Cleaning of CHF3 plasma etched SiO2/SiN/Cu via structures

K.Ueno K.Ueno, V.M.Donnelly V.M.Donnelly, Y.Tsuchiya Y.Tsuchiya, K.Ohto K.Ohto, T.Kikkawa T.Kikkawa, Kazuyoshi Ueno

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)245-250
JournalProceedings of 1996 VLSI Multilevel Interconnection Conference
Publication statusPublished - 1996 May 1

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K.Ueno, K. U., V.M.Donnelly, V. M. D., Y.Tsuchiya, Y. T., K.Ohto, K. O., T.Kikkawa, T. K., & Ueno, K. (1996). Cleaning of CHF3 plasma etched SiO2/SiN/Cu via structures. Proceedings of 1996 VLSI Multilevel Interconnection Conference, 245-250.