3D-microfluidic device to remove zona pellucida fabricated by mask-less exposure technology

Yoko Yamanishi, Takuma Nakano, Yu Sawada, Kazuyoshi Itoga, Teruo Okano, Fumihito Arai

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

This paper presents a novel method of three-dimensional fabrication using Mask-less exposure equipment and a three dimensional microfluidic application for the cell manipulation. The grayscale data can directly control the height of the photoresist to be exposed without using any mask. Three-dimensional microchannel was successfully fabricated simply by using the low cost exposure system with the height range of 0-200 μm. We have succeeded in removing the zona pellucida of oocyte passing through the 3D-microchannel whose cross section is gradually restricted along the path to provide mechanical stimuli on the surface of the oocyte in every direction. This microfluidic chip contributes to the effective high throughput of the peeled oocyte without damaging them.

Original languageEnglish
Title of host publication2010 IEEE/SICE International Symposium on System Integration: SI International 2010 - The 3rd Symposium on System Integration, SII 2010, Proceedings
Pages260-265
Number of pages6
DOIs
Publication statusPublished - 2010
Externally publishedYes
Event3rd International Symposium on System Integration, SII 2010 - Sendai
Duration: 2010 Dec 212010 Dec 22

Other

Other3rd International Symposium on System Integration, SII 2010
CitySendai
Period10/12/2110/12/22

Fingerprint

Microchannels
Microfluidics
Masks
Photoresists
Throughput
Fabrication
Costs

ASJC Scopus subject areas

  • Control and Systems Engineering

Cite this

Yamanishi, Y., Nakano, T., Sawada, Y., Itoga, K., Okano, T., & Arai, F. (2010). 3D-microfluidic device to remove zona pellucida fabricated by mask-less exposure technology. In 2010 IEEE/SICE International Symposium on System Integration: SI International 2010 - The 3rd Symposium on System Integration, SII 2010, Proceedings (pp. 260-265). [5708335] https://doi.org/10.1109/SII.2010.5708335

3D-microfluidic device to remove zona pellucida fabricated by mask-less exposure technology. / Yamanishi, Yoko; Nakano, Takuma; Sawada, Yu; Itoga, Kazuyoshi; Okano, Teruo; Arai, Fumihito.

2010 IEEE/SICE International Symposium on System Integration: SI International 2010 - The 3rd Symposium on System Integration, SII 2010, Proceedings. 2010. p. 260-265 5708335.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Yamanishi, Y, Nakano, T, Sawada, Y, Itoga, K, Okano, T & Arai, F 2010, 3D-microfluidic device to remove zona pellucida fabricated by mask-less exposure technology. in 2010 IEEE/SICE International Symposium on System Integration: SI International 2010 - The 3rd Symposium on System Integration, SII 2010, Proceedings., 5708335, pp. 260-265, 3rd International Symposium on System Integration, SII 2010, Sendai, 10/12/21. https://doi.org/10.1109/SII.2010.5708335
Yamanishi Y, Nakano T, Sawada Y, Itoga K, Okano T, Arai F. 3D-microfluidic device to remove zona pellucida fabricated by mask-less exposure technology. In 2010 IEEE/SICE International Symposium on System Integration: SI International 2010 - The 3rd Symposium on System Integration, SII 2010, Proceedings. 2010. p. 260-265. 5708335 https://doi.org/10.1109/SII.2010.5708335
Yamanishi, Yoko ; Nakano, Takuma ; Sawada, Yu ; Itoga, Kazuyoshi ; Okano, Teruo ; Arai, Fumihito. / 3D-microfluidic device to remove zona pellucida fabricated by mask-less exposure technology. 2010 IEEE/SICE International Symposium on System Integration: SI International 2010 - The 3rd Symposium on System Integration, SII 2010, Proceedings. 2010. pp. 260-265
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