Change of electrical properties of rutile- and anatase-TiO2 films by atomic layer deposited Al2O3

Toshihide Nabatame, Ippei Yamamoto, Tomomi Sawada, Akihiko Ohi, Thang Duy Dao, Tomoji Ohishi, Tadaaki Nagao

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Fingerprint

Dive into the research topics of 'Change of electrical properties of rutile- and anatase-TiO<sub>2</sub> films by atomic layer deposited Al<sub>2</sub>O<sub>3</sub>'. Together they form a unique fingerprint.

Engineering & Materials Science