A Newly Developed High-Speed Rotating Disk CVD Equipment for Poly-Si Films

F. Terai, H. Kobayashi, S. Katsui, Y. Sato, T. Nagatomo, T. Homma

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	125-130
Journal	Japanese Journal of Applied Physics
Volume	44
Publication status	Published - 2005 Jan 11

Cite this

@article{3dbcd2ad8dfa415186c3f511818ed99f,

title = "A Newly Developed High-Speed Rotating Disk CVD Equipment for Poly-Si Films",

author = "F. Terai and H. Kobayashi and S. Katsui and Y. Sato and T. Nagatomo and T. Homma",

year = "2005",

month = jan,

day = "11",

language = "English",

volume = "44",

pages = "125--130",

journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

}

TY - JOUR

T1 - A Newly Developed High-Speed Rotating Disk CVD Equipment for Poly-Si Films

AU - Terai, F.

AU - Kobayashi, H.

AU - Katsui, S.

AU - Sato, Y.

AU - Nagatomo, T.

AU - Homma, T.

PY - 2005/1/11

Y1 - 2005/1/11

M3 - Article

SN - 0021-4922

VL - 44

SP - 125

EP - 130

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

ER -