A New Polyimide Siloxane Film for Interlayer Dielectrics in Sub-micron Multilevel Interconnection

T.Homma T.Homma; K.Eguchi K.Eguchi; Y.Numasawa Y.Numasawa; T.Kikkawa T.Kikkawa; Y.Hokari Y.Hokari; K.Hamano K.Hamano; Tetsuya Homma

A New Polyimide Siloxane Film for Interlayer Dielectrics in Sub-micron Multilevel Interconnection

T.Homma T.Homma, K.Eguchi K.Eguchi, Y.Numasawa Y.Numasawa, T.Kikkawa T.Kikkawa, Y.Hokari Y.Hokari, K.Hamano K.Hamano, Tetsuya Homma

Functional Control Systems

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Original language	English
Pages (from-to)	279-285
Journal	Proceedings of 5th IEEE VLSI Multilevel Interconnection Conference
Publication status	Published - 1988 Jun 13

Cite this

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title = "A New Polyimide Siloxane Film for Interlayer Dielectrics in Sub-micron Multilevel Interconnection",

author = "T.Homma T.Homma and K.Eguchi K.Eguchi and Y.Numasawa Y.Numasawa and T.Kikkawa T.Kikkawa and Y.Hokari Y.Hokari and K.Hamano K.Hamano and Tetsuya Homma",

year = "1988",

month = jun,

day = "13",

language = "English",

pages = "279--285",

journal = "Proceedings of 5th IEEE VLSI Multilevel Interconnection Conference",

}

TY - JOUR

T1 - A New Polyimide Siloxane Film for Interlayer Dielectrics in Sub-micron Multilevel Interconnection

AU - T.Homma, T.Homma

AU - K.Eguchi, K.Eguchi

AU - Y.Numasawa, Y.Numasawa

AU - T.Kikkawa, T.Kikkawa

AU - Y.Hokari, Y.Hokari

AU - K.Hamano, K.Hamano

AU - Homma, Tetsuya

PY - 1988/6/13

Y1 - 1988/6/13

M3 - Article

SP - 279

EP - 285

JO - Proceedings of 5th IEEE VLSI Multilevel Interconnection Conference

JF - Proceedings of 5th IEEE VLSI Multilevel Interconnection Conference

ER -