Original language | English |
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Journal | Microelectronics Engineering |
Publication status | Published - 2008 Mar 28 |
Changes in Effective Work Function of HfxRu1-xAlloy Gate Electrode
T.Nabatame T.Nabatame, Y.Nunoshige Y.Nunoshige, M.Kadoshima M.Kadoshima, H.Takaba H.Takaba, K.Segawa K.Segawa, S.Kimura S.Kimura, H.Satake H.Satake, H.Ota H.Ota, T.Ohishi T.Ohishi, A.Toriumi A.Toriumi, Tomoji Oishi
Research output: Contribution to journal › Article › peer-review