A Selective SiO2 Film Formation Technology Using Liquid Phase Deposition for Fully Planarized Multilevel Interconnections

T.Homma T.Homma, T.Katoh T.Katoh, Y.Yamada Y.Yamada, Y.Murao Y.Murao, Tetsuya Homma

Research output: Contribution to journalArticle

66 Citations (Scopus)
Original languageEnglish
Pages (from-to)2410-2414
JournalJournal of the Electrochemical Society
Volume140
Publication statusPublished - 1993 Aug 1

Cite this