Application of bessel beams for microfabrication of dielectrics by femtosecond laser

Andrius Marcinkevicius, Saulius Juodkazis, Shigeki Matsuo, Vygantas Mizeikis, Hiroaki Misawa

Research output: Contribution to journalArticle

64 Citations (Scopus)

Abstract

We demonstrate a novel approach to femtosecond microfabrication of transparent dielectrics, which employs nondiffracting Bessel beams instead of the conventionally used Gaussian beams. The main advantage of Bessel beams is the possibility of recording linear photomodified tracks, extending along the lines of nondiffractive beam propagation without sample translation, as would be required for Gaussian beams. Recording of patterns with an aspect ratio of up to 102-103 in vitreous silica using amplified femtosecond Ti:saphire laser pulses is demonstrated.

Original languageEnglish
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume40
Issue number11 A
Publication statusPublished - 2001 Nov 1
Externally publishedYes

Fingerprint

Gaussian beams
Microfabrication
Ultrashort pulses
Fused silica
lasers
Aspect ratio
Laser pulses
recording
aspect ratio
silicon dioxide
propagation
pulses

Keywords

  • Bessel beam
  • Laser materials processing
  • Laser-induced breakdown
  • Ultrafast phenomena
  • Vitreous silica

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Application of bessel beams for microfabrication of dielectrics by femtosecond laser. / Marcinkevicius, Andrius; Juodkazis, Saulius; Matsuo, Shigeki; Mizeikis, Vygantas; Misawa, Hiroaki.

In: Japanese Journal of Applied Physics, Part 2: Letters, Vol. 40, No. 11 A, 01.11.2001.

Research output: Contribution to journalArticle

Marcinkevicius, Andrius ; Juodkazis, Saulius ; Matsuo, Shigeki ; Mizeikis, Vygantas ; Misawa, Hiroaki. / Application of bessel beams for microfabrication of dielectrics by femtosecond laser. In: Japanese Journal of Applied Physics, Part 2: Letters. 2001 ; Vol. 40, No. 11 A.
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