Chemical Modification of Titanium Nitride Films via Ion Implantation

Tatsuhiko Aizawa, Atsushi Mitsuo, Thananan Akhadejdamrong

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

Titanium nitride, TiN is a typical ceramic coating film for cutting tools and dies; it often suffers from low oxidation temperature and high friction coefficient and wear volume. Its wearing and oxidation resistance is drastically improved by chemical modification via ion implantation. Carbon-, aluminum- and chlorine-ion implantation is introduced to describe the difference in the modified microstructure at the vicinity of surface. Ion-plated TiN films on a high-speed tool steel substrate are employed as a common specimen to be implanted. Each modified titanium nitride has its intrinsic, as-implanted nanostructure to the selected species. In the carbon implantation, the near-surface structure of TiN film is modified to have the layered bonding state with Ti-C/C-C/Ti-C. The Al-implantation modifies TiN to have non-equilibrium solid solution phase of (Ti, Al) N and metallic aluminum cluster. No change is seen in the chlorine implanted TiN except for increase of dislocations or point defects. The wear resistance is improved by the above as-implanted nano-structuring in the case of carbon implantation. Al- and Cl-implantation significantly improves the original oxidation and wearing resistance of TiN by the post-implantation nano-structuring. The stable, dense aluminum oxide layer is in-situ formed as a tight protective shield during the oxidation test by surface reaction between penetrating oxygen and diffusing aluminum. The lubricious titanium oxide film is also in-situ formed in the wear track at the presence of chlorine to sustain low friction and wear rate even in dry, severe wearing conditions.

Original languageEnglish
Pages (from-to)1962-1970
Number of pages9
JournalMaterials Transactions
Volume44
Issue number10
Publication statusPublished - 2003 Oct
Externally publishedYes

Fingerprint

Titanium nitride
titanium nitrides
Chlorine
Chemical modification
Aluminum
Ion implantation
ion implantation
implantation
Carbon
Wear of materials
Oxidation
chlorine
Friction
oxidation resistance
aluminum
Ceramic coatings
Aluminum Oxide
Tool steel
Oxidation resistance
Surface reactions

Keywords

  • Chemical modification
  • Ion implantation
  • Surface nano-structuring
  • Titanium nitride film
  • Wear and oxidation resistance

ASJC Scopus subject areas

  • Materials Science(all)
  • Metals and Alloys

Cite this

Aizawa, T., Mitsuo, A., & Akhadejdamrong, T. (2003). Chemical Modification of Titanium Nitride Films via Ion Implantation. Materials Transactions, 44(10), 1962-1970.

Chemical Modification of Titanium Nitride Films via Ion Implantation. / Aizawa, Tatsuhiko; Mitsuo, Atsushi; Akhadejdamrong, Thananan.

In: Materials Transactions, Vol. 44, No. 10, 10.2003, p. 1962-1970.

Research output: Contribution to journalArticle

Aizawa, T, Mitsuo, A & Akhadejdamrong, T 2003, 'Chemical Modification of Titanium Nitride Films via Ion Implantation', Materials Transactions, vol. 44, no. 10, pp. 1962-1970.
Aizawa T, Mitsuo A, Akhadejdamrong T. Chemical Modification of Titanium Nitride Films via Ion Implantation. Materials Transactions. 2003 Oct;44(10):1962-1970.
Aizawa, Tatsuhiko ; Mitsuo, Atsushi ; Akhadejdamrong, Thananan. / Chemical Modification of Titanium Nitride Films via Ion Implantation. In: Materials Transactions. 2003 ; Vol. 44, No. 10. pp. 1962-1970.
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