Characterization of ion-implanted silica glass by micro-photoluminescence and Raman spectroscopy

T. Souno, Hiroyuki Nishikawa, M. Hattori, Y. Ohki, E. Watanabe, M. Oikawa, T. Kamiya, K. Arakawa

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

We evaluated structural changes in silica glass induced by ion microbeam using microscopic photoluminescence (PL) and Raman scattering measurements. Microbeams (1.7 MeV H+) were scanned over the sharp right-edges of the silica substrates with a fluence of 1 × 1017 cm -2, then two PL bands of silica at 540 and 650 nm were observed at the irradiated region. The PL bands show different lateral and depth distributions. The distribution of the 540 nm PL is in good agreement with that of the refractive index changed region. The lateral distribution of the 650 nm band is broader by 1.5 times than those of the 540 nm PL and the refractive index changed region. The microscopic Raman scattering measurements show an increased intensity of 606 cm-1 peak associated with compaction at the microbeam irradiated regions.

Original languageEnglish
Pages (from-to)277-280
Number of pages4
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume210
DOIs
Publication statusPublished - 2003 Sep

Fingerprint

Photoluminescence spectroscopy
silica glass
Fused silica
Raman spectroscopy
Photoluminescence
microbeams
Ions
photoluminescence
spectroscopy
ions
Silicon Dioxide
Raman scattering
Refractive index
Silica
refractivity
Raman spectra
silicon dioxide
fluence
Compaction
Substrates

Keywords

  • Ion microbeam
  • Photoluminescence
  • Raman scattering
  • Silica

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Instrumentation
  • Surfaces and Interfaces

Cite this

Characterization of ion-implanted silica glass by micro-photoluminescence and Raman spectroscopy. / Souno, T.; Nishikawa, Hiroyuki; Hattori, M.; Ohki, Y.; Watanabe, E.; Oikawa, M.; Kamiya, T.; Arakawa, K.

In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Vol. 210, 09.2003, p. 277-280.

Research output: Contribution to journalArticle

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AU - Hattori, M.

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AU - Watanabe, E.

AU - Oikawa, M.

AU - Kamiya, T.

AU - Arakawa, K.

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AB - We evaluated structural changes in silica glass induced by ion microbeam using microscopic photoluminescence (PL) and Raman scattering measurements. Microbeams (1.7 MeV H+) were scanned over the sharp right-edges of the silica substrates with a fluence of 1 × 1017 cm -2, then two PL bands of silica at 540 and 650 nm were observed at the irradiated region. The PL bands show different lateral and depth distributions. The distribution of the 540 nm PL is in good agreement with that of the refractive index changed region. The lateral distribution of the 650 nm band is broader by 1.5 times than those of the 540 nm PL and the refractive index changed region. The microscopic Raman scattering measurements show an increased intensity of 606 cm-1 peak associated with compaction at the microbeam irradiated regions.

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