ＵＨＶ－Ｃ－ＡＦＭ（Ｕｌｔｒａ　Ｈｉｇｈ　Ｖａｃｕｕｍ－Ｃｏｎｄｕｃｔｉｖｅ－Ａｔｏｍｉｃ　Ｆｏｒｃｅ　Ｍｉｃｒｏｓｃｏｐｙ）によるＭＯＳＦＥＴ用ゲート絶縁膜のリーク電流の局所観察

K. Kyuno, K. Kita, A. Toriumi

Research output: Contribution to journal › Article › peer-review

Cite this

In: Applied Physics Letters, Vol. 86, 01.04.2005.

Research output: Contribution to journal › Article › peer-review

@article{da3f09ad03584d6e833be738defeb495,

title = "ＵＨＶ－Ｃ－ＡＦＭ（Ｕｌｔｒａ　Ｈｉｇｈ　Ｖａｃｕｕｍ－Ｃｏｎｄｕｃｔｉｖｅ－Ａｔｏｍｉｃ　Ｆｏｒｃｅ　Ｍｉｃｒｏｓｃｏｐｙ）によるＭＯＳＦＥＴ用ゲート絶縁膜のリーク電流の局所観察",

author = "K. Kyuno and K. Kita and A. Toriumi",

year = "2005",

month = apr,

day = "1",

language = "English",

volume = "86",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

}

TY - JOUR

T1 - ＵＨＶ－Ｃ－ＡＦＭ（Ｕｌｔｒａ　Ｈｉｇｈ　Ｖａｃｕｕｍ－Ｃｏｎｄｕｃｔｉｖｅ－Ａｔｏｍｉｃ　Ｆｏｒｃｅ　Ｍｉｃｒｏｓｃｏｐｙ）によるＭＯＳＦＥＴ用ゲート絶縁膜のリーク電流の局所観察

AU - Kyuno, K.

AU - Kita, K.

AU - Toriumi, A.

PY - 2005/4/1

Y1 - 2005/4/1

M3 - Article

SN - 0003-6951

VL - 86

JO - Applied Physics Letters

JF - Applied Physics Letters

ER -