A Fully Planarized Multilevel Interconnection Technology Using Semi-Selective Tetraethoxysilane-Ozone Chemical Vapor Deposition at Atmospheric Pressure

T.Homma T.Homma, M.Suzuki M.Suzuki, Y.Murao Y.Murao, Tetsuya Homma

Research output: Contribution to journalArticlepeer-review

12 Citations (Scopus)
Original languageEnglish
Pages (from-to)3591-3599
JournalJournal of the Electrochemical Society
Volume140
Publication statusPublished - 1993 Dec 1

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