A New Interlayer Dielectric Film Formation Technology Using Room Temperature Flow CVD

T.Homma T.Homma, Y.Murao Y.Murao, Tetsuya Homma

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)71-75
JournalProceedings of 10th VLSI Multilevel Interconnection Conference
Publication statusPublished - 1993 Jun 8

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