A New Polyimide Siloxane Film for Interlayer Dielectrics in Sub-micron Multilevel Interconnection

T.Homma T.Homma; K.Eguchi K.Eguchi; Y.Numasawa Y.Numasawa; T.Kikkawa T.Kikkawa; Y.Hokari Y.Hokari; K.Hamano K.Hamano; Tetsuya Homma

A New Polyimide Siloxane Film for Interlayer Dielectrics in Sub-micron Multilevel Interconnection

T.Homma T.Homma, K.Eguchi K.Eguchi, Y.Numasawa Y.Numasawa, T.Kikkawa T.Kikkawa, Y.Hokari Y.Hokari, K.Hamano K.Hamano, Tetsuya Homma

Functional Control Systems

Research output: Contribution to journal › Article › peer-review

6 Citations (Scopus)

Original language	English
Pages (from-to)	279-285
Journal	Proceedings of 5th IEEE VLSI Multilevel Interconnection Conference
Publication status	Published - 1988 Jun 13

Cite this

A New Polyimide Siloxane Film for Interlayer Dielectrics in Sub-micron Multilevel Interconnection. / T.Homma, T.Homma; K.Eguchi, K.Eguchi; Y.Numasawa, Y.Numasawa; T.Kikkawa, T.Kikkawa; Y.Hokari, Y.Hokari; K.Hamano, K.Hamano; Homma, Tetsuya.

In: Proceedings of 5th IEEE VLSI Multilevel Interconnection Conference, 13.06.1988, p. 279-285.

Research output: Contribution to journal › Article › peer-review

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AU - Homma, Tetsuya

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