| Original language | English |
|---|---|
| Pages (from-to) | G451-G454 |
| Journal | Journal of the Electrochemical Society |
| Volume | 149 |
| Publication status | Published - 2002 Aug 1 |
Cite this
M.Saito, M. S., I.Touno, I. T., K.Omiya, K. O., T.Homma, T. H., T.Nagatomo, T. N., & Homma, T. (2002). A Photoresist Removal Process with Plasma Treatment Using Gas Containing Hydrogen after Aluminum Etching. Journal of the Electrochemical Society, 149, G451-G454.
A Photoresist Removal Process with Plasma Treatment Using Gas Containing Hydrogen after Aluminum Etching. / M.Saito, M.Saito; I.Touno, I.Touno; K.Omiya, K.Omiya; T.Homma, T.Homma; T.Nagatomo, T.Nagatomo; Homma, Tetsuya.
In: Journal of the Electrochemical Society, Vol. 149, 01.08.2002, p. G451-G454.Research output: Contribution to journal › Article
M.Saito, MS, I.Touno, IT, K.Omiya, KO, T.Homma, TH, T.Nagatomo, TN & Homma, T 2002, 'A Photoresist Removal Process with Plasma Treatment Using Gas Containing Hydrogen after Aluminum Etching', Journal of the Electrochemical Society, vol. 149, pp. G451-G454.
M.Saito MS, I.Touno IT, K.Omiya KO, T.Homma TH, T.Nagatomo TN, Homma T. A Photoresist Removal Process with Plasma Treatment Using Gas Containing Hydrogen after Aluminum Etching. Journal of the Electrochemical Society. 2002 Aug 1;149:G451-G454.
@article{71adcf96ab014df0bd736733e60c3807,
title = "A Photoresist Removal Process with Plasma Treatment Using Gas Containing Hydrogen after Aluminum Etching",
author = "M.Saito M.Saito and I.Touno I.Touno and K.Omiya K.Omiya and T.Homma T.Homma and T.Nagatomo T.Nagatomo and Tetsuya Homma",
year = "2002",
month = "8",
day = "1",
language = "English",
volume = "149",
pages = "G451--G454",
journal = "Journal of the Electrochemical Society",
issn = "0013-4651",
publisher = "Electrochemical Society, Inc.",
}
TY - JOUR
T1 - A Photoresist Removal Process with Plasma Treatment Using Gas Containing Hydrogen after Aluminum Etching
AU - M.Saito, M.Saito
AU - I.Touno, I.Touno
AU - K.Omiya, K.Omiya
AU - T.Homma, T.Homma
AU - T.Nagatomo, T.Nagatomo
AU - Homma, Tetsuya
PY - 2002/8/1
Y1 - 2002/8/1
M3 - Article
VL - 149
SP - G451-G454
JO - Journal of the Electrochemical Society
JF - Journal of the Electrochemical Society
SN - 0013-4651
ER -