UHV-C-AFM(Ultra High Vacuum-Conductive-Atomic Force Microscopy)によるMOSFET用ゲート絶縁膜のリーク電流の局所観察

K. Kyuno, K. Kita, A. Toriumi

Research output: Contribution to journalArticle

Original languageEnglish
JournalApplied Physics Letters
Volume86
Publication statusPublished - 2005 Apr 1

Cite this

@article{da3f09ad03584d6e833be738defeb495,
title = "UHV-C-AFM(Ultra High Vacuum-Conductive-Atomic Force Microscopy)によるMOSFET用ゲート絶縁膜のリーク電流の局所観察",
author = "K. Kyuno and K. Kita and A. Toriumi",
year = "2005",
month = "4",
day = "1",
language = "English",
volume = "86",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics Publising LLC",

}

TY - JOUR

T1 - UHV-C-AFM(Ultra High Vacuum-Conductive-Atomic Force Microscopy)によるMOSFET用ゲート絶縁膜のリーク電流の局所観察

AU - Kyuno, K.

AU - Kita, K.

AU - Toriumi, A.

PY - 2005/4/1

Y1 - 2005/4/1

M3 - Article

VL - 86

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

ER -