Cleaning of CHF3 plasma-etched SiO2/SiN/Cu via structures with dilute hydrofluoric acid solutions

K.Ueno K.Ueno, V.M.Donnelly V.M.Donnelly, T.Kikkawa T.Kikkawa, Kazuyoshi Ueno

Research output: Contribution to journalArticle

34 Citations (Scopus)
Original languageEnglish
Pages (from-to)2565-2572
JournalJournal of Electrochemical Society
Volume144
Publication statusPublished - 1997 Jan 1

Cite this

Cleaning of CHF3 plasma-etched SiO2/SiN/Cu via structures with dilute hydrofluoric acid solutions. / K.Ueno, K.Ueno; V.M.Donnelly, V.M.Donnelly; T.Kikkawa, T.Kikkawa; Ueno, Kazuyoshi.

In: Journal of Electrochemical Society, Vol. 144, 01.01.1997, p. 2565-2572.

Research output: Contribution to journalArticle

K.Ueno, K.Ueno ; V.M.Donnelly, V.M.Donnelly ; T.Kikkawa, T.Kikkawa ; Ueno, Kazuyoshi. / Cleaning of CHF3 plasma-etched SiO2/SiN/Cu via structures with dilute hydrofluoric acid solutions. In: Journal of Electrochemical Society. 1997 ; Vol. 144. pp. 2565-2572.
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