A degradation-free Cu/HSQ damascene technology using metal mask patterning and post-CMP cleaning by electrolytic ionized water

H.Aoki H.Aoki, S.Yamazaki S.Yamazaki, T.Usami T.Usami, Y.Tsuchiya Y.Tsuchiya, N.Ito N.Ito, T.Onodera T.Onodera, Y.Hayash Y.Hayash, K.Ueno K.Ueno, H.Gomi H.Gomi, Kazuyoshi Ueno

Research output: Contribution to journalArticle

8 Citations (Scopus)
Original languageEnglish
Pages (from-to)777-780
Journal1997 IEDM Technical Digest
Publication statusPublished - 1997 Dec 1

Cite this

H.Aoki, H. A., S.Yamazaki, S. Y., T.Usami, T. U., Y.Tsuchiya, Y. T., N.Ito, N. I., T.Onodera, T. O., ... Ueno, K. (1997). A degradation-free Cu/HSQ damascene technology using metal mask patterning and post-CMP cleaning by electrolytic ionized water. 1997 IEDM Technical Digest, 777-780.

A degradation-free Cu/HSQ damascene technology using metal mask patterning and post-CMP cleaning by electrolytic ionized water. / H.Aoki, H.Aoki; S.Yamazaki, S.Yamazaki; T.Usami, T.Usami; Y.Tsuchiya, Y.Tsuchiya; N.Ito, N.Ito; T.Onodera, T.Onodera; Y.Hayash, Y.Hayash; K.Ueno, K.Ueno; H.Gomi, H.Gomi; Ueno, Kazuyoshi.

In: 1997 IEDM Technical Digest, 01.12.1997, p. 777-780.

Research output: Contribution to journalArticle

H.Aoki, HA, S.Yamazaki, SY, T.Usami, TU, Y.Tsuchiya, YT, N.Ito, NI, T.Onodera, TO, Y.Hayash, YH, K.Ueno, KU, H.Gomi, HG & Ueno, K 1997, 'A degradation-free Cu/HSQ damascene technology using metal mask patterning and post-CMP cleaning by electrolytic ionized water', 1997 IEDM Technical Digest, pp. 777-780.
H.Aoki HA, S.Yamazaki SY, T.Usami TU, Y.Tsuchiya YT, N.Ito NI, T.Onodera TO et al. A degradation-free Cu/HSQ damascene technology using metal mask patterning and post-CMP cleaning by electrolytic ionized water. 1997 IEDM Technical Digest. 1997 Dec 1;777-780.
H.Aoki, H.Aoki ; S.Yamazaki, S.Yamazaki ; T.Usami, T.Usami ; Y.Tsuchiya, Y.Tsuchiya ; N.Ito, N.Ito ; T.Onodera, T.Onodera ; Y.Hayash, Y.Hayash ; K.Ueno, K.Ueno ; H.Gomi, H.Gomi ; Ueno, Kazuyoshi. / A degradation-free Cu/HSQ damascene technology using metal mask patterning and post-CMP cleaning by electrolytic ionized water. In: 1997 IEDM Technical Digest. 1997 ; pp. 777-780.
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author = "H.Aoki H.Aoki and S.Yamazaki S.Yamazaki and T.Usami T.Usami and Y.Tsuchiya Y.Tsuchiya and N.Ito N.Ito and T.Onodera T.Onodera and Y.Hayash Y.Hayash and K.Ueno K.Ueno and H.Gomi H.Gomi and Kazuyoshi Ueno",
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AU - S.Yamazaki, S.Yamazaki

AU - T.Usami, T.Usami

AU - Y.Tsuchiya, Y.Tsuchiya

AU - N.Ito, N.Ito

AU - T.Onodera, T.Onodera

AU - Y.Hayash, Y.Hayash

AU - K.Ueno, K.Ueno

AU - H.Gomi, H.Gomi

AU - Ueno, Kazuyoshi

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JO - 1997 IEDM Technical Digest

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