Characterization od ClOx radicals in vacuum-ultraviolet-irradiated high-purity silica

H. Nishikawa, R. Nakamura, Y. Ohki, K. Nagasawa, Y. Hama

Research output: Contribution to journalArticle

13 Citations (Scopus)
Original languageEnglish
Pages (from-to)8073-8079
JournalThe American Physical Society
Volume46
Publication statusPublished - 1992 Oct 1

Cite this

Characterization od ClOx radicals in vacuum-ultraviolet-irradiated high-purity silica. / Nishikawa, H.; Nakamura, R.; Ohki, Y.; Nagasawa, K.; Hama, Y.

In: The American Physical Society, Vol. 46, 01.10.1992, p. 8073-8079.

Research output: Contribution to journalArticle

Nishikawa, H. ; Nakamura, R. ; Ohki, Y. ; Nagasawa, K. ; Hama, Y. / Characterization od ClOx radicals in vacuum-ultraviolet-irradiated high-purity silica. In: The American Physical Society. 1992 ; Vol. 46. pp. 8073-8079.
@article{79d25c893b864148bf8f9f1b4f949d73,
title = "Characterization od ClOx radicals in vacuum-ultraviolet-irradiated high-purity silica",
author = "H. Nishikawa and R. Nakamura and Y. Ohki and K. Nagasawa and Y. Hama",
year = "1992",
month = "10",
day = "1",
language = "English",
volume = "46",
pages = "8073--8079",
journal = "The American Physical Society",

}

TY - JOUR

T1 - Characterization od ClOx radicals in vacuum-ultraviolet-irradiated high-purity silica

AU - Nishikawa, H.

AU - Nakamura, R.

AU - Ohki, Y.

AU - Nagasawa, K.

AU - Hama, Y.

PY - 1992/10/1

Y1 - 1992/10/1

M3 - Article

VL - 46

SP - 8073

EP - 8079

JO - The American Physical Society

JF - The American Physical Society

ER -