Original language | English |
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Pages (from-to) | 687-692 |
Journal | Journal of the Electrochemical Society |
Volume | 140 |
Publication status | Published - 1993 Mar 1 |
A Room Temperature Chemical Vapor Deposition SiOF Film Formation Technology for the Interlayer in Submicron Multilevel Interconnection
T.Homma T.Homma, R.Yamaguchi R.Yamaguchi, Y.Murao Y.Murao, Tetsuya Homma
Research output: Contribution to journal › Article › peer-review
87
Citations
(Scopus)