• 381 Citations
  • 11 h-Index
1984 …2019
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Fingerprint Fingerprint is based on mining the text of the person's scientific documents to create an index of weighted terms, which defines the key subjects of each individual researcher.

Sol-gel process Engineering & Materials Science
gels Physics & Astronomy
Thin films Engineering & Materials Science
rhodamine B Chemical Compounds
Tantalum oxides Engineering & Materials Science
thin films Physics & Astronomy
Iridium Chemical Compounds
electroplating Physics & Astronomy

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Research Output 1984 2019

  • 381 Citations
  • 11 h-Index
  • 67 Article
  • 4 Conference contribution
  • 1 Chapter
Polyethylene Terephthalates
polyethylene terephthalate
excimers
Silicon Dioxide
Polyethylene terephthalates

Hafnium silicate gate dielectrics in GaN metal oxide semiconductor capacitors

Nabatame, T., Maeda, E., Inoue, M., Yuge, K., Hirose, M., Shiozaki, K., Ikeda, N., Ohishi, T. & Ohi, A., 2019 Jan 1, In : Applied Physics Express. 12, 1, 011009.

Research output: Contribution to journalArticle

Hafnium
hafnium
Gate dielectrics
metal oxide semiconductors
Silicates
2 Citations (Scopus)

Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors

Sawada, T., Nabatame, T., Dao, T. D., Yamamoto, I., Kurishima, K., Onaya, T., Ohi, A., Ito, K., Takahashi, M., Kohama, K., Ohishi, T., Ogura, A. & Nagao, T., 2017 Nov 1, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 35, 6, 061503.

Research output: Contribution to journalArticle

Buffer layers
capacitors
Capacitors
buffers
Electrodes
1 Citation (Scopus)

Improvement of the effective work function and transmittance of thick indium tin oxide/ultrathin ruthenium doped indium oxide bilayers as transparent conductive oxide

Taweesup, K., Yamamoto, I., Chikyow, T., Lothongkum, G., Tsukagoshi, K., Ohishi, T., Tungasmita, S., Visuttipitukul, P., Ito, K., Takahashi, M. & Nabatame, T., 2016 Jan 1, In : Thin Solid Films. 598, p. 126-130 5 p.

Research output: Contribution to journalArticle

Ruthenium
Tin oxides
indium oxides
Indium
Oxides
1 Citation (Scopus)

Prospectively of carbon-doped indium-tungsten-oxide channel TFT for bias stress instability

Kurishima, K., Nabatame, T., Kizu, T., Mitoma, N., Tsukagoshi, K., Sawada, T., Ohi, A., Yamamoto, I., Ohishi, T., Chikyow, T. & Ogura, A., 2016, Thin Film Transistors 13, TFT 13. 10 ed. Electrochemical Society Inc., Vol. 75. p. 149-156 8 p.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Thin film transistors
Indium
Tungsten
Carbon
Oxides