Characteristics of SiOF Films Deposited Using Tetrathylorthosilicate (TEOS) and Fluorotriethoxysilane (FTES) at Room Temperature by chemicalVaper Deposition

Research output: Contribution to journalArticlepeer-review

12 Citations (Scopus)
Original languageEnglish
Pages (from-to)707-711
JournalJournal of the Electrochemical Society
Volume143
Publication statusPublished - 1996 Feb 1

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