Changes in Effective Work Function of HfxRu1-xAlloy Gate Electrode

T.Nabatame T.Nabatame; Y.Nunoshige Y.Nunoshige; M.Kadoshima M.Kadoshima; H.Takaba H.Takaba; K.Segawa K.Segawa; S.Kimura S.Kimura; H.Satake H.Satake; H.Ota H.Ota; T.Ohishi T.Ohishi; A.Toriumi A.Toriumi; Tomoji Oishi

Changes in Effective Work Function of HfxRu1-xAlloy Gate Electrode

T.Nabatame T.Nabatame, Y.Nunoshige Y.Nunoshige, M.Kadoshima M.Kadoshima, H.Takaba H.Takaba, K.Segawa K.Segawa, S.Kimura S.Kimura, H.Satake H.Satake, H.Ota H.Ota, T.Ohishi T.Ohishi, A.Toriumi A.Toriumi, Tomoji Oishi

Regional Environment Systems

Research output: Contribution to journal › Article

Original language	English
Journal	Microelectronics Engineering
Publication status	Published - 2008 Mar 28

Cite this

T.Nabatame, T. N., Y.Nunoshige, Y. N., M.Kadoshima, M. K., H.Takaba, H. T., K.Segawa, K. S., S.Kimura, S. K., ... Oishi, T. (2008). Changes in Effective Work Function of HfxRu1-xAlloy Gate Electrode. Microelectronics Engineering.

Changes in Effective Work Function of HfxRu1-xAlloy Gate Electrode. / T.Nabatame, T.Nabatame; Y.Nunoshige, Y.Nunoshige; M.Kadoshima, M.Kadoshima; H.Takaba, H.Takaba; K.Segawa, K.Segawa; S.Kimura, S.Kimura; H.Satake, H.Satake; H.Ota, H.Ota; T.Ohishi, T.Ohishi; A.Toriumi, A.Toriumi; Oishi, Tomoji.

In: Microelectronics Engineering, 28.03.2008.

Research output: Contribution to journal › Article

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author = "T.Nabatame T.Nabatame and Y.Nunoshige Y.Nunoshige and M.Kadoshima M.Kadoshima and H.Takaba H.Takaba and K.Segawa K.Segawa and S.Kimura S.Kimura and H.Satake H.Satake and H.Ota H.Ota and T.Ohishi T.Ohishi and A.Toriumi A.Toriumi and Tomoji Oishi",

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AU - H.Takaba, H.Takaba

AU - K.Segawa, K.Segawa

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