Original language | English |
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Pages (from-to) | G451-G454 |
Journal | Journal of the Electrochemical Society |
Volume | 149 |
Publication status | Published - 2002 Aug 1 |
A Photoresist Removal Process with Plasma Treatment Using Gas Containing Hydrogen after Aluminum Etching
M.Saito M.Saito, I.Touno I.Touno, K.Omiya K.Omiya, T.Homma T.Homma, T.Nagatomo T.Nagatomo, Tetsuya Homma
Research output: Contribution to journal › Article › peer-review