An SiO2 Film Deposition Technology using Tetraethylorthosilicate (TEOS) and Ozone for Interlayer Metal Dielectrics

A.Kubo A.Kubo, T.Homma T.Homma, Y.Murao Y.Murao, Tetsuya Homma

Research output: Contribution to journalArticle

12 Citations (Scopus)
Original languageEnglish
Pages (from-to)1769-1773
JournalJournal of the Electrochemical Society
Volume143
Publication statusPublished - 1996 May 1

Cite this

An SiO2 Film Deposition Technology using Tetraethylorthosilicate (TEOS) and Ozone for Interlayer Metal Dielectrics. / A.Kubo, A.Kubo; T.Homma, T.Homma; Y.Murao, Y.Murao; Homma, Tetsuya.

In: Journal of the Electrochemical Society, Vol. 143, 01.05.1996, p. 1769-1773.

Research output: Contribution to journalArticle

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AU - Homma, Tetsuya

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