Abstract
We demonstrate a new technique for femtosecond microfabrication in transparent dielectrics, which employs non-diffracting Bessel-Gauss beams instead of commonly used Gaussian beams. The main advantage achieved this way is the ability to record linear photomodified tracks, extending along the line of non-diffracting beam propagation without sample translation, as would be required for Gaussian beams. The initial near infrared Gaussian laser beam was transformed into the non-diffracting Bessel-Gauss beam by a glass axicon (apex angle 160 deg). The beam was imaged into the bulk of the sample by a telescope consisting of two positive lenses, which allowed to vary the focusing cone angle from 5° to 19°, and maximum non-diffracting propagation distance up to 1 cm. We have recorded pre-programmed patterns of multi-shot damage tracks (diameter about 3 μm), extended uniformly along the z-axis by varying the damage spot coordinates in the x - y plane. The experiments were carried out in various transparent dielectrics: silica glass, sapphire, and plexyglass. Physical processes underlying the Gauss-Bessel microfabrication, and its potential applications for stereolithography, 3D microstructuring, and photonic crystal fabrication will be discussed.
| Original language | English |
|---|---|
| Title of host publication | Proceedings of SPIE - The International Society for Optical Engineering |
| Editors | Y.B. Band |
| Pages | 150-158 |
| Number of pages | 9 |
| Volume | 4271 |
| DOIs | |
| Publication status | Published - 2001 |
| Externally published | Yes |
| Event | Optical Pulse and Beam Propagation III - San Jose, CA, United States Duration: 2001 Jan 24 → 2001 Jan 25 |
Other
| Other | Optical Pulse and Beam Propagation III |
|---|---|
| Country | United States |
| City | San Jose, CA |
| Period | 01/1/24 → 01/1/25 |
Fingerprint
Keywords
- Axicon
- Bessel-Gauss beam
- Femtosecond laser microfabrication
- Light-induced damage threshold
ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Condensed Matter Physics
Cite this
Application of femtosecond Bessel-Gauss beam in microstructuring of transparent materials. / Marcinkevičius, A.; Juodkazis, S.; Mizeikis, V.; Matsuo, Shigeki; Misawa, H.
Proceedings of SPIE - The International Society for Optical Engineering. ed. / Y.B. Band. Vol. 4271 2001. p. 150-158.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Application of femtosecond Bessel-Gauss beam in microstructuring of transparent materials
AU - Marcinkevičius, A.
AU - Juodkazis, S.
AU - Mizeikis, V.
AU - Matsuo, Shigeki
AU - Misawa, H.
PY - 2001
Y1 - 2001
N2 - We demonstrate a new technique for femtosecond microfabrication in transparent dielectrics, which employs non-diffracting Bessel-Gauss beams instead of commonly used Gaussian beams. The main advantage achieved this way is the ability to record linear photomodified tracks, extending along the line of non-diffracting beam propagation without sample translation, as would be required for Gaussian beams. The initial near infrared Gaussian laser beam was transformed into the non-diffracting Bessel-Gauss beam by a glass axicon (apex angle 160 deg). The beam was imaged into the bulk of the sample by a telescope consisting of two positive lenses, which allowed to vary the focusing cone angle from 5° to 19°, and maximum non-diffracting propagation distance up to 1 cm. We have recorded pre-programmed patterns of multi-shot damage tracks (diameter about 3 μm), extended uniformly along the z-axis by varying the damage spot coordinates in the x - y plane. The experiments were carried out in various transparent dielectrics: silica glass, sapphire, and plexyglass. Physical processes underlying the Gauss-Bessel microfabrication, and its potential applications for stereolithography, 3D microstructuring, and photonic crystal fabrication will be discussed.
AB - We demonstrate a new technique for femtosecond microfabrication in transparent dielectrics, which employs non-diffracting Bessel-Gauss beams instead of commonly used Gaussian beams. The main advantage achieved this way is the ability to record linear photomodified tracks, extending along the line of non-diffracting beam propagation without sample translation, as would be required for Gaussian beams. The initial near infrared Gaussian laser beam was transformed into the non-diffracting Bessel-Gauss beam by a glass axicon (apex angle 160 deg). The beam was imaged into the bulk of the sample by a telescope consisting of two positive lenses, which allowed to vary the focusing cone angle from 5° to 19°, and maximum non-diffracting propagation distance up to 1 cm. We have recorded pre-programmed patterns of multi-shot damage tracks (diameter about 3 μm), extended uniformly along the z-axis by varying the damage spot coordinates in the x - y plane. The experiments were carried out in various transparent dielectrics: silica glass, sapphire, and plexyglass. Physical processes underlying the Gauss-Bessel microfabrication, and its potential applications for stereolithography, 3D microstructuring, and photonic crystal fabrication will be discussed.
KW - Axicon
KW - Bessel-Gauss beam
KW - Femtosecond laser microfabrication
KW - Light-induced damage threshold
UR - http://www.scopus.com/inward/record.url?scp=0034931472&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0034931472&partnerID=8YFLogxK
U2 - 10.1117/12.424689
DO - 10.1117/12.424689
M3 - Conference contribution
VL - 4271
SP - 150
EP - 158
BT - Proceedings of SPIE - The International Society for Optical Engineering
A2 - Band, Y.B.
ER -