Fingerprint Fingerprint is based on mining the text of the person's scientific documents to create an index of weighted terms, which defines the key subjects of each individual researcher.

Sol-gel process Engineering & Materials Science
gels Physics & Astronomy
Thin films Engineering & Materials Science
rhodamine B Chemical Compounds
Tantalum oxides Engineering & Materials Science
thin films Physics & Astronomy
Iridium Chemical Compounds
electroplating Physics & Astronomy

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Research Output 1984 2017

  • 325 Citations
  • 11 h-Index
  • 65 Article
  • 4 Conference contribution
1 Citations

Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors

Sawada, T., Nabatame, T., Dao, T. D., Yamamoto, I., Kurishima, K., Onaya, T., Ohi, A., Ito, K., Takahashi, M., Kohama, K., Ohishi, T., Ogura, A. & Nagao, T. 2017 Nov 1 In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 35, 6, 061503

Research output: Contribution to journalArticle

Buffer layers
capacitors
Capacitors
buffers
Electrodes
1 Citations

Improvement of the effective work function and transmittance of thick indium tin oxide/ultrathin ruthenium doped indium oxide bilayers as transparent conductive oxide

Taweesup, K., Yamamoto, I., Chikyow, T., Lothongkum, G., Tsukagoshi, K., Ohishi, T., Tungasmita, S., Visuttipitukul, P., Ito, K., Takahashi, M. & Nabatame, T. 2016 Jan 1 In : Thin Solid Films. 598, p. 126-130 5 p.

Research output: Contribution to journalArticle

Ruthenium
Tin oxides
indium oxides
Indium
Oxides
1 Citations

Prospectively of carbon-doped indium-tungsten-oxide channel TFT for bias stress instability

Kurishima, K., Nabatame, T., Kizu, T., Mitoma, N., Tsukagoshi, K., Sawada, T., Ohi, A., Yamamoto, I., Ohishi, T., Chikyow, T. & Ogura, A. 2016 Thin Film Transistors 13, TFT 13. 10 ed. Electrochemical Society Inc., Vol. 75, p. 149-156 8 p.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Thin film transistors
Indium
Tungsten
Carbon
Oxides

Fabrication of copper wire using glyoxylic acid copper complex and laser irradiation in air

Ohishi, T. & Kimura, R. 2015 In : Scientific Reports. 6, p. 799-808

Research output: Contribution to journalArticle

6 Citations

Electrical properties of anatase TiO<inf>2</inf> films by atomic layer deposition and low annealing temperature

Nabatame, T., Ohi, A., Chikyo, T., Kimura, M., Yamada, H. & Ohishi, T. 2014 May 1 In : Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 32, 3, 03D121

Research output: Contribution to journalArticle

Atomic layer deposition
atomic layer epitaxy
anatase
Titanium dioxide
Electric properties