A 7-Mask CMOS Process with Selective Oxide Deposition

T.Horiuchi T.Horiuchi, K.Kanba K.Kanba, T.Homma T.Homma, Y.Murao Y.Murao, K.Okumura K.Okumura, Tetsuya Homma

Research output: Contribution to journalArticlepeer-review

12 Citations (Scopus)
Original languageEnglish
Pages (from-to)1455-1460
JournalIEEE Transaction on Electron Devices
Volume40
Publication statusPublished - 1993 Aug 1

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