Arrayed micro ion source with ionic liquid for flexible and concurrent MEMS fabrication

Tatsuya Suzuki; Motoaki Hara; Hiroyuki Oguchi; Hiroki Kuwano

doi:10.1016/j.sna.2013.11.006

Arrayed micro ion source with ionic liquid for flexible and concurrent MEMS fabrication

Tatsuya Suzuki, Motoaki Hara, Hiroyuki Oguchi, Hiroki Kuwano

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

This paper reports a micro ion source array (MISA) for flexible and concurrent fabrication of multiple micro devices. In this study, the ionic liquid (IL) 1-ethyl-3-methylimidazolium tetrafluoroborate ([EMIM]-[BF ₄]) was used as the ion source material to simplify the focused ion beam (FIB) system and integrate the ion sources with high density. A reservoir for the IL was integrated into the MISA by silicon micromachining. Experimental results confirmed the emission of the ions from the [EMIM]-[BF₄] and the physical etching of the metal films by the ion emission. Also, silicon fluoride volatilization could be observed by mass spectroscopy when the silicon wafer was exposed to the emitted ion beam.

Original language	English
Pages (from-to)	161-166
Number of pages	6
Journal	Sensors and Actuators, A: Physical
Volume	215
DOIs	https://doi.org/10.1016/j.sna.2013.11.006
Publication status	Published - 2014 Aug 15
Externally published	Yes

Keywords

Focused ion beam
Ion source
Ionic liquid
Micro-fabrication

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Instrumentation
Condensed Matter Physics
Surfaces, Coatings and Films
Metals and Alloys
Electrical and Electronic Engineering

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10.1016/j.sna.2013.11.006

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@article{dc96845553a5433eb2cda114dc4902fd,

title = "Arrayed micro ion source with ionic liquid for flexible and concurrent MEMS fabrication",

abstract = "This paper reports a micro ion source array (MISA) for flexible and concurrent fabrication of multiple micro devices. In this study, the ionic liquid (IL) 1-ethyl-3-methylimidazolium tetrafluoroborate ([EMIM]-[BF 4]) was used as the ion source material to simplify the focused ion beam (FIB) system and integrate the ion sources with high density. A reservoir for the IL was integrated into the MISA by silicon micromachining. Experimental results confirmed the emission of the ions from the [EMIM]-[BF4] and the physical etching of the metal films by the ion emission. Also, silicon fluoride volatilization could be observed by mass spectroscopy when the silicon wafer was exposed to the emitted ion beam.",

keywords = "Focused ion beam, Ion source, Ionic liquid, Micro-fabrication",

author = "Tatsuya Suzuki and Motoaki Hara and Hiroyuki Oguchi and Hiroki Kuwano",

note = "Funding Information: Part of this work was performed at the Micro/Nano-Machining Research and Education Center, Tohoku University, Japan. This work was supported in part by a grant for Challenging Exploratory Research from the Ministry of Education, Culture, Sports, Science and Technology of Japan (MEXT) (grant no. 12010289 ). ",

year = "2014",

month = aug,

day = "15",

doi = "10.1016/j.sna.2013.11.006",

language = "English",

volume = "215",

pages = "161--166",

journal = "Sensors and Actuators A: Physical",

issn = "0924-4247",

publisher = "Elsevier",

}

TY - JOUR

T1 - Arrayed micro ion source with ionic liquid for flexible and concurrent MEMS fabrication

AU - Suzuki, Tatsuya

AU - Hara, Motoaki

AU - Oguchi, Hiroyuki

AU - Kuwano, Hiroki

N1 - Funding Information: Part of this work was performed at the Micro/Nano-Machining Research and Education Center, Tohoku University, Japan. This work was supported in part by a grant for Challenging Exploratory Research from the Ministry of Education, Culture, Sports, Science and Technology of Japan (MEXT) (grant no. 12010289 ).

PY - 2014/8/15

Y1 - 2014/8/15

N2 - This paper reports a micro ion source array (MISA) for flexible and concurrent fabrication of multiple micro devices. In this study, the ionic liquid (IL) 1-ethyl-3-methylimidazolium tetrafluoroborate ([EMIM]-[BF 4]) was used as the ion source material to simplify the focused ion beam (FIB) system and integrate the ion sources with high density. A reservoir for the IL was integrated into the MISA by silicon micromachining. Experimental results confirmed the emission of the ions from the [EMIM]-[BF4] and the physical etching of the metal films by the ion emission. Also, silicon fluoride volatilization could be observed by mass spectroscopy when the silicon wafer was exposed to the emitted ion beam.

AB - This paper reports a micro ion source array (MISA) for flexible and concurrent fabrication of multiple micro devices. In this study, the ionic liquid (IL) 1-ethyl-3-methylimidazolium tetrafluoroborate ([EMIM]-[BF 4]) was used as the ion source material to simplify the focused ion beam (FIB) system and integrate the ion sources with high density. A reservoir for the IL was integrated into the MISA by silicon micromachining. Experimental results confirmed the emission of the ions from the [EMIM]-[BF4] and the physical etching of the metal films by the ion emission. Also, silicon fluoride volatilization could be observed by mass spectroscopy when the silicon wafer was exposed to the emitted ion beam.

KW - Focused ion beam

KW - Ion source

KW - Ionic liquid

KW - Micro-fabrication

UR - http://www.scopus.com/inward/record.url?scp=84903267843&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84903267843&partnerID=8YFLogxK

U2 - 10.1016/j.sna.2013.11.006

DO - 10.1016/j.sna.2013.11.006

M3 - Article

AN - SCOPUS:84903267843

SN - 0924-4247

VL - 215

SP - 161

EP - 166

JO - Sensors and Actuators A: Physical

JF - Sensors and Actuators A: Physical

ER -

Arrayed micro ion source with ionic liquid for flexible and concurrent MEMS fabrication

Abstract

Keywords

ASJC Scopus subject areas

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