• 427 Citations
  • 12 h-Index
1984 …2019

Research output per year

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Research Output

Article

Role of oxygene vacancy in HfO2 and Al2O3 dielectrics on effective workfunction shifts using HfxRu1-x gates

Nunoshige, Y., Nabatame, T., H.Ohta, H. O., A.Toriumi, A. T., T.Ohishi, T. O. & Oishi, T., 2007 Nov 12, In : the 5th International Symposium on Control of Semiconductor Interfaces (Tokyo,Japan).

Research output: Contribution to journalArticle

Role of oxygen vacancy in HfO2 and Al2O3 dielectrics on effective workfunction shifts using HfxRu1-x gates

Y.Nunoshige, Y. N., T.Nabatame, T. N., H.Ohta, H. O., A.Toriumi, A. T., T.Ohishi, T. O. & Oishi, T., 2007 Nov 12, In : Proceedings of the 5th Inteinational Symposium on Contorol of Semiconductor Interfaces.

Research output: Contribution to journalArticle

2 Citations (Scopus)

Synthesis and characterization of V2O5 thin film derived from sol-gel method

T.Ohishi, T. O., S.Okamoto, S. O., K.Takahashi, K. T., T.Nakazawa, T. N. & Oishi, T., 1989 Aug 1, In : 5th International Workshop on Glasses and Ceramics from Gels (Rio de Janeiro, Brasil).

Research output: Contribution to journalArticle

Synthesis and properties of silicon dioxide films by sol-gel method using photoirradiation

T.Ohishi, T. O., S.Maekawa, S. M., A.Katoh, A. K. & Oishi, T., 1993 Jul 1, In : 7th International Workshop on Glasses and Ceramics from Gels (Paris, France).

Research output: Contribution to journalArticle

Synthesis and properties of tantalum oxide films by sol-gel method using photoirradiation

T.Ohishi, T. O., S.Maekawa, S. M., A.Katou, A. K. & Oishi, T., 1991 Oct 1, In : 6th International Workshop on Glasses and Ceramics from Gels (Sevilla, Spain).

Research output: Contribution to journalArticle

Synthesis and properties of tantalum oxide films prepared by the sol-gel method using photo-irradiation

Ohishi, T., Maekawa, S. & Katoh, A., 1992, In : Journal of Non-Crystalline Solids. 147-148, C, p. 493-498 6 p.

Research output: Contribution to journalArticle

55 Citations (Scopus)

Synthesis of amorphous vanadium oxide from metal alkoxide

Hioki, S., Ohishi, T., Takahashi, K. & Nakazawa, T., 1989, In : Nippon Seramikkusu Kyokai Gakujutsu Ronbunshi/Journal of the Ceramic Society of Japan. 97, 6, p. 628-633 6 p.

Research output: Contribution to journalArticle

Open Access
6 Citations (Scopus)

Synthesis of SiO2 thin films by sol-gel method using photoirradiation and molecular structure analysis - Code: EP1

Maekawa, S., Okude, K. & Ohishi, T., 1994 Jan 1, In : Journal of Sol-Gel Science and Technology. 2, 1-3, p. 497-501 5 p.

Research output: Contribution to journalArticle

19 Citations (Scopus)

The effect of oxygene in Ru gate electrode on effctive work function of Ru/HfO2 stack structure

T.Nabatame, T. N., K.Segawa, K. S., M.Kadoshima, M. K., H.Takaba, H. T., K.Iwamoto, K. I., S.Kimura, S. K., Y.Nunoshige, Y. N., H.Satake, H. S., T.Ohishi, T. O., A.Toriumi, A. T. & Oishi, T., 2006 Dec 17, In : Materials Science in Semiconductor Orocessing. 9, p. 975-979

Research output: Contribution to journalArticle

12 Citations (Scopus)

The effect of oxygen in Ru gate electrode on effective work function of Ru/HfO2 stack structure

T.Nabatame, T. N., K.Segawa, K. S., M.Kadoshima, M. K., H.Tanabe, H. T., K.Iwamoto, K. I., S.Kimura, S. K., Y.Nunoshige, Y. N., H.Satake, H. S., A.Toriumi, A. T., Ohishi, T. & Oishi, T., 2006 Jun 10, In : 2006 European Materials Research Society Spring Meeting (Nice,France).

Research output: Contribution to journalArticle

12 Citations (Scopus)

The effect of oxygen in Ru gate electrode on effective work function of Ru/HfO2 stack structure

Nabatame, T., Segawa, K., Kadoshima, M., Takaba, H., Iwamoto, K., Kimura, S., Nunoshige, Y., Satake, H., Ohishi, T. & Toriumi, A., 2006 Dec 1, In : Materials Science in Semiconductor Processing. 9, 6, p. 975-979 5 p.

Research output: Contribution to journalArticle

12 Citations (Scopus)

The effect of photo-irradiation in hydrolysis and condensation of silicon alkoxide

Okusaki, S. & Ohishi, T., 2003 May 15, In : Journal of Non-Crystalline Solids. 319, 3, p. 311-313 3 p.

Research output: Contribution to journalArticle

8 Citations (Scopus)

The effect of redox annealing on flatband voltage in ITO/HfO2 MOS capacitors

H.Yamada, H. Y., T.Nabatame, T. N., M.Kimura, M. K., A.Ohi, A. O., T.Ohishi, T. O., T.Chikyow, T. C. & Oishi, T., 2011 Nov 4, In : NIMS(物質材料研究機構)連携大学院ワークショップ、早稲田大.

Research output: Contribution to journalArticle

Thermal stability of ALD-grown Ru/HfON/Si capacitors

H.Tabata, H. T., K.Segawa, K. S., M.Kadoshima, M. K., Y.Nunoshige, Y. N., A.Ogawa, A. O., T.Nabatame, T. N., H.Satake, H. S., T.Ohishi, T. O., A.Toroumi, A. T. & Oishi, T., 2006 Jul 25, In : 6th International Coference on Atomic Layer Deposition (Seoul, Korea).

Research output: Contribution to journalArticle

What is the essence of Vfb shifts in high-k gate stack?

T.Nabatame, T. N., K.Iwamoto, K. I., K.Akiyama, K. A., Y.Nunoshige, Y. N., H.Nunoshige, H. N., H.Ota, H. O., A.Toriumi, A. T., T.Ohishi, T. O. & Oishi, T., 2007 Oct 7, In : Electrochemical Society (ECS) Transactions. 11, p. 543

Research output: Contribution to journalArticle

11 Citations (Scopus)
Chapter

Preparation and properties of SiO2 thin films by the sol-gel method using photoirradiation and its application to surface coating for display

Ohishi, T., 2005 Jan 1, Chemical Processing of Ceramics, Second Edition. CRC Press, p. 421-436 16 p.

Research output: Chapter in Book/Report/Conference proceedingChapter

1 Citation (Scopus)
Conference article

Preparation and properties of sol-gel thin film containing quinacridone latent pigment by using laser irradiation

Ohishi, T. & Ishitsuka, H., 2011 Jan 1, In : IOP Conference Series: Materials Science and Engineering. 18, SYMPOSIUM 2A, 032010.

Research output: Contribution to journalConference article

Open Access
2 Citations (Scopus)
Conference contribution

Change of electrical properties of rutile- and anatase-TiO2 films by atomic layer deposited Al2O3

Nabatame, T., Yamamoto, I., Sawada, T., Ohi, A., Dao, T. D., Ohishi, T. & Nagao, T., 2019 Jan 1, Atomic Layer Deposition Applications 15. Roozeboom, F., De Gendt, S., Dendooven, J., Elam, J. W., van der Straten, O., Liu, C., Sundaram, G. & Illiberi, A. (eds.). 3 ed. Electrochemical Society Inc., p. 15-21 7 p. (ECS Transactions; vol. 92, no. 3).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Influence of post-deposition annealing on interface characteristics at Al2O3/n-GaN

Yuge, K., Nabatame, T., Irokawa, Y., Ohi, A., Ikeda, N., Uedono, A., Sang, L., Koide, Y. & Ohishi, T., 2019 Mar, 2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019. Institute of Electrical and Electronics Engineers Inc., p. 368-370 3 p. 8731166. (2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Mechanism of Vfb shift in HfO 2 gate stack by Al diffusion from (TaC) 1-xAl x gate electrode

Nabatame, T., Kimura, M., Yamada, H., Ohi, A., Ohishi, T. & Chikyow, T., 2012 Nov 19, Dielectrics for Nanosystems 5: Materials Science, Processing, Reliability, and Manufacturing -and- Tutorials in Nanotechnology: More than Moore - Beyond CMOS Emerging Materials and Devices. 3 ed. p. 49-59 11 p. (ECS Transactions; vol. 45, no. 3).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Prospectively of carbon-doped indium-tungsten-oxide channel TFT for bias stress instability

Kurishima, K., Nabatame, T., Kizu, T., Mitoma, N., Tsukagoshi, K., Sawada, T., Ohi, A., Yamamoto, I., Ohishi, T., Chikyow, T. & Ogura, A., 2016 Jan 1, Thin Film Transistors 13, TFT 13. Kuo, Y. (ed.). 10 ed. Electrochemical Society Inc., p. 149-156 8 p. (ECS Transactions; vol. 75, no. 10).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

What is the essence of vFB shifts in high-k gate stack?

Nabatame, T., Iwamoto, K., Akiyama, K., Nunoshige, Y., Ota, H., Ohishi, T. & Toriumi, A., 2007 Dec 1, ECS Transactions - 5th International Symposium on High Dielectric Constant Materials and Gate Stacks. 4 ed. p. 543-555 13 p. (ECS Transactions; vol. 11, no. 4).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

11 Citations (Scopus)
Letter

Evaluation of SiO2 thin films prepared by sol-gel method using photoirradiation

Maekawa, S. & Ohishi, T., 1994 Mar 11, In : Journal of Non-Crystalline Solids. 169, 1-2, p. 207-209 3 p.

Research output: Contribution to journalLetter

30 Citations (Scopus)