Cleaning of CHF3 plasma-etched SiO2/SiN/Cu via structures with dilute hydrofluoric acid solutions

K.Ueno K.Ueno, V.M.Donnelly V.M.Donnelly, T.Kikkawa T.Kikkawa, Kazuyoshi Ueno

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	2565-2572
Journal	Journal of Electrochemical Society
Volume	144
Publication status	Published - 1997 Jan 1

Cite this

@article{f6214566ee904a56bdce4577b482bd84,

title = "Cleaning of CHF3 plasma-etched SiO2/SiN/Cu via structures with dilute hydrofluoric acid solutions",

author = "K.Ueno K.Ueno and V.M.Donnelly V.M.Donnelly and T.Kikkawa T.Kikkawa and Kazuyoshi Ueno",

year = "1997",

month = jan,

day = "1",

language = "English",

volume = "144",

pages = "2565--2572",

journal = "Journal of Electrochemical Society",

}