Barrier Reliability Evaluation of Electroless Diffusion Barriers and Organosilane Monolayer by Bias Temperature Stress (BTS) Tests

A. Mitsumori, S. Fujishima, K. Ueno

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)88-89
JournalExtended Abstracts of Advanced Metallization Conference 2011: 21st Asian Session
Publication statusPublished - 2012 Sep 14

Cite this

@article{a544c8c0889a4434b012af05cbc83e11,
title = "Barrier Reliability Evaluation of Electroless Diffusion Barriers and Organosilane Monolayer by Bias Temperature Stress (BTS) Tests",
author = "A. Mitsumori and S. Fujishima and K. Ueno",
year = "2012",
month = "9",
day = "14",
language = "English",
pages = "88--89",
journal = "Extended Abstracts of Advanced Metallization Conference 2011: 21st Asian Session",

}

TY - JOUR

T1 - Barrier Reliability Evaluation of Electroless Diffusion Barriers and Organosilane Monolayer by Bias Temperature Stress (BTS) Tests

AU - Mitsumori, A.

AU - Fujishima, S.

AU - Ueno, K.

PY - 2012/9/14

Y1 - 2012/9/14

M3 - Article

SP - 88

EP - 89

JO - Extended Abstracts of Advanced Metallization Conference 2011: 21st Asian Session

JF - Extended Abstracts of Advanced Metallization Conference 2011: 21st Asian Session

ER -