Original language | English |
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Pages (from-to) | 3591-3599 |
Journal | Journal of the Electrochemical Society |
Volume | 140 |
Publication status | Published - 1993 Dec 1 |
A Fully Planarized Multilevel Interconnection Technology Using Semi-Selective Tetraethoxysilane-Ozone Chemical Vapor Deposition at Atmospheric Pressure
T.Homma T.Homma, M.Suzuki M.Suzuki, Y.Murao Y.Murao, Tetsuya Homma
Research output: Contribution to journal › Article › peer-review
13
Citations
(Scopus)