TY - JOUR
T1 - Computer simulation of the surfactant epitaxy by Modified Embedded Atom Method (MEAM)
AU - Mae, K.
AU - Kyuno, K.
AU - Yamamoto, R.
N1 - Funding Information:
This work was supportedb y a Grant-in-Aid for Scientific Researchf rom the Ministry of Education, Science and Culture, Japan, No. 06452325.W e are grateful to Dr. M.I. Baskes for his advice on the usageo f MEAM.
PY - 1996/10
Y1 - 1996/10
N2 - We have systematically performed the static calculations using the Modified Embedded Atom Method (MEAM). We have calculated the energetical difference between the structure with a monolayer film on a substrate and the structure with the film buried into the second layer. The calculation will give the necessary condition for the surfactant epitaxy and the substrate atom segregating phenomenon from the energetical point of view.
AB - We have systematically performed the static calculations using the Modified Embedded Atom Method (MEAM). We have calculated the energetical difference between the structure with a monolayer film on a substrate and the structure with the film buried into the second layer. The calculation will give the necessary condition for the surfactant epitaxy and the substrate atom segregating phenomenon from the energetical point of view.
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U2 - 10.1016/0927-0256(96)00010-9
DO - 10.1016/0927-0256(96)00010-9
M3 - Article
AN - SCOPUS:0030258739
SN - 0927-0256
VL - 6
SP - 225
EP - 230
JO - Computational Materials Science
JF - Computational Materials Science
IS - 3
ER -