A reliable double level interconnection technology for giga bit DRAMs using SiO2 mask Al etching and PECVD SiOF

T.Yokoyama T.Yokoyama, Y.Yamada Y.Yamada, K.Kishimoto K.Kishimoto, T.Usami T.Usami, H.Kawamoto H.Kawamoto, H.Gomi H.Gomi, K.Ueno K.Ueno, Kazuyoshi Ueno

Research output: Contribution to journal › Article

Original languageEnglish
Pages (from-to)288-290
JournalExtended Abstracts of 1997 International Conf. On Solid State Devices and Materials
Publication statusPublished - 1997 Sep 1

Cite this

A reliable double level interconnection technology for giga bit DRAMs using SiO2 mask Al etching and PECVD SiOF. / T.Yokoyama, T.Yokoyama; Y.Yamada, Y.Yamada; K.Kishimoto, K.Kishimoto; T.Usami, T.Usami; H.Kawamoto, H.Kawamoto; H.Gomi, H.Gomi; K.Ueno, K.Ueno; Ueno, Kazuyoshi.

In: Extended Abstracts of 1997 International Conf. On Solid State Devices and Materials, 01.09.1997, p. 288-290.

Research output: Contribution to journal › Article

T.Yokoyama, TY, Y.Yamada, YY, K.Kishimoto, KK, T.Usami, TU, H.Kawamoto, HK, H.Gomi, HG, K.Ueno, KU & Ueno, K 1997, 'A reliable double level interconnection technology for giga bit DRAMs using SiO2 mask Al etching and PECVD SiOF', Extended Abstracts of 1997 International Conf. On Solid State Devices and Materials, pp. 288-290.
T.Yokoyama TY, Y.Yamada YY, K.Kishimoto KK, T.Usami TU, H.Kawamoto HK, H.Gomi HG et al. A reliable double level interconnection technology for giga bit DRAMs using SiO2 mask Al etching and PECVD SiOF. Extended Abstracts of 1997 International Conf. On Solid State Devices and Materials. 1997 Sep 1;288-290.
T.Yokoyama, T.Yokoyama ; Y.Yamada, Y.Yamada ; K.Kishimoto, K.Kishimoto ; T.Usami, T.Usami ; H.Kawamoto, H.Kawamoto ; H.Gomi, H.Gomi ; K.Ueno, K.Ueno ; Ueno, Kazuyoshi. / A reliable double level interconnection technology for giga bit DRAMs using SiO2 mask Al etching and PECVD SiOF. In: Extended Abstracts of 1997 International Conf. On Solid State Devices and Materials. 1997 ; pp. 288-290.
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AU - K.Kishimoto, K.Kishimoto

AU - T.Usami, T.Usami

AU - H.Kawamoto, H.Kawamoto

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AU - K.Ueno, K.Ueno

AU - Ueno, Kazuyoshi

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JO - Extended Abstracts of 1997 International Conf. On Solid State Devices and Materials

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