Cleaning of CHF3 plasma-etched SiO2/SiN/Cu via structures with dilute hydrofluoric acid solutions

K.Ueno K.Ueno, V.M.Donnelly V.M.Donnelly, T.Kikkawa T.Kikkawa, Kazuyoshi Ueno

Research output: Contribution to journalArticle

34 Citations (Scopus)
Original languageEnglish
Pages (from-to)2565-2572
JournalJournal of Electrochemical Society
Volume144
Publication statusPublished - 1997 Jan 1

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