Application of transmission electron microscopes to nanometre-sized fabrication by means of electron beam-induced deposition

Masayuki Shimojo, K. Mitsuishi, M. Tanaka, M. Han, K. Furuya

Research output: Contribution to journalArticle

21 Citations (Scopus)

Abstract

Electron beam-induced deposition was carried out using a scanning transmission electron microscope with a field emission gun to fabricate nanometre-sized structures. A small amount of a metal-organic gas was introduced near the substrate in the microscope chamber, and focused electron beams were irradiated. Two- and three-dimensional structures were fabricated by scanning the beam position. The minimum line width of the freestanding structures was 8 nm at a constant gas flux used. This line width of 8 nm is considered to be achieved by employing a high accelerating voltage, which leads to a small probe size, and the optimum scanning speed.

Original languageEnglish
Pages (from-to)76-79
Number of pages4
JournalJournal of Microscopy
Volume214
Issue number1
DOIs
Publication statusPublished - 2004 Apr
Externally publishedYes

Fingerprint

Electron beams
Electron microscopes
electron microscopes
electron beams
Scanning
Fabrication
Linewidth
fabrication
scanning
Gases
gases
Field emission
field emission
Microscopes
chambers
microscopes
Fluxes
probes
Electric potential
electric potential

Keywords

  • Electron beam-induced deposition
  • Electron microscope
  • Metal-organic gas
  • Nanofabrication
  • Quantum device
  • Tungsten carbonyl

ASJC Scopus subject areas

  • Instrumentation

Cite this

Application of transmission electron microscopes to nanometre-sized fabrication by means of electron beam-induced deposition. / Shimojo, Masayuki; Mitsuishi, K.; Tanaka, M.; Han, M.; Furuya, K.

In: Journal of Microscopy, Vol. 214, No. 1, 04.2004, p. 76-79.

Research output: Contribution to journalArticle

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