A New SOG Film Formation Technology Using A Room Temperature Fluoro-Alkoxy-Silane Treatment (FAST)

T.Homma T.Homma, Y.Murao Y.Murao, Tetsuya Homma

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)65-71
JournalProceedings of 9th VLSI Multilevel Interconnection Conference
Publication statusPublished - 1992 Jun 9

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