A Numerical Study on the Macroscopic Kinetics of the Ring-OSF in the Silicon CZ Growth by the Model Using Self-Interstitials as the Dominant Diffusers.

Naoki Ono, Kazuhiro Harada, Jun Furukawa, Kazuya Suzuki, Michio Kida, Yasushi Shimanuki

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)503-514
JournalElectrochemical Society "Semiconductor Silicon 1998" meeting proceeding
Volume1998-1
Publication statusPublished - 1998 May 1

Cite this

A Numerical Study on the Macroscopic Kinetics of the Ring-OSF in the Silicon CZ Growth by the Model Using Self-Interstitials as the Dominant Diffusers. / Ono, Naoki; Harada, Kazuhiro; Furukawa, Jun; Suzuki, Kazuya; Kida, Michio; Shimanuki, Yasushi.

In: Electrochemical Society "Semiconductor Silicon 1998" meeting proceeding, Vol. 1998-1, 01.05.1998, p. 503-514.

Research output: Contribution to journalArticle

@article{554653e2521d4a5cbfb1978a68d29c9e,
title = "A Numerical Study on the Macroscopic Kinetics of the Ring-OSF in the Silicon CZ Growth by the Model Using Self-Interstitials as the Dominant Diffusers.",
author = "Naoki Ono and Kazuhiro Harada and Jun Furukawa and Kazuya Suzuki and Michio Kida and Yasushi Shimanuki",
year = "1998",
month = "5",
day = "1",
language = "English",
volume = "1998-1",
pages = "503--514",
journal = "Electrochemical Society {"}Semiconductor Silicon 1998{"} meeting proceeding",

}

TY - JOUR

T1 - A Numerical Study on the Macroscopic Kinetics of the Ring-OSF in the Silicon CZ Growth by the Model Using Self-Interstitials as the Dominant Diffusers.

AU - Ono, Naoki

AU - Harada, Kazuhiro

AU - Furukawa, Jun

AU - Suzuki, Kazuya

AU - Kida, Michio

AU - Shimanuki, Yasushi

PY - 1998/5/1

Y1 - 1998/5/1

M3 - Article

VL - 1998-1

SP - 503

EP - 514

JO - Electrochemical Society "Semiconductor Silicon 1998" meeting proceeding

JF - Electrochemical Society "Semiconductor Silicon 1998" meeting proceeding

ER -