Refractive-index changes (Δn) in Ge-doped silica glass exposed to a KrF excimer laser were investigated by measurements of the diffraction efficiency from a grating formed using a phase mask. The Δn of 3.2 × 10-3 was achieved for a hydrogen-treated (150 atm, 2 weeks, room temperature) sample after a KrF laser irradiation (25 Hz, 0.5 J/cm2/pulse, 27 kJ/cm2), while the Δn obtained for a non-treated sample is less than 10-4. The depth profile of the Δn for the hydrogen-treated sample is limited by the distribution in the hydrogen concentration inside the sample, while it is determined by the attenuation of the ultraviolet light for the non-treated sample.
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Ceramics and Composites
- Condensed Matter Physics
- Materials Chemistry