Comparison of Flow Models for Photoresist Behavior at Contact Holes in Thermal Flow Process

Research output: Contribution to journal › Article

Original language	English
Pages (from-to)	H894-H898
Journal	Journal of the Electrochemical Society
Volume	154
Publication status	Published - 2007 Oct 1

Cite this

@article{7e3b85747bb848ac821214ec02eebc3c,

title = "Comparison of Flow Models for Photoresist Behavior at Contact Holes in Thermal Flow Process",

author = "H. Eto and Homma, {H. Eto;M.Miyazaki;T.Kondo;E.Shiobara;S.Ito;T.}",

year = "2007",

month = oct,

day = "1",

language = "English",

volume = "154",

pages = "H894--H898",

journal = "Journal of the Electrochemical Society",

issn = "0013-4651",

publisher = "Electrochemical Society, Inc.",

}