A Room Temperature Chemical Vapor Deposition SiOF Film Formation Technology for the Interlayer in Submicron Multilevel Interconnection

T.Homma T.Homma, R.Yamaguchi R.Yamaguchi, Y.Murao Y.Murao, Tetsuya Homma

Research output: Contribution to journalArticle

84 Citations (Scopus)
Original languageEnglish
Pages (from-to)687-692
JournalJournal of the Electrochemical Society
Volume140
Publication statusPublished - 1993 Mar 1

Cite this

A Room Temperature Chemical Vapor Deposition SiOF Film Formation Technology for the Interlayer in Submicron Multilevel Interconnection. / T.Homma, T.Homma; R.Yamaguchi, R.Yamaguchi; Y.Murao, Y.Murao; Homma, Tetsuya.

In: Journal of the Electrochemical Society, Vol. 140, 01.03.1993, p. 687-692.

Research output: Contribution to journalArticle

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