Abstract
We demonstrate a novel approach to femtosecond microfabrication of transparent dielectrics, which employs nondiffracting Bessel beams instead of the conventionally used Gaussian beams. The main advantage of Bessel beams is the possibility of recording linear photomodified tracks, extending along the lines of nondiffractive beam propagation without sample translation, as would be required for Gaussian beams. Recording of patterns with an aspect ratio of up to 102-103 in vitreous silica using amplified femtosecond Ti:saphire laser pulses is demonstrated.
| Original language | English |
|---|---|
| Pages (from-to) | L1197-L1199 |
| Journal | Japanese Journal of Applied Physics, Part 2: Letters |
| Volume | 40 |
| Issue number | 11 A |
| DOIs | |
| Publication status | Published - 2001 Nov 1 |
| Externally published | Yes |
Keywords
- Bessel beam
- Laser materials processing
- Laser-induced breakdown
- Ultrafast phenomena
- Vitreous silica
ASJC Scopus subject areas
- Engineering(all)
- Physics and Astronomy (miscellaneous)
- Physics and Astronomy(all)
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Cite this
Marcinkevicius, A., Juodkazis, S., Matsuo, S., Mizeikis, V., & Misawa, H. (2001). Application of bessel beams for microfabrication of dielectrics by femtosecond laser. Japanese Journal of Applied Physics, Part 2: Letters, 40(11 A), L1197-L1199. https://doi.org/10.1143/jjap.40.l1197