A High Performance Asymmetric LDD MOSFET Using Selective Oxide Deposition

T.Horiuchi T.Horiuchi, T.Homma T.Homma, Y.Murao Y.Murao, K.Okumura K.Okumura, Tetsuya Homma

Research output: Contribution to journalArticle

2 Citations (Scopus)
Original languageEnglish
Pages (from-to)88-89
Journal1992 Symposium on VLSI Technology, Technical Digest
Publication statusPublished - 1992 Jun 2

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