A Newly Developed High-Speed Rotating Disk CVD Equipment for Poly-Si Films

F. Terai, H. Kobayashi, S. Katsui, Y. Sato, T. Nagatomo, T. Homma

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)
Original languageEnglish
Pages (from-to)125-130
JournalJapanese Journal of Applied Physics
Volume44
Publication statusPublished - 2005 Jan 11

Cite this