Cleaning of CHF3 plasma-etched SiO2/SiN/Cu via structures using hydrogen plasma, oxygen plasma, and hexafluoroacetylacetone vapor

K.Ueno K.Ueno, V.M.Donnelly V.M.Donnelly, Kazuyoshi Ueno

Research output: Contribution to journalArticle

23 Citations (Scopus)
Original languageEnglish
Pages (from-to)2986-2995
JournalJournal of Vacuum Science and Technology
VolumeB16
Publication statusPublished - 1998 Nov 1

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