Anisotropic etching of dielectrics exposed by high intensity femtosecond pulses

Saulius Juodkazis, Yuusuke Tabuchi, Takahiro Ebisui, Shigeki Matsuo, Hiroaki Misawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

9 Citations (Scopus)

Abstract

Post-processing of crystalline and glass materials after the exposure to femtosecond pulses was carried out by wet etching in water solutions of hydrofluoric acid. Crystalline sapphire and quartz showed high (larger than 100) anisotropy of etching, which allowed to develop high-aspect-ratio three-dimensional structures in the volume of those dielectrics. In silicate glasses the anisotropy of wet etching can be achieved by a proper selection of the overlap of adjacent pulses during recording, their energy, and focusing. Three-dimensional structures in silica glass (viosil with OH concentration below 1200 ppm) with a high aspect ratio of 100 were achieved. The mechanism of anisotropy in wet etching is discussed. Surface irradiation of sapphire at irradiance close to that of surface ablation recorded structural modifications resembling the ripples. Those structures were made observable only after wet etching. Period of the ripples can be explained by the recently presented theory (Y. Shimotsuma et al., Phys. Rev. Lett. 91 247405-1 (2003)). Sub-micrometer structuring of surface is demonstrated. Electron temperature at the moment of structure recording can be estimated from the period of ripples (for sapphire T e ≃ 11 keV was found).

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsI.A. Shcherbakov, A. Giardini, V.I. Konov, V.I. Pustovoy
Pages59-66
Number of pages8
Volume5850
DOIs
Publication statusPublished - 2005
Externally publishedYes
EventAdvanced Laser Technologies 2004 - Rome and Frascati, Italy
Duration: 2004 Sep 102004 Sep 15

Other

OtherAdvanced Laser Technologies 2004
CountryItaly
CityRome and Frascati
Period04/9/1004/9/15

Fingerprint

Anisotropic etching
Wet etching
Ultrashort pulses
Sapphire
etching
Anisotropy
ripples
pulses
sapphire
Aspect ratio
high aspect ratio
anisotropy
Crystalline materials
Glass
Hydrofluoric acid
recording
Electron temperature
Fused silica
Ablation
glass

Keywords

  • Anisotropic wet etching
  • Femtosecond laser microfabrication
  • Microfluidics
  • Ripple formation

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Juodkazis, S., Tabuchi, Y., Ebisui, T., Matsuo, S., & Misawa, H. (2005). Anisotropic etching of dielectrics exposed by high intensity femtosecond pulses. In I. A. Shcherbakov, A. Giardini, V. I. Konov, & V. I. Pustovoy (Eds.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 5850, pp. 59-66). [08] https://doi.org/10.1117/12.633670

Anisotropic etching of dielectrics exposed by high intensity femtosecond pulses. / Juodkazis, Saulius; Tabuchi, Yuusuke; Ebisui, Takahiro; Matsuo, Shigeki; Misawa, Hiroaki.

Proceedings of SPIE - The International Society for Optical Engineering. ed. / I.A. Shcherbakov; A. Giardini; V.I. Konov; V.I. Pustovoy. Vol. 5850 2005. p. 59-66 08.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Juodkazis, S, Tabuchi, Y, Ebisui, T, Matsuo, S & Misawa, H 2005, Anisotropic etching of dielectrics exposed by high intensity femtosecond pulses. in IA Shcherbakov, A Giardini, VI Konov & VI Pustovoy (eds), Proceedings of SPIE - The International Society for Optical Engineering. vol. 5850, 08, pp. 59-66, Advanced Laser Technologies 2004, Rome and Frascati, Italy, 04/9/10. https://doi.org/10.1117/12.633670
Juodkazis S, Tabuchi Y, Ebisui T, Matsuo S, Misawa H. Anisotropic etching of dielectrics exposed by high intensity femtosecond pulses. In Shcherbakov IA, Giardini A, Konov VI, Pustovoy VI, editors, Proceedings of SPIE - The International Society for Optical Engineering. Vol. 5850. 2005. p. 59-66. 08 https://doi.org/10.1117/12.633670
Juodkazis, Saulius ; Tabuchi, Yuusuke ; Ebisui, Takahiro ; Matsuo, Shigeki ; Misawa, Hiroaki. / Anisotropic etching of dielectrics exposed by high intensity femtosecond pulses. Proceedings of SPIE - The International Society for Optical Engineering. editor / I.A. Shcherbakov ; A. Giardini ; V.I. Konov ; V.I. Pustovoy. Vol. 5850 2005. pp. 59-66
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