Coatings and microstructures of monolithic TiB2 films and double layer and composite TiCN/TiB2 films from alkoxide solutions by thermal plasma CVD

S. Shimada, M. Takahashi, H. Kiyono, J. Tsujino

Research output: Contribution to journalArticle

16 Citations (Scopus)

Abstract

Monolithic TiB2 films and double layer and composite TiCN-TiB2 films were deposited on Si wafers from a mixture of titanium tetra-ethoxide and boron tri-ethoxide solutions at a 1:2 mole ratio at 800 °C for 20 min by chemical vapor deposition in a thermal N2/H2 plasma. The TiB2 films were deposited without N2, while the double layer and composite TiCN-TiB2 films of various compositions were deposited by varying N2 flow rates in N2/H2 plasma. The surfaces and cross-sections of the films were observed by SEM, exhibiting the microstructures and thickness of the films. The relative atomic percentages of Ti, N, B, bonded and free C, and O in the films were determined semi-quantitatively from their XPS peak areas. Microstructures of the composite films with the composition 3TiC0.5N0.5/2TiB2 formed at N2 = 50 mL min- 1 were observed by TEM, revealing the sizes and orientations of the particles with the distribution of Ti and B elements in the film.

Original languageEnglish
Pages (from-to)6616-6621
Number of pages6
JournalThin Solid Films
Volume516
Issue number19
DOIs
Publication statusPublished - 2008 Aug 1
Externally publishedYes

Fingerprint

Plasma Gases
Plasma CVD
thermal plasmas
alkoxides
vapor deposition
coatings
Coatings
microstructure
Microstructure
composite materials
Composite materials
Plasmas
Boron
Hot Temperature
Composite films
Titanium
Chemical analysis
Chemical vapor deposition
X ray photoelectron spectroscopy
Flow rate

Keywords

  • Coating
  • Composite layer
  • Double layer
  • PECVD
  • TiB
  • TiCN

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Coatings and microstructures of monolithic TiB2 films and double layer and composite TiCN/TiB2 films from alkoxide solutions by thermal plasma CVD. / Shimada, S.; Takahashi, M.; Kiyono, H.; Tsujino, J.

In: Thin Solid Films, Vol. 516, No. 19, 01.08.2008, p. 6616-6621.

Research output: Contribution to journalArticle

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