A quarter-micron planarized interconnection technology with self-aligned plug

Kazuyoshi Ueno, K. Ohto, K. Tsunenari, K. Kajiyana, K. Kikuta, T. Kikkawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

10 Citations (Scopus)

Abstract

In order to realize minimum pitch interconnections without degrading reliability, self-aligned contacts (SACs) between interconnections and plugs are necessary. The planarized interconnections with SAC plugs is formed for quarter-micron size as follows. Interconnection trenches and contact holes are formed using a self-aligned etch-stop layer, followed by simultaneous metal-filling into the trenches and contact holes. Si-rich oxide (SRO) films are found to be promising for a self-aligned etch-stop layer with their high etching selectivity to SiO2 as high as 10-30. Sufficiently low line resistance of 15 k Omega /cm and low contact resistance of 70 Omega /contact are obtained with the quarter-micron W-interconnection with the SAC plugs.

Original languageEnglish
Title of host publication1992 International Technical Digest on Electron Devices Meeting, IEDM 1992
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages305-308
Number of pages4
ISBN (Electronic)0780308174
DOIs
Publication statusPublished - 1992 Jan 1
Externally publishedYes
Event1992 International Technical Digest on Electron Devices Meeting, IEDM 1992 - San Francisco, United States
Duration: 1992 Dec 131992 Dec 16

Publication series

NameTechnical Digest - International Electron Devices Meeting, IEDM
Volume1992-December
ISSN (Print)0163-1918

Conference

Conference1992 International Technical Digest on Electron Devices Meeting, IEDM 1992
CountryUnited States
CitySan Francisco
Period92/12/1392/12/16

Fingerprint

Contact resistance
plugs
Oxide films
Etching
Metals
electric contacts
contact resistance
oxide films
selectivity
etching
metals

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry

Cite this

Ueno, K., Ohto, K., Tsunenari, K., Kajiyana, K., Kikuta, K., & Kikkawa, T. (1992). A quarter-micron planarized interconnection technology with self-aligned plug. In 1992 International Technical Digest on Electron Devices Meeting, IEDM 1992 (pp. 305-308). [307366] (Technical Digest - International Electron Devices Meeting, IEDM; Vol. 1992-December). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IEDM.1992.307366

A quarter-micron planarized interconnection technology with self-aligned plug. / Ueno, Kazuyoshi; Ohto, K.; Tsunenari, K.; Kajiyana, K.; Kikuta, K.; Kikkawa, T.

1992 International Technical Digest on Electron Devices Meeting, IEDM 1992. Institute of Electrical and Electronics Engineers Inc., 1992. p. 305-308 307366 (Technical Digest - International Electron Devices Meeting, IEDM; Vol. 1992-December).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Ueno, K, Ohto, K, Tsunenari, K, Kajiyana, K, Kikuta, K & Kikkawa, T 1992, A quarter-micron planarized interconnection technology with self-aligned plug. in 1992 International Technical Digest on Electron Devices Meeting, IEDM 1992., 307366, Technical Digest - International Electron Devices Meeting, IEDM, vol. 1992-December, Institute of Electrical and Electronics Engineers Inc., pp. 305-308, 1992 International Technical Digest on Electron Devices Meeting, IEDM 1992, San Francisco, United States, 92/12/13. https://doi.org/10.1109/IEDM.1992.307366
Ueno K, Ohto K, Tsunenari K, Kajiyana K, Kikuta K, Kikkawa T. A quarter-micron planarized interconnection technology with self-aligned plug. In 1992 International Technical Digest on Electron Devices Meeting, IEDM 1992. Institute of Electrical and Electronics Engineers Inc. 1992. p. 305-308. 307366. (Technical Digest - International Electron Devices Meeting, IEDM). https://doi.org/10.1109/IEDM.1992.307366
Ueno, Kazuyoshi ; Ohto, K. ; Tsunenari, K. ; Kajiyana, K. ; Kikuta, K. ; Kikkawa, T. / A quarter-micron planarized interconnection technology with self-aligned plug. 1992 International Technical Digest on Electron Devices Meeting, IEDM 1992. Institute of Electrical and Electronics Engineers Inc., 1992. pp. 305-308 (Technical Digest - International Electron Devices Meeting, IEDM).
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