Chemical vapor deposition of nanocarbon on electroless NiB catalyst using ethanol precursor

Toru Tanaka, Tomomi Sato, Yusuke Karasawa, Kazuyoshi Ueno

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

Nanocarbon materials have been expected as post-Cu interconnect materials for large-scale integrated circuits (LSIs). In this paper, we present a nanocarbon deposition process using electroless plated NiB as the catalyst, which features conformal deposition on patterned dielectric surfaces. It was found that carbon nanotubes (CNTs) and graphitic films were deposited on the electroless NiB by atmospheric pressure chemical vapor deposition (CVD) using ethanol as the precursor. The graphitic quality estimated from the Raman spectra of the nanocarbon on the NiB catalyst was equivalent to that on a sputter-deposited pure Ni catalyst. The nanocarbon shape was dependent on NiB thickness, and CNTs were grown on 10-nm-thick NiB and graphitic films were grown on 30nm or thicker NiB. The deposition temperature can be lowered to 505°C, although the graphitic quality was degraded. It is considered that the electroless catalysts can be effective for nanocarbon deposition on patterned dielectric surfaces.

Original languageEnglish
Article number05EF02
JournalJapanese Journal of Applied Physics
Volume50
Issue number5 PART 2
DOIs
Publication statusPublished - 2011 May

Fingerprint

Chemical vapor deposition
Ethanol
ethyl alcohol
vapor deposition
catalysts
Catalysts
Carbon nanotubes
carbon nanotubes
Atmospheric pressure
integrated circuits
Integrated circuits
Raman scattering
atmospheric pressure
Raman spectra
Temperature
temperature

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Chemical vapor deposition of nanocarbon on electroless NiB catalyst using ethanol precursor. / Tanaka, Toru; Sato, Tomomi; Karasawa, Yusuke; Ueno, Kazuyoshi.

In: Japanese Journal of Applied Physics, Vol. 50, No. 5 PART 2, 05EF02, 05.2011.

Research output: Contribution to journalArticle

@article{59c8e8ce13d442bfbdb134b428a9ba87,
title = "Chemical vapor deposition of nanocarbon on electroless NiB catalyst using ethanol precursor",
abstract = "Nanocarbon materials have been expected as post-Cu interconnect materials for large-scale integrated circuits (LSIs). In this paper, we present a nanocarbon deposition process using electroless plated NiB as the catalyst, which features conformal deposition on patterned dielectric surfaces. It was found that carbon nanotubes (CNTs) and graphitic films were deposited on the electroless NiB by atmospheric pressure chemical vapor deposition (CVD) using ethanol as the precursor. The graphitic quality estimated from the Raman spectra of the nanocarbon on the NiB catalyst was equivalent to that on a sputter-deposited pure Ni catalyst. The nanocarbon shape was dependent on NiB thickness, and CNTs were grown on 10-nm-thick NiB and graphitic films were grown on 30nm or thicker NiB. The deposition temperature can be lowered to 505°C, although the graphitic quality was degraded. It is considered that the electroless catalysts can be effective for nanocarbon deposition on patterned dielectric surfaces.",
author = "Toru Tanaka and Tomomi Sato and Yusuke Karasawa and Kazuyoshi Ueno",
year = "2011",
month = "5",
doi = "10.1143/JJAP.50.05EF02",
language = "English",
volume = "50",
journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",
issn = "0021-4922",
publisher = "Japan Society of Applied Physics",
number = "5 PART 2",

}

TY - JOUR

T1 - Chemical vapor deposition of nanocarbon on electroless NiB catalyst using ethanol precursor

AU - Tanaka, Toru

AU - Sato, Tomomi

AU - Karasawa, Yusuke

AU - Ueno, Kazuyoshi

PY - 2011/5

Y1 - 2011/5

N2 - Nanocarbon materials have been expected as post-Cu interconnect materials for large-scale integrated circuits (LSIs). In this paper, we present a nanocarbon deposition process using electroless plated NiB as the catalyst, which features conformal deposition on patterned dielectric surfaces. It was found that carbon nanotubes (CNTs) and graphitic films were deposited on the electroless NiB by atmospheric pressure chemical vapor deposition (CVD) using ethanol as the precursor. The graphitic quality estimated from the Raman spectra of the nanocarbon on the NiB catalyst was equivalent to that on a sputter-deposited pure Ni catalyst. The nanocarbon shape was dependent on NiB thickness, and CNTs were grown on 10-nm-thick NiB and graphitic films were grown on 30nm or thicker NiB. The deposition temperature can be lowered to 505°C, although the graphitic quality was degraded. It is considered that the electroless catalysts can be effective for nanocarbon deposition on patterned dielectric surfaces.

AB - Nanocarbon materials have been expected as post-Cu interconnect materials for large-scale integrated circuits (LSIs). In this paper, we present a nanocarbon deposition process using electroless plated NiB as the catalyst, which features conformal deposition on patterned dielectric surfaces. It was found that carbon nanotubes (CNTs) and graphitic films were deposited on the electroless NiB by atmospheric pressure chemical vapor deposition (CVD) using ethanol as the precursor. The graphitic quality estimated from the Raman spectra of the nanocarbon on the NiB catalyst was equivalent to that on a sputter-deposited pure Ni catalyst. The nanocarbon shape was dependent on NiB thickness, and CNTs were grown on 10-nm-thick NiB and graphitic films were grown on 30nm or thicker NiB. The deposition temperature can be lowered to 505°C, although the graphitic quality was degraded. It is considered that the electroless catalysts can be effective for nanocarbon deposition on patterned dielectric surfaces.

UR - http://www.scopus.com/inward/record.url?scp=79957449158&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=79957449158&partnerID=8YFLogxK

U2 - 10.1143/JJAP.50.05EF02

DO - 10.1143/JJAP.50.05EF02

M3 - Article

VL - 50

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

IS - 5 PART 2

M1 - 05EF02

ER -