., H.Machida, H. M., M.Yamaguchi, M. Y. & Homma, T., 2000 Feb 1, In : Journal of the Electrochemical Society. 147, p. 580-585

Research output: Contribution to journalArticle

7 Citations (Scopus)

A process for photoresist removal after aluminum etching using plasma treatment in a gas containing hydrogen

Saito, M., Touno, I., Omiya, K., Homma, T. & Nagatomo, T., 2002 Aug 1, In : Journal of the Electrochemical Society. 149, 8, p. G451-G454

Research output: Contribution to journalArticle

7 Citations (Scopus)

A Room Temperature Chemical Vapor Deposition SiOF Film Formation Technology for the Interlayer in Submicron Multilevel Interconnection

T.Homma, T. H., R.Yamaguchi, R. Y., Y.Murao, Y. M. & Homma, T., 1993 Mar 1, In : Journal of the Electrochemical Society. 140, p. 687-692

Research output: Contribution to journalArticle

84 Citations (Scopus)

A Room Temperature CVD Technology for Interlayer in Deep submicron Multilevel Interconnection

T.Homma, T. H., Y.Murao, Y. M. & Homma, T., 1991 Dec 8, In : Proceedings of IEEE International Electron Devices Meeting. p. 289-292

Research output: Contribution to journalArticle

5 Citations (Scopus)

A Selective SiO2 Film Formation Technology Using Liquid Phase Deposition for Fully Planarized Multilevel Interconnections

T.Homma, T. H., T.Katoh, T. K., Y.Yamada, Y. Y., Y.Murao, Y. M. & Homma, T., 1993 Aug 1, In : Journal of the Electrochemical Society. 140, p. 2410-2414

Research output: Contribution to journalArticle

65 Citations (Scopus)

A Selective SiO2 Film-Formation Technology Using Liquid-Phase Deposition for Fully Planarized Multilevel Interconnections

Homma, T., Katoh, T., Yamada, Y. & Murao, Y., 1993 Aug, In : Journal of the Electrochemical Society. 140, 8, p. 2410-2414 5 p.

Research output: Contribution to journalArticle

65 Citations (Scopus)

A Spin-On-Glass Film Treatment Technology Using a Fluoroalkoxysilane Vapor at Room Temperature

Homma, T. & Murao, Y., 1993 Jul, In : Journal of the Electrochemical Society. 140, 7, p. 2046-2051 6 p.

Research output: Contribution to journalArticle

18 Citations (Scopus)

A Spin-on-Glass Film Treatment Technology Using A Fluoroalkoxysil-ane vapor at Room Temperature

T.Homma, T. H., Y.Murao, Y. M. & Homma, T., 1993 Jul 1, In : Journal of the Electrochemical Society. 140, p. 2046-2051

Research output: Contribution to journalArticle

18 Citations (Scopus)

A Statistical Process Control Method for Semiconductor Manufacturing

Kubo, T., Ino, T., Minami, M. & Homma, T., 2009 Aug 3, In : SICE Journal of Control and Measurement System Integration. 2, p. 246-254

Research output: Contribution to journalArticle

A Structural study for Efficient Electroluminescence Cells using Perylene Doped Organic Materials.

H.Kojima, H. K., A.Ozawa, A. O., T.Takahashi, T. T., M.Nagaoka, M. N., T.Homma, T. H., T.Nagatomo, T. N. & Homma, T., 1997 Oct 1, In : Jornal of The Electrochemical Society. 144, p. 3628-3633

Research output: Contribution to journalArticle

20 Citations (Scopus)

A structural study for highly efficient electroluminescence cells using perylene-doped organic materials

Kojima, H., Ozawa, A., Takahashi, T., Nagaoka, M., Homma, T., Nagatomo, T. & Omoto, O., 1997 Oct, In : Journal of the Electrochemical Society. 144, 10, p. 3628-3633 6 p.

Research output: Contribution to journalArticle

20 Citations (Scopus)

Asymmetric sidewall process for high performance LDD MOSFET's

Horiuchi, T., Homma, T., Murao, Y. & Okumura, K., 1994 Feb 1, In : IEEE Transactions on Electron Devices. 41, 2, p. 186-190 5 p.

Research output: Contribution to journalArticle

29 Citations (Scopus)

Behavior of reaction products during puddle development in fabrication of ultralarge-scale integrations

Eto, H., Ito, Y. & Homma, T., 2007 Aug 6, In : Journal of the Electrochemical Society. 154, 9, p. H764-H768

Research output: Contribution to journalArticle

Carrier-envelope-phase Shifter for Electric-field Shaping of Optical Pulses

Nishijima, K., Takamiya, H., Homma, T., Takahashi, H., Kakehata, M., Takada, H., Kobayashi, Y. & Torizuka, K., 2005 Jan, In : IEEJ Transactions on Electronics, Information and Systems. 125, 11, p. 1686-1693 8 p.

Research output: Contribution to journalArticle

1 Citation (Scopus)

Carrier-envelope Phase stabilized Charped-pulse Amplification System using A Grating-Based Pulse Stretcher and Compressor

Kakehata, M., Takada, H., Kobayasi, Y., Torizuka, K., K.Nishijima, K. N., Homma, T., Takahashi, H., Okudo, K., Nakamura, S. & Koyamada, Y., 2004 Feb 2, In : Advanced Solid-State Photonics (ASSP) Topical Meeting. p. PD7

Research output: Contribution to journalArticle

Carrier-envelope Phase stabilized  Charped-pulse Amplification System using A Grating-Based Pulse Stretcher and Compressor

Kakehata, M., Takada, H., Kobayasi, Y., Torizuka, K., Nishijima, K., Homma, T., Takahashi, H., Okudo, K., Nakamura, S. & Koyamada, Y., 2004 Feb 2, In : Proceedings of Advanced Solid-State Photonics (ASSP) Topical Meeting. p. 170-175

Research output: Contribution to journalArticle

8 Citations (Scopus)

Carrier-envelope phase Stabilized Chirped-pulse Amplification System

Takamiya, H., Nishijima, K., Homma, T., Takahashi, H., Kakehata, M., Takada, H., Kobayashi, Y. & Torizuka, K., 2005, In : IEEJ Transactions on Electronics, Information and Systems. 125, 5, p. 742-748 7 p.

Research output: Contribution to journalArticle

1 Citation (Scopus)

Carrier-envelope phase-stabilized chirped-pulse amplification system

Takamiya, H., Kakehata, M., Nishijima, K., Takada, H., Kobayashi, Y., Homma, T., Takahashi, H. & Torizuka, K., 2006 Nov 30, In : Electrical Engineering in Japan (English translation of Denki Gakkai Ronbunshi). 157, 3, p. 35-42 8 p.

Research output: Contribution to journalArticle

Carrier-envelope-phase stabilized chirped-pulse amplification system scalable to higher pulse energies

Kakehata, M., Takada, H., Kobayashi, Y., Torizuka, K., Takamiya, H., Nishijima, K., Homma, T., Takahashi, H., Okubo, K., Nakamura, S. & Koyamada, Y., 2004 May, In : Optics Express. 12, 10, p. 2070-2080 11 p.

Research output: Contribution to journalArticle

58 Citations (Scopus)
12 Citations (Scopus)

Comparison of flow models for photoresist behavior at contact holes in thermal flow processes

Eto, H., Miyazaki, M., Kondoh, T., Shiobara, E., Ito, S. & Homma, T., 2007 Aug 31, In : Journal of the Electrochemical Society. 154, 10, p. H894-H898

Research output: Contribution to journalArticle

2 Citations (Scopus)
Open Access

Effect of sintering temperature of Ce3+-doped Lu3Al5O12 phosphors on light emission and properties of crystal structure for white-light-emitting diodes

Koizumi, H., Watabe, J., Sugiyama, S., Hirabayashi, H. & Homma, T., 2018 Jun 1, In : Optical Review. 25, 3, p. 340-348 9 p.

Research output: Contribution to journalArticle

Effect of Temperature for Photoresist Critical Dimension during Puddle Development

Eto, H. & Homma, H. EY. IT., 2007 Jun 1, In : Japanese Journal of Applied Physics. 46, p. 3354-3358

Research output: Contribution to journalArticle

1 Citation (Scopus)
1 Citation (Scopus)