• 386 Citations
  • 12 h-Index
1984 …2019
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Fingerprint Fingerprint is based on mining the text of the person's scientific documents to create an index of weighted terms, which defines the key subjects of each individual researcher.

Sol-gel process Engineering & Materials Science
gels Physics & Astronomy
Thin films Engineering & Materials Science
rhodamine B Chemical Compounds
Tantalum oxides Engineering & Materials Science
thin films Physics & Astronomy
capacitors Physics & Astronomy
Iridium Chemical Compounds

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Research Output 1984 2019

  • 386 Citations
  • 12 h-Index
  • 68 Article
  • 4 Conference contribution
  • 1 Chapter
1 Citation (Scopus)

Characteristics of Al 2 O 3 /native oxide/n-GaN capacitors by post-metallization annealing

Yuge, K., Nabatame, T., Irokawa, Y., Ohi, A., Ikeda, N., Sang, L., Koide, Y. & Ohishi, T., 2019 Jan 31, In : Semiconductor Science and Technology. 34, 3, 034001.

Research output: Contribution to journalArticle

Metallizing
Oxides
capacitors
Capacitors
Annealing
Polyethylene Terephthalates
polyethylene terephthalate
excimers
Silicon Dioxide
Polyethylene terephthalates
1 Citation (Scopus)

Hafnium silicate gate dielectrics in GaN metal oxide semiconductor capacitors

Nabatame, T., Maeda, E., Inoue, M., Yuge, K., Hirose, M., Shiozaki, K., Ikeda, N., Ohishi, T. & Ohi, A., 2019 Jan 1, In : Applied Physics Express. 12, 1, 011009.

Research output: Contribution to journalArticle

Hafnium
hafnium
Gate dielectrics
metal oxide semiconductors
Silicates
2 Citations (Scopus)

Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors

Sawada, T., Nabatame, T., Dao, T. D., Yamamoto, I., Kurishima, K., Onaya, T., Ohi, A., Ito, K., Takahashi, M., Kohama, K., Ohishi, T., Ogura, A. & Nagao, T., 2017 Nov 1, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 35, 6, 061503.

Research output: Contribution to journalArticle

Buffer layers
capacitors
Capacitors
buffers
Electrodes
1 Citation (Scopus)

Improvement of the effective work function and transmittance of thick indium tin oxide/ultrathin ruthenium doped indium oxide bilayers as transparent conductive oxide

Taweesup, K., Yamamoto, I., Chikyow, T., Lothongkum, G., Tsukagoshi, K., Ohishi, T., Tungasmita, S., Visuttipitukul, P., Ito, K., Takahashi, M. & Nabatame, T., 2016 Jan 1, In : Thin Solid Films. 598, p. 126-130 5 p.

Research output: Contribution to journalArticle

Ruthenium
Tin oxides
indium oxides
Indium
Oxides