TY - JOUR
T1 - Cobalt Containing Polyimide Films Treated by Nanosecond Pulsed Electrical Discharges in Water
AU - Miron, Camelia
AU - Zhuang, Jie
AU - Balcerak, Michal
AU - Holub, Marcin
AU - Kruth, Angela
AU - Quade, Antje
AU - Sava, Ion
AU - Weltmann, Klaus DIeter
AU - Kolb, Juergen F.
PY - 2016/11/1
Y1 - 2016/11/1
N2 - This paper describes the effect of nanosecond pulsed electrical discharges generated in distilled water on cobalt-modified fluorinated polyimide (PI) films derived from hexafluoroisopropylidendiphthalic dianhydride and 4,4'-diamino-3,3'-dimethyl diphenylmethane. The PI films have been characterized by dielectric spectroscopy, X-ray photoelectron spectroscopy, and X-ray diffraction (XRD) measurements. The relative permittivity of the PI films increased after treatment by water plasma. The XRD analysis has shown a slight increase of the degree of intermolecular ordering and stronger π-π interactions with the increase of the plasma treatment time. Application of nanosecond high-voltage pulses has induced an increase in concentration of CF3 groups at the polymer surface. A decrease of the cobalt and chlorine fractions, due to their migration into water, and an increase of aliphatic C-C bonds at the film surface may be responsible for the relative permittivity modification after exposure to water plasma.
AB - This paper describes the effect of nanosecond pulsed electrical discharges generated in distilled water on cobalt-modified fluorinated polyimide (PI) films derived from hexafluoroisopropylidendiphthalic dianhydride and 4,4'-diamino-3,3'-dimethyl diphenylmethane. The PI films have been characterized by dielectric spectroscopy, X-ray photoelectron spectroscopy, and X-ray diffraction (XRD) measurements. The relative permittivity of the PI films increased after treatment by water plasma. The XRD analysis has shown a slight increase of the degree of intermolecular ordering and stronger π-π interactions with the increase of the plasma treatment time. Application of nanosecond high-voltage pulses has induced an increase in concentration of CF3 groups at the polymer surface. A decrease of the cobalt and chlorine fractions, due to their migration into water, and an increase of aliphatic C-C bonds at the film surface may be responsible for the relative permittivity modification after exposure to water plasma.
KW - Dielectric spectroscopy
KW - plasma in liquids
KW - polyimide (PI) films
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U2 - 10.1109/TPS.2016.2600280
DO - 10.1109/TPS.2016.2600280
M3 - Article
AN - SCOPUS:85027401048
VL - 44
SP - 2708
EP - 2714
JO - IEEE Transactions on Plasma Science
JF - IEEE Transactions on Plasma Science
SN - 0093-3813
IS - 11
ER -