An algorithm to visualize tool difference transitions in semiconductor fabrications

Tomoaki Kubo, Masateru Minami, Tetsuya Homma

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

To solve tool difference problems in semiconductor fabrication, it is necessary to identify problematic tool from numbers of process tools and process steps, and discover the cause of its performance difference. In this paper we propose a method to assist engineers in finding cause of tool difference. This method visualizes tool difference transition by post-processing results of periodically executed regression analysis. Effectiveness of this method is shown by Monte Carlo simulation based on a conceptual model of a fabrication line.

Original languageEnglish
Title of host publication2008 International Symposium on Semiconductor Manufacturing, ISSM 2008
Pages215-218
Number of pages4
Publication statusPublished - 2008 Dec 1
Event2008 17th International Symposium on Semiconductor Manufacturing, ISSM 2008 - Tokyo, Japan
Duration: 2008 Oct 272008 Oct 29

Publication series

NameIEEE International Symposium on Semiconductor Manufacturing Conference Proceedings
ISSN (Print)1523-553X

Conference

Conference2008 17th International Symposium on Semiconductor Manufacturing, ISSM 2008
CountryJapan
CityTokyo
Period08/10/2708/10/29

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Engineering(all)
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

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  • Cite this

    Kubo, T., Minami, M., & Homma, T. (2008). An algorithm to visualize tool difference transitions in semiconductor fabrications. In 2008 International Symposium on Semiconductor Manufacturing, ISSM 2008 (pp. 215-218). [5714922] (IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings).