Characterization od ClOx radicals in vacuum-ultraviolet-irradiated high-purity silica

H. Nishikawa, R. Nakamura, Y. Ohki, K. Nagasawa, Y. Hama

Research output: Contribution to journalArticle

13 Citations (Scopus)
Original languageEnglish
Pages (from-to)8073-8079
JournalThe American Physical Society
Volume46
Publication statusPublished - 1992 Oct 1

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