Changes in Effective Work Function of HfxRu1-xAlloy Gate Electrode

T.Nabatame T.Nabatame, Y.Nunoshige Y.Nunoshige, M.Kadoshima M.Kadoshima, H.Takaba H.Takaba, K.Segawa K.Segawa, S.Kimura S.Kimura, H.Satake H.Satake, H.Ota H.Ota, T.Ohishi T.Ohishi, A.Toriumi A.Toriumi, Tomoji Oishi

Research output: Contribution to journalArticle

Original languageEnglish
JournalMicroelectronics Engineering
Publication statusPublished - 2008 Mar 28

Cite this

T.Nabatame, T. N., Y.Nunoshige, Y. N., M.Kadoshima, M. K., H.Takaba, H. T., K.Segawa, K. S., S.Kimura, S. K., ... Oishi, T. (2008). Changes in Effective Work Function of HfxRu1-xAlloy Gate Electrode. Microelectronics Engineering.