Application of femtosecond Bessel-Gauss beam in microstructuring of transparent materials

A. Marcinkevičius, S. Juodkazis, V. Mizeikis, Shigeki Matsuo, H. Misawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

9 Citations (Scopus)

Abstract

We demonstrate a new technique for femtosecond microfabrication in transparent dielectrics, which employs non-diffracting Bessel-Gauss beams instead of commonly used Gaussian beams. The main advantage achieved this way is the ability to record linear photomodified tracks, extending along the line of non-diffracting beam propagation without sample translation, as would be required for Gaussian beams. The initial near infrared Gaussian laser beam was transformed into the non-diffracting Bessel-Gauss beam by a glass axicon (apex angle 160 deg). The beam was imaged into the bulk of the sample by a telescope consisting of two positive lenses, which allowed to vary the focusing cone angle from 5° to 19°, and maximum non-diffracting propagation distance up to 1 cm. We have recorded pre-programmed patterns of multi-shot damage tracks (diameter about 3 μm), extended uniformly along the z-axis by varying the damage spot coordinates in the x - y plane. The experiments were carried out in various transparent dielectrics: silica glass, sapphire, and plexyglass. Physical processes underlying the Gauss-Bessel microfabrication, and its potential applications for stereolithography, 3D microstructuring, and photonic crystal fabrication will be discussed.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsY.B. Band
Pages150-158
Number of pages9
Volume4271
DOIs
Publication statusPublished - 2001
Externally publishedYes
EventOptical Pulse and Beam Propagation III - San Jose, CA, United States
Duration: 2001 Jan 242001 Jan 25

Other

OtherOptical Pulse and Beam Propagation III
CountryUnited States
CitySan Jose, CA
Period01/1/2401/1/25

Fingerprint

transparence
Gaussian beams
Microfabrication
Stereolithography
Fused silica
Photonic crystals
Sapphire
Telescopes
Laser beams
Cones
Lenses
Infrared radiation
Fabrication
Glass
damage
propagation
Experiments
silica glass
shot
cones

Keywords

  • Axicon
  • Bessel-Gauss beam
  • Femtosecond laser microfabrication
  • Light-induced damage threshold

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Marcinkevičius, A., Juodkazis, S., Mizeikis, V., Matsuo, S., & Misawa, H. (2001). Application of femtosecond Bessel-Gauss beam in microstructuring of transparent materials. In Y. B. Band (Ed.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 4271, pp. 150-158) https://doi.org/10.1117/12.424689

Application of femtosecond Bessel-Gauss beam in microstructuring of transparent materials. / Marcinkevičius, A.; Juodkazis, S.; Mizeikis, V.; Matsuo, Shigeki; Misawa, H.

Proceedings of SPIE - The International Society for Optical Engineering. ed. / Y.B. Band. Vol. 4271 2001. p. 150-158.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Marcinkevičius, A, Juodkazis, S, Mizeikis, V, Matsuo, S & Misawa, H 2001, Application of femtosecond Bessel-Gauss beam in microstructuring of transparent materials. in YB Band (ed.), Proceedings of SPIE - The International Society for Optical Engineering. vol. 4271, pp. 150-158, Optical Pulse and Beam Propagation III, San Jose, CA, United States, 01/1/24. https://doi.org/10.1117/12.424689
Marcinkevičius A, Juodkazis S, Mizeikis V, Matsuo S, Misawa H. Application of femtosecond Bessel-Gauss beam in microstructuring of transparent materials. In Band YB, editor, Proceedings of SPIE - The International Society for Optical Engineering. Vol. 4271. 2001. p. 150-158 https://doi.org/10.1117/12.424689
Marcinkevičius, A. ; Juodkazis, S. ; Mizeikis, V. ; Matsuo, Shigeki ; Misawa, H. / Application of femtosecond Bessel-Gauss beam in microstructuring of transparent materials. Proceedings of SPIE - The International Society for Optical Engineering. editor / Y.B. Band. Vol. 4271 2001. pp. 150-158
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