Changes in the optical properties of Ge-doped silica glass during exposure to a KrF excimer laser

Yasuhiro Miyake, Hiroyuki Nishikawa, Eiki Watanabe, Daisuke Ito

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

Refractive-index changes (Δn) in Ge-doped silica glass exposed to a KrF excimer laser were investigated by measurements of the diffraction efficiency from a grating formed using a phase mask. The Δn of 3.2 × 10-3 was achieved for a hydrogen-treated (150 atm, 2 weeks, room temperature) sample after a KrF laser irradiation (25 Hz, 0.5 J/cm2/pulse, 27 kJ/cm2), while the Δn obtained for a non-treated sample is less than 10-4. The depth profile of the Δn for the hydrogen-treated sample is limited by the distribution in the hydrogen concentration inside the sample, while it is determined by the attenuation of the ultraviolet light for the non-treated sample.

Original languageEnglish
Pages (from-to)266-271
Number of pages6
JournalJournal of Non-Crystalline Solids
Volume222
Publication statusPublished - 1997 Dec 11
Externally publishedYes

Fingerprint

silica glass
Excimer lasers
Fused silica
excimer lasers
Hydrogen
Optical properties
optical properties
Diffraction efficiency
Diffraction gratings
Laser beam effects
hydrogen
Masks
Refractive index
ultraviolet radiation
masks
attenuation
gratings
refractivity
irradiation
room temperature

ASJC Scopus subject areas

  • Ceramics and Composites
  • Electronic, Optical and Magnetic Materials

Cite this

Changes in the optical properties of Ge-doped silica glass during exposure to a KrF excimer laser. / Miyake, Yasuhiro; Nishikawa, Hiroyuki; Watanabe, Eiki; Ito, Daisuke.

In: Journal of Non-Crystalline Solids, Vol. 222, 11.12.1997, p. 266-271.

Research output: Contribution to journalArticle

@article{44212e31ff824b1b850280ef84fc4bf2,
title = "Changes in the optical properties of Ge-doped silica glass during exposure to a KrF excimer laser",
abstract = "Refractive-index changes (Δn) in Ge-doped silica glass exposed to a KrF excimer laser were investigated by measurements of the diffraction efficiency from a grating formed using a phase mask. The Δn of 3.2 × 10-3 was achieved for a hydrogen-treated (150 atm, 2 weeks, room temperature) sample after a KrF laser irradiation (25 Hz, 0.5 J/cm2/pulse, 27 kJ/cm2), while the Δn obtained for a non-treated sample is less than 10-4. The depth profile of the Δn for the hydrogen-treated sample is limited by the distribution in the hydrogen concentration inside the sample, while it is determined by the attenuation of the ultraviolet light for the non-treated sample.",
author = "Yasuhiro Miyake and Hiroyuki Nishikawa and Eiki Watanabe and Daisuke Ito",
year = "1997",
month = "12",
day = "11",
language = "English",
volume = "222",
pages = "266--271",
journal = "Journal of Non-Crystalline Solids",
issn = "0022-3093",
publisher = "Elsevier",

}

TY - JOUR

T1 - Changes in the optical properties of Ge-doped silica glass during exposure to a KrF excimer laser

AU - Miyake, Yasuhiro

AU - Nishikawa, Hiroyuki

AU - Watanabe, Eiki

AU - Ito, Daisuke

PY - 1997/12/11

Y1 - 1997/12/11

N2 - Refractive-index changes (Δn) in Ge-doped silica glass exposed to a KrF excimer laser were investigated by measurements of the diffraction efficiency from a grating formed using a phase mask. The Δn of 3.2 × 10-3 was achieved for a hydrogen-treated (150 atm, 2 weeks, room temperature) sample after a KrF laser irradiation (25 Hz, 0.5 J/cm2/pulse, 27 kJ/cm2), while the Δn obtained for a non-treated sample is less than 10-4. The depth profile of the Δn for the hydrogen-treated sample is limited by the distribution in the hydrogen concentration inside the sample, while it is determined by the attenuation of the ultraviolet light for the non-treated sample.

AB - Refractive-index changes (Δn) in Ge-doped silica glass exposed to a KrF excimer laser were investigated by measurements of the diffraction efficiency from a grating formed using a phase mask. The Δn of 3.2 × 10-3 was achieved for a hydrogen-treated (150 atm, 2 weeks, room temperature) sample after a KrF laser irradiation (25 Hz, 0.5 J/cm2/pulse, 27 kJ/cm2), while the Δn obtained for a non-treated sample is less than 10-4. The depth profile of the Δn for the hydrogen-treated sample is limited by the distribution in the hydrogen concentration inside the sample, while it is determined by the attenuation of the ultraviolet light for the non-treated sample.

UR - http://www.scopus.com/inward/record.url?scp=0031550016&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0031550016&partnerID=8YFLogxK

M3 - Article

VL - 222

SP - 266

EP - 271

JO - Journal of Non-Crystalline Solids

JF - Journal of Non-Crystalline Solids

SN - 0022-3093

ER -