A 7-Mask CMOS Process with Selective Oxide Deposition

T.Horiuchi T.Horiuchi, K.Kanba K.Kanba, T.Homma T.Homma, Y.Murao Y.Murao, K.Okumura K.Okumura, Tetsuya Homma

Research output: Contribution to journalArticle

12 Citations (Scopus)
Original languageEnglish
Pages (from-to)1455-1460
JournalIEEE Transaction on Electron Devices
Volume40
Publication statusPublished - 1993 Aug 1

Cite this

T.Horiuchi, T. H., K.Kanba, K. K., T.Homma, T. H., Y.Murao, Y. M., K.Okumura, K. O., & Homma, T. (1993). A 7-Mask CMOS Process with Selective Oxide Deposition. IEEE Transaction on Electron Devices, 40, 1455-1460.