A 7 Mask CMOS Technology Utilizing Liquid Phase Selective Oxide Deposition

K.Kanba K.Kanba, T.Horiuchi T.Horiuchi, T.Homma T.Homma, Y.Murao Y.Murao, K.Okumura K.Okumura, Tetsuya Homma

Research output: Contribution to journalArticle

4 Citations (Scopus)
Original languageEnglish
Pages (from-to)637-640
JournalProceedings of IEEE International Electron Devices Meeting
Publication statusPublished - 1991 Dec 8

Cite this

K.Kanba, K. K., T.Horiuchi, T. H., T.Homma, T. H., Y.Murao, Y. M., K.Okumura, K. O., & Homma, T. (1991). A 7 Mask CMOS Technology Utilizing Liquid Phase Selective Oxide Deposition. Proceedings of IEEE International Electron Devices Meeting, 637-640.