Original language | English |
---|---|
Pages (from-to) | 245-250 |
Journal | Proceedings of 1996 VLSI Multilevel Interconnection Conference |
Publication status | Published - 1996 May 1 |
Cleaning of CHF3 plasma etched SiO2/SiN/Cu via structures
K.Ueno K.Ueno, V.M.Donnelly V.M.Donnelly, Y.Tsuchiya Y.Tsuchiya, K.Ohto K.Ohto, T.Kikkawa T.Kikkawa, Kazuyoshi Ueno
Research output: Contribution to journal › Article › peer-review