Characterization of Nitrogen-Rich Coating Films with Atmospheric-Pressure Plasma Generated by Re-Entrant Microwave Cavity

Hitoshi Muguruma, Atsushi Hikichi, Toshiki Matsubayashi

Research output: Contribution to journalArticle

Abstract

The deposition and characterization of nitrogen-rich coating films using atmospheric-pressure plasma generated with a re-entrant cylindrical microwave cavity is presented. This system enables simple matching, stable plasma, and free space under the orifice of plasma steam. Allylamine and acetonitrile are employed as monomers, whereas argon is used as the carrier gas. The effective area of the hydrophilic coating film is 55 mm in diameter and the deposition rate is 10 nm min-1. X-ray photoelectron spectroscopy measurements show that the surfaces of these films contain a high concentration of nitrogen atoms and primary amine groups. Matrix-assisted laser desorption/ionization time-of-flight mass spectrometry shows that the coating films have a large molecular weight (>200 kDa). The surface morphology is very flat (ca. 1 nm). The experimental results indicate that a highly cross-linked three-dimensional polymer matrix is formed and atmospheric-pressure plasma deposition is successfully achieved.

LanguageEnglish
Pages5296-5301
Number of pages6
JournalIndustrial and Engineering Chemistry Research
Volume56
Issue number18
DOIs
StatePublished - 2017 May 10

Fingerprint

Atmospheric pressure
Nitrogen
Microwaves
Plasmas
Coatings
Allylamine
Plasma deposition
Argon
Steam
Orifices
Deposition rates
Acetonitrile
Polymer matrix
Ionization
Amines
Surface morphology
Mass spectrometry
Desorption
X ray photoelectron spectroscopy
Monomers

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)
  • Industrial and Manufacturing Engineering

Cite this

Characterization of Nitrogen-Rich Coating Films with Atmospheric-Pressure Plasma Generated by Re-Entrant Microwave Cavity. / Muguruma, Hitoshi; Hikichi, Atsushi; Matsubayashi, Toshiki.

In: Industrial and Engineering Chemistry Research, Vol. 56, No. 18, 10.05.2017, p. 5296-5301.

Research output: Contribution to journalArticle

@article{a86d828249d54646b5f827b65949d5bf,
title = "Characterization of Nitrogen-Rich Coating Films with Atmospheric-Pressure Plasma Generated by Re-Entrant Microwave Cavity",
abstract = "The deposition and characterization of nitrogen-rich coating films using atmospheric-pressure plasma generated with a re-entrant cylindrical microwave cavity is presented. This system enables simple matching, stable plasma, and free space under the orifice of plasma steam. Allylamine and acetonitrile are employed as monomers, whereas argon is used as the carrier gas. The effective area of the hydrophilic coating film is 55 mm in diameter and the deposition rate is 10 nm min-1. X-ray photoelectron spectroscopy measurements show that the surfaces of these films contain a high concentration of nitrogen atoms and primary amine groups. Matrix-assisted laser desorption/ionization time-of-flight mass spectrometry shows that the coating films have a large molecular weight (>200 kDa). The surface morphology is very flat (ca. 1 nm). The experimental results indicate that a highly cross-linked three-dimensional polymer matrix is formed and atmospheric-pressure plasma deposition is successfully achieved.",
author = "Hitoshi Muguruma and Atsushi Hikichi and Toshiki Matsubayashi",
year = "2017",
month = "5",
day = "10",
doi = "10.1021/acs.iecr.7b00359",
language = "English",
volume = "56",
pages = "5296--5301",
journal = "Industrial and Engineering Chemistry Research",
issn = "0888-5885",
number = "18",

}

TY - JOUR

T1 - Characterization of Nitrogen-Rich Coating Films with Atmospheric-Pressure Plasma Generated by Re-Entrant Microwave Cavity

AU - Muguruma,Hitoshi

AU - Hikichi,Atsushi

AU - Matsubayashi,Toshiki

PY - 2017/5/10

Y1 - 2017/5/10

N2 - The deposition and characterization of nitrogen-rich coating films using atmospheric-pressure plasma generated with a re-entrant cylindrical microwave cavity is presented. This system enables simple matching, stable plasma, and free space under the orifice of plasma steam. Allylamine and acetonitrile are employed as monomers, whereas argon is used as the carrier gas. The effective area of the hydrophilic coating film is 55 mm in diameter and the deposition rate is 10 nm min-1. X-ray photoelectron spectroscopy measurements show that the surfaces of these films contain a high concentration of nitrogen atoms and primary amine groups. Matrix-assisted laser desorption/ionization time-of-flight mass spectrometry shows that the coating films have a large molecular weight (>200 kDa). The surface morphology is very flat (ca. 1 nm). The experimental results indicate that a highly cross-linked three-dimensional polymer matrix is formed and atmospheric-pressure plasma deposition is successfully achieved.

AB - The deposition and characterization of nitrogen-rich coating films using atmospheric-pressure plasma generated with a re-entrant cylindrical microwave cavity is presented. This system enables simple matching, stable plasma, and free space under the orifice of plasma steam. Allylamine and acetonitrile are employed as monomers, whereas argon is used as the carrier gas. The effective area of the hydrophilic coating film is 55 mm in diameter and the deposition rate is 10 nm min-1. X-ray photoelectron spectroscopy measurements show that the surfaces of these films contain a high concentration of nitrogen atoms and primary amine groups. Matrix-assisted laser desorption/ionization time-of-flight mass spectrometry shows that the coating films have a large molecular weight (>200 kDa). The surface morphology is very flat (ca. 1 nm). The experimental results indicate that a highly cross-linked three-dimensional polymer matrix is formed and atmospheric-pressure plasma deposition is successfully achieved.

UR - http://www.scopus.com/inward/record.url?scp=85020187401&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85020187401&partnerID=8YFLogxK

U2 - 10.1021/acs.iecr.7b00359

DO - 10.1021/acs.iecr.7b00359

M3 - Article

VL - 56

SP - 5296

EP - 5301

JO - Industrial and Engineering Chemistry Research

T2 - Industrial and Engineering Chemistry Research

JF - Industrial and Engineering Chemistry Research

SN - 0888-5885

IS - 18

ER -