Application of transmission electron microscopes to nanometre-sized fabrication by means of electron beam-induced deposition

M. Shimojo, K. Mitsuishi, M. Tanaka, M. Han, K. Furuya

Research output: Contribution to journalArticle

22 Citations (Scopus)

Abstract

Electron beam-induced deposition was carried out using a scanning transmission electron microscope with a field emission gun to fabricate nanometre-sized structures. A small amount of a metal-organic gas was introduced near the substrate in the microscope chamber, and focused electron beams were irradiated. Two- and three-dimensional structures were fabricated by scanning the beam position. The minimum line width of the freestanding structures was 8 nm at a constant gas flux used. This line width of 8 nm is considered to be achieved by employing a high accelerating voltage, which leads to a small probe size, and the optimum scanning speed.

Original languageEnglish
Pages (from-to)76-79
Number of pages4
JournalJournal of Microscopy
Volume214
Issue number1
DOIs
Publication statusPublished - 2004 Apr 1

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Keywords

  • Electron beam-induced deposition
  • Electron microscope
  • Metal-organic gas
  • Nanofabrication
  • Quantum device
  • Tungsten carbonyl

ASJC Scopus subject areas

  • Pathology and Forensic Medicine
  • Histology

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