A Newly Developed High-Speed Rotating Disk CVD Equipment for Poly-Si Films

F. Terai, H. Kobayashi, S. Katsui, Y. Sato, T. Nagatomo, T. Homma

Research output: Contribution to journalArticle

7 Citations (Scopus)
Original languageEnglish
Pages (from-to)125-130
JournalJapanese Journal of Applied Physics
Volume44
Publication statusPublished - 2005 Jan 11

Cite this

Terai, F., Kobayashi, H., Katsui, S., Sato, Y., Nagatomo, T., & Homma, T. (2005). A Newly Developed High-Speed Rotating Disk CVD Equipment for Poly-Si Films. Japanese Journal of Applied Physics, 44, 125-130.

A Newly Developed High-Speed Rotating Disk CVD Equipment for Poly-Si Films. / Terai, F.; Kobayashi, H.; Katsui, S.; Sato, Y.; Nagatomo, T.; Homma, T.

In: Japanese Journal of Applied Physics, Vol. 44, 11.01.2005, p. 125-130.

Research output: Contribution to journalArticle

Terai, F, Kobayashi, H, Katsui, S, Sato, Y, Nagatomo, T & Homma, T 2005, 'A Newly Developed High-Speed Rotating Disk CVD Equipment for Poly-Si Films', Japanese Journal of Applied Physics, vol. 44, pp. 125-130.
Terai F, Kobayashi H, Katsui S, Sato Y, Nagatomo T, Homma T. A Newly Developed High-Speed Rotating Disk CVD Equipment for Poly-Si Films. Japanese Journal of Applied Physics. 2005 Jan 11;44:125-130.
Terai, F. ; Kobayashi, H. ; Katsui, S. ; Sato, Y. ; Nagatomo, T. ; Homma, T. / A Newly Developed High-Speed Rotating Disk CVD Equipment for Poly-Si Films. In: Japanese Journal of Applied Physics. 2005 ; Vol. 44. pp. 125-130.
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